US4428812A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Rapid rate reactive sputtering of metallic compounds
Assignee: Borg Warner Corp
•
Filing: 1983-04-04
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Granted: 1984-01-31
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Expires: 2003-04-04
Abstract
Abstract A method of reactive sputtering of the nitride, oxide or carbide of titanium or similar materials onto a substrate from a target of the pure metal in a chamber utilizing an inert gas, such as argon, wherein the deposition rate of the metallic compound approaches substantially the deposition rate of the pure metal. A reactive gas is introduced into the chamber adjacent to the target at a constant flow and by a rapid pulsing wherein a valve is alternately opened and shut for very short time intervals.
Inventors
- 👤 William D. Sproul
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-22 23:46
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/0021; C23C14/0036; C23C14/0073
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
106 words
A process for the effective, rapid rate reactive deposition of a metallic compound from metals in group IVb of the periodic table in a chamber, including the steps of evacuating the chamber and filling with an inert gas, positioning a substrate to be coated in the chamber below a target of the metal to be deposited, admitting into the chamber a second gas adapted to react with the metal of the target, applying a potential to the target to ionize the inert gas and bombard the target with the gas ions to initiate sputtering, and rapidly pulsing the addition of the reactive gas to the chamber.
Claim 2
Dependent Claim
106 words
A process for the effective, rapid rate reactive deposition of a metallic compound from metals in group IVb of the periodic table in a chamber, including the steps of evacuating the chamber and filling with an inert gas, positioning a substrate to be coated in the chamber below a target of the metal to be deposited, admitting into the chamber a second gas adapted to react with the metal of the target, applying a potential to the target to ionize the inert gas and bombard the target with the gas ions to initiate sputtering, and rapidly pulsing the addition of the reactive gas to the chamber.
Claim 3
Dependent Claim
20 words
A process as set forth in claim 1, in which said inert gas is retained at a substantially constant pressure.
Claim 4
Dependent Claim
30 words
A process as set forth in claim 1, in which said reactive gas is pulsed at an interval of 0.2 to 0.5 second on and 0.2 to 0.5 second off.
Claim 5
Dependent Claim
30 words
A process as set forth in claim 3, in which the reactive gas is supplied at a substantially constant flow and the power to the target is retained substantially constant.
Claim 6
Dependent Claim
18 words
A process as set forth in claim 1, including interposing a shutter between said target and said substrate.
Claim 7
Dependent Claim
18 words
A process as set forth in claim 5, including the step of scanning said substrate beneath said shutter.
Claim 8
Dependent Claim
29 words
A process as set forth in claim 1, in which said inert gas is argon and said reactive gas is selected from the group of nitrogen, oxygen and methane.
Claim 9
Dependent Claim
22 words
A process as set forth in claim 1, in which said target is formed of titanium and said reactive gas is nitrogen.
Claim 10
Dependent Claim
18 words
A process as set forth in claim 3, in which the intervals are adjusted independently of each other.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-01-30 | 1987-08-01 | 1988-01-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-01-30 | 1991-08-01 | 1992-01-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-01-30 | 1995-08-01 | 1996-01-31 | $7700.00 | Window Closed / Lapsed |