US5716759A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and apparatus for producing integrated circuit devices
Assignee: Adeia Semiconductor Technologies LLC
•
Filing: 1994-09-01
•
Granted: 1998-02-10
•
Expires: 2014-09-01
Abstract
Abstract A method for three dimensional lithography including the steps of providing a substrate (44) having surfaces extending in three dimensions and a light sensitive coating and illuminating the substrate via a mask (40) with light impinging on the surfaces at a non-perpendicular angle with respect thereto.
Inventors
- 👤 Pierre Badehi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 15:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/20; G03F7/24; G03F7/70216; G03F7/70241; G03F7/70275; G03F7/703; G03F7/7035; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/944
Claims Analysis
Total Claims: 32
Claim 1
Independent Claim
46 words
A method for three dimensional lithography including the steps of: providing a substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said substrate via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
Claim 2
Independent Claim
46 words
A method for three dimensional lithography including the steps of: providing a substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said substrate via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
Claim 3
Dependent Claim
21 words
A method according to claim 1 and wherein said substrate comprises a plurality of integrated circuit dice having notches formed therebetween.
Claim 4
Dependent Claim
18 words
A method according to claim 2 and wherein said notches extend through the substrate and separate the dice.
Claim 5
Dependent Claim
18 words
A method according to claim 1 and wherein said substrate comprises an array of mutually spaced integrated circuits.
Claim 6
Dependent Claim
22 words
A method according to claim 1 and wherein said illuminating step comprises illuminating said substrate via a plurality of differently patterned masks.
Claim 7
Dependent Claim
23 words
A method according to claim 5 and wherein said illuminating step comprises illuminating said substrate sequentially via said plurality of differently patterned masks.
Claim 8
Dependent Claim
26 words
A method according to claim 6 and wherein each of said differently patterned masks is employed for simultaneous illumination of a plurality of integrated circuit dice.
Claim 9
Dependent Claim
31 words
A method according to claim 7 and wherein each of said differently patterned masks is employed for simultaneous illumination of plural surfaces on each of said plurality of integrated circuit dice.
Claim 10
Dependent Claim
29 words
A method according to claim 1 and wherein said illuminating step comprises illuminating said substrate via a patterned mask in a plurality of different orientations relative to said substrate.
Claim 11
Dependent Claim
30 words
A method according to claim 9 and wherein said illuminating step comprises illuminating said substrate via a patterned mask sequentially in a plurality of different orientations relative to said substrate.
Claim 12
Dependent Claim
26 words
A method according to claim 10 and wherein each of said differently patterned masks is employed for simultaneous illumination of a plurality of integrated circuit dice.
Claim 13
Dependent Claim
28 words
A method according to claim 11 and wherein said patterned mask is employed for simultaneous illumination of plural surfaces on each of said plurality of integrated circuit dice.
Claim 14
Dependent Claim
19 words
A method according to claim 1 and wherein said mask is located in proximity exposure relationship with the substrate.
Claim 15
Dependent Claim
26 words
A method according to claim 1 and wherein said mask is spaced from the substrate and optical elements are located between the mask and the substrate.
Claim 16
Dependent Claim
40 words
A method according to claim 1 and wherein said step of illuminating comprises employing a square pyramidal prism reflecting light from a illuminator onto a plurality of mutually spaced mirrors, which in turn reflect light onto edges of the substrate.
Claim 17
Independent Claim
46 words
A method for three dimensional lithography including the steps of: providing a substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said substrate via a mask non-perpendicularly there-through with light impinging on at least two non-mutually parallel surfaces of said substrate.
Claim 18
Independent Claim
46 words
A method for three dimensional lithography including the steps of: providing a substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said substrate via a mask non-perpendicularly there-through with light impinging on at least two non-mutually parallel surfaces of said substrate.
Claim 19
Independent Claim
56 words
A method for photolithographic forming of metal areas on an integrated circuit device including the steps of: providing an integrated circuit device substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said substrate via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
Claim 20
Independent Claim
56 words
A method for photolithographic forming of metal areas on an integrated circuit device including the steps of: providing an integrated circuit device substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said substrate via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
Claim 21
Independent Claim
58 words
A method for photolithographic forming of metal areas on an integrated circuit device including the steps of: providing an integrated circuit device substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said integrated circuit device via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
Claim 22
Independent Claim
58 words
A method for photolithographic forming of metal areas on an integrated circuit device including the steps of: providing an integrated circuit device substrate having surfaces extending in three dimensions and a light sensitive coating; and illuminating said integrated circuit device via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
Claim 23
Dependent Claim
41 words
Apparatus for three dimensional lithography including: an illuminator for illuminating a substrate having surfaces extending in three dimensions and a light sensitive coating via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
Claim 24
Dependent Claim
41 words
Apparatus for three dimensional lithography including: an illuminator for illuminating a substrate having surfaces extending in three dimensions and a light sensitive coating via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
Claim 25
Dependent Claim
25 words
Apparatus according to claim 19 and wherein said mask is spaced from the substrate and optical elements are located between the mask and the substrate.
Claim 26
Dependent Claim
20 words
Apparatus according to claim 19 and also comprising a camera for viewing the substrate prior to and during illumination thereof.
Claim 27
Dependent Claim
37 words
Apparatus according to claim 19 and wherein said illuminator comprises a square pyramidal prism reflecting light from a light generator onto a plurality of mutually spaced mirrors, which in turn reflect light onto edges of the substrate.
Claim 28
Dependent Claim
52 words
Apparatus according to claim 19 and wherein said mask comprises a plurality of reticles and said illuminator comprises a plurality of projection lenses receiving light from said plurality of reticles and a plurality of folding mirrors receiving light from said plurality of projection lens and directing it onto edges of said substrate.
Claim 29
Dependent Claim
51 words
Apparatus for photolithographic forming of metal areas on an integrated circuit device including: an illuminator for illuminating an integrated circuit device substrate having surfaces extending in three dimensions and a light sensitive coating via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
Claim 30
Dependent Claim
51 words
Apparatus for photolithographic forming of metal areas on an integrated circuit device including: an illuminator for illuminating an integrated circuit device substrate having surfaces extending in three dimensions and a light sensitive coating via a mask with light impinging on said surfaces at a non-perpendicular angle with respect to the mask.
Claim 31
Dependent Claim
22 words
Apparatus according to either of claims 19 and 24 and wherein said mask is located in proximity exposure relationship with the substrate.
Claim 32
Independent Claim
44 words
A method according to any of claims 1-12, 13 and 15 and wherein said step of illuminating comprises employing a plurality of projection lenses to receive light and direct it onto a plurality of folding mirrors which direct it onto edges of said substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-02-09 | 2001-08-11 | 2002-02-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-02-09 | 2005-08-11 | 2006-02-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-02-09 | 2009-08-11 | 2010-02-10 | $7700.00 | Window Closed / Lapsed |