US6149696A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Colloidal silica slurry for NiP plated disk polishing
Assignee: WD Media LLC
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Filing: 1997-11-06
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Granted: 2000-11-21
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Expires: 2017-11-06
Abstract
Abstract A novel colloidal silica slurry including additives for enhancing the removal rate of a metallic workpiece, preventing etch pits, and enhancing smoothness. These additives include HNO 3 , H 2 O 2 and Al(NO 3 ) 3 . In lieu of colloidal silica, colloidal alumina can be used. The metallic workpiece can be NiP, Ni, Al or other appropriate materials.
Inventors
- 👤 Kang Jia
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 03:42
CPC Classifications
C; C09; C09G; C09G1/00; C09G1/02
Claims Analysis
Total Claims: 27
Claim 1
Independent Claim
100 words
A colloidal slurry for use in a polishing process comprising: aqueous colloidal silica abrasive for abrasively polishing a workpiece; and a metal nitrate salt for increasing the polishing rate during chemical mechanical polishing with said slurry, wherein said metal nitrate salt is Al(NO 3 ) 3 and said slurry further comprises HNO 3 and H 2 O 2 , and wherein said HNO 3 is present in an amount sufficient to prevent said colloidal silica from jelling and said H 2 O 2 is present in an amount sufficient to prevent pit formation when said slurry is used to polish.
Claim 2
Dependent Claim
100 words
A colloidal slurry for use in a polishing process comprising: aqueous colloidal silica abrasive for abrasively polishing a workpiece; and a metal nitrate salt for increasing the polishing rate during chemical mechanical polishing with said slurry, wherein said metal nitrate salt is Al(NO 3 ) 3 and said slurry further comprises HNO 3 and H 2 O 2 , and wherein said HNO 3 is present in an amount sufficient to prevent said colloidal silica from jelling and said H 2 O 2 is present in an amount sufficient to prevent pit formation when said slurry is used to polish.
Claim 3
Dependent Claim
110 words
A colloidal slurry for use in a polishing process comprising: aqueous colloidal silica abrasive for abrasively polishing a workpiece; and a metal nitrate salt for increasing the polishing rate during chemical mechanical polishing with said slurry, wherein said metal nitrate salt is Al(NO 3 ) 3 and said slurry further comprises HNO 3 and H 2 O 2 , and wherein said slurry comprises between 2 and 40 wt. % silica, 0.1 and 2.5 wt. % Al(NO 3 ) 3 , greater than 0 wt. % but less than or equal to 1 wt. % HNO 3 , and between 0.1 and 3 wt. % H 2 O 2 .
Claim 4
Dependent Claim
110 words
A colloidal slurry for use in a polishing process comprising: aqueous colloidal silica abrasive for abrasively polishing a workpiece; and a metal nitrate salt for increasing the polishing rate during chemical mechanical polishing with said slurry, wherein said metal nitrate salt is Al(NO 3 ) 3 and said slurry further comprises HNO 3 and H 2 O 2 , and wherein said slurry comprises between 2 and 40 wt. % silica, 0.1 and 2.5 wt. % Al(NO 3 ) 3 , greater than 0 wt. % but less than or equal to 1 wt. % HNO 3 , and between 0.1 and 3 wt. % H 2 O 2 .
Claim 5
Dependent Claim
34 words
Slurry of claim 2 wherein said slurry comprises greater than 0 wt. % but less than 0.2 wt. % HNO 3 , and between 0.1 and 2 wt. % Al(NO 3 ) 3 .
Claim 6
Dependent Claim
25 words
Slurry of claim 2 comprising between 0.02 and 0.1 wt. % HNO 3 and between 0.2 and 1 wt. % Al(NO 3 ) 3 .
Claim 7
Dependent Claim
81 words
A slurry for use in a polishing process comprising: alumina abrasive particles; a metal nitrate salt comprising Al(NO 3 ) 3 ; H 2 O 2 ; and HNO 3 , wherein said slurry comprises between 2 and 40 wt. % alumina, 0.1 and 2.5 wt. % Al(NO 3 ) 3 , greater than 0 wt. % but less than or equal to 1 wt. % HNO 3 , and between 0.1 and 3 wt. % H 2 O 2 .
Claim 8
Dependent Claim
81 words
A slurry for use in a polishing process comprising: alumina abrasive particles; a metal nitrate salt comprising Al(NO 3 ) 3 ; H 2 O 2 ; and HNO 3 , wherein said slurry comprises between 2 and 40 wt. % alumina, 0.1 and 2.5 wt. % Al(NO 3 ) 3 , greater than 0 wt. % but less than or equal to 1 wt. % HNO 3 , and between 0.1 and 3 wt. % H 2 O 2 .
Claim 9
Dependent Claim
78 words
A slurry for use in a polishing process comprising: abrasive particles: a metal nitrate salt comprising Al(NO 3 ) 3 ; H 2 O 2 , and HNO 3 , wherein said slurry comprises between 2 and 40 wt. % alumina, and between 0.1 and 3 wt. % H 2 O 2 , and wherein said slurry comprises between 0.02 and 0.1 wt. % HNO 3 and between 0.2 and 1 wt. % Al(NO 3 ) 3 .
Claim 10
Dependent Claim
78 words
A slurry for use in a polishing process comprising: abrasive particles: a metal nitrate salt comprising Al(NO 3 ) 3 ; H 2 O 2 , and HNO 3 , wherein said slurry comprises between 2 and 40 wt. % alumina, and between 0.1 and 3 wt. % H 2 O 2 , and wherein said slurry comprises between 0.02 and 0.1 wt. % HNO 3 and between 0.2 and 1 wt. % Al(NO 3 ) 3 .
Claim 11
Independent Claim
50 words
A method for polishing comprising the step of polishing a workpiece with a slurry, said slurry comprising colloidal abrasive silica and a metal nitrate salt, said slurry having a pH less than about 3.5, said metal nitrate salt increasing the polishing rate of said slurry, wherein said workpiece comprises NiP.
Claim 12
Independent Claim
50 words
A method for polishing comprising the step of polishing a workpiece with a slurry, said slurry comprising colloidal abrasive silica and a metal nitrate salt, said slurry having a pH less than about 3.5, said metal nitrate salt increasing the polishing rate of said slurry, wherein said workpiece comprises NiP.
Claim 13
Independent Claim
54 words
A method for polishing comprising the step of polishing a workpiece with a slurry, said slurry comprising colloidal abrasive silica and a metal nitrate salt, said slurry having a pH less than about 3.5, said metal nitrate salt increasing the polishing rate of said slurry, wherein said workpiece comprises nickel or a nickel alloy.
Claim 14
Independent Claim
54 words
A method for polishing comprising the step of polishing a workpiece with a slurry, said slurry comprising colloidal abrasive silica and a metal nitrate salt, said slurry having a pH less than about 3.5, said metal nitrate salt increasing the polishing rate of said slurry, wherein said workpiece comprises nickel or a nickel alloy.
Claim 15
Independent Claim
30 words
A method for polishing comprising the step of polishing a workpiece with a slurry, said slurry comprising colloidal abrasive silica and a metal nitrate salt, wherein said workpiece comprises NiP.
Claim 16
Independent Claim
30 words
A method for polishing comprising the step of polishing a workpiece with a slurry, said slurry comprising colloidal abrasive silica and a metal nitrate salt, wherein said workpiece comprises NiP.
Claim 17
Dependent Claim
18 words
Method for polishing of claim 9 wherein said metal nitrate salt increases the polishing rate of said slurry.
Claim 18
Dependent Claim
14 words
Method for polishing of claim 9 wherein said metal nitrate salt is aluminum nitrate.
Claim 19
Independent Claim
34 words
A method for polishing comprising the step of polishing a workpiece with a slurry, said slurry comprising colloidal abrasive silica and a metal nitrate salt, wherein said workpiece comprises nickel or a nickel alloy.
Claim 20
Independent Claim
34 words
A method for polishing comprising the step of polishing a workpiece with a slurry, said slurry comprising colloidal abrasive silica and a metal nitrate salt, wherein said workpiece comprises nickel or a nickel alloy.
Claim 21
Dependent Claim
18 words
Method for polishing of claim 12 wherein said metal nitrate salt increases the polishing rate of said slurry.
Claim 22
Dependent Claim
12 words
Method of claim 12 wherein said metal nitrate salt is aluminum nitrate.
Claim 23
Independent Claim
48 words
A method for polishing comprising: applying a slurry against a workpiece so as to polish said workpiece, said slurry comprising abrasive particles and a metal nitrate, said slurry having a pH less than about 3.5, wherein said abrasive particles comprise colloidal silica and wherein said workpiece comprises NiP.
Claim 24
Independent Claim
48 words
A method for polishing comprising: applying a slurry against a workpiece so as to polish said workpiece, said slurry comprising abrasive particles and a metal nitrate, said slurry having a pH less than about 3.5, wherein said abrasive particles comprise colloidal silica and wherein said workpiece comprises NiP.
Claim 25
Dependent Claim
26 words
A method for polishing comprising: applying a slurry against a workpicce so as to polish said workpiece, said slurry having a composition as in claim 11.
Claim 26
Dependent Claim
26 words
A method for polishing comprising: applying a slurry against a workpiece so as to polish said workpiece, said slurry having a composition as in claim 2.
Claim 27
Dependent Claim
26 words
A method for polishing comprising: applying a slurry against a workpiece so as to polish said workpiece, said slurry having a composition as in claim 5.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-11-21 | 2004-05-22 | 2004-11-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-11-21 | 2008-05-22 | 2008-11-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-11-21 | 2012-05-22 | 2012-11-21 | $7700.00 | Window Closed / Lapsed |