US5804513A
Expired / Lapsed
US
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Abrasive composition and use of the same
Assignee: Sumitomo Chemical Co Ltd
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Filing: 1997-08-29
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Granted: 1998-09-08
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Expires: 2017-08-29
Abstract
Abstract An abrasive composition is provided comprising an oxidizing agent and abrasive particles which have a mean particle size of 2 mu m or less, wherein each of the abrasive particles comprises (i) at least one oxide selected from aluminum oxide and silicon oxide and (ii) cerium oxide in an amount of 5% to 40% by weight in terms of cerium based on the oxide (i). A method for polishing and planarizing a metal layer formed on a semiconductor substrate using the abrasive composition is also provided.
Inventors
- 👤 Yoshiaki Sakatani
- 👤 Kazumasa Ueda
- 👤 Yoshiaki Takeuchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 04:52
CPC Classifications
C; C09; C09G; C09G1/00; C09G1/02; C04; C04B; C04B35/00; C04B35/01; C04B35/10; C04B35/111; C04B35/1115; C09K; C09K3/00; C09K3/14; C09K3/1409; C09K3/1454; C09K3/1463; C23; C23F; C23F3/00; C23F3/02; C23F3/03; H; H10; H10P; H10P52/00; H10P52/40; H10P52/403; C01; C01P; C01P2004/00; C01P2004/60; C01P2004/61; C01P2006/00; C01P2006/12
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
60 words
An abrasive composition comprising an oxidizing agent and abrasive particles which have a mean particle size of 2 μm or less, wherein the abrasive particles comprise (i) at least one oxide selected from aluminum oxide and silicon oxide and (ii) cerium oxide in an amount of 5% to 40% by weight in terms of cerium based on the oxide (i).
Claim 2
Dependent Claim
60 words
An abrasive composition comprising an oxidizing agent and abrasive particles which have a mean particle size of 2 μm or less, wherein the abrasive particles comprise (i) at least one oxide selected from aluminum oxide and silicon oxide and (ii) cerium oxide in an amount of 5% to 40% by weight in terms of cerium based on the oxide (i).
Claim 3
Dependent Claim
30 words
An abrasive composition according to claim 1, wherein the abrasive particles have a BET specific surface area of from about 40 m 2 /g to about 150 m 2 /g.
Claim 4
Dependent Claim
14 words
An abrasive composition according to claim 1, wherein the oxide (i) is aluminum oxide.
Claim 5
Dependent Claim
20 words
An abrasive composition according to claim 3, wherein the aluminum oxide is transition alumina, amorphous alumina or a mixture thereof.
Claim 6
Dependent Claim
36 words
An abrasive composition according to any one of claims 1 to 3, wherein the oxidizing agent is at least one oxidizing agent selected from hydrogen peroxide, iron (III) nitrate, iodic acid, iodate, perchloric acid and perchlorate.
Claim 7
Dependent Claim
110 words
An abrasive composition according to claim 1, wherein the abrasive particles are obtained by a method which comprises suspending in a solvent at least one compound selected from aluminum oxide having a mean particle size of 2 μm or less, silicon oxide having a mean particle size of 2 μm or less, and a precursor of aluminum oxide or silicon oxide which is converted by calcining to aluminum oxide or silicon oxide having a mean particle size of 2 μm or less, to prepare a suspension; mixing a cerium compound with the suspension wherein the cerium compound is converted by calcining to cerium oxide; drying the suspension; and calcining it.
Claim 8
Dependent Claim
41 words
An abrasive composition according to claim 6, wherein the cerium compound which is converted to cerium oxide by calcining is at least one cerium compound selected from cerium nitrate, cerium acetate, cerium sulfate, cerium oxalate, cerium ammonium salt and cerium carbonate.
Claim 9
Dependent Claim
13 words
A slurry comprising an abrasive composition according to claim 1 dispersed in water.
Claim 10
Dependent Claim
15 words
A slurry according to claim 8, which has a pH of about 7 or less.
Claim 11
Dependent Claim
15 words
A slurry according to claim 9, which has a pH of about 5 or less.
Claim 12
Dependent Claim
23 words
A slurry according to claim 8, wherein the content of abrasive particles is from 1% to 30% by weight based on the slurry.
Claim 13
Independent Claim
96 words
A method of polishing and planarizing a metal layer on a semiconductor substrate in which the metal layer is polished and planarized at a pH of about 7 or less, using an abrasive composition comprising an oxidizing agent and abrasive particles which have a mean particle size of 2 μm or less, wherein the abrasive particles comprise (i) at least one oxide selected from aluminum oxide and silicon oxide and (ii) cerium oxide in an amount of 5% to 40% by weight in terms of cerium based on the oxide (i) in the presence of water.
Claim 14
Independent Claim
96 words
A method of polishing and planarizing a metal layer on a semiconductor substrate in which the metal layer is polished and planarized at a pH of about 7 or less, using an abrasive composition comprising an oxidizing agent and abrasive particles which have a mean particle size of 2 μm or less, wherein the abrasive particles comprise (i) at least one oxide selected from aluminum oxide and silicon oxide and (ii) cerium oxide in an amount of 5% to 40% by weight in terms of cerium based on the oxide (i) in the presence of water.
Claim 15
Dependent Claim
29 words
A method according to claim 12, wherein the oxidizing agent is at least one oxidizing agent selected from hydrogen peroxide, iron nitrate, iodic acid, iodate, perchloric acid and perchlorate.
Claim 16
Dependent Claim
16 words
A method according to claim 12 or 13, wherein the pH is about 5 or less.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-09-07 | 2002-03-09 | 2002-09-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-09-07 | 2006-03-09 | 2006-09-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-09-07 | 2010-03-09 | 2010-09-08 | $7700.00 | Window Closed / Lapsed |