US4278710A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus and method for submicron pattern generation
Assignee: United States Department of the Navy
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Filing: 1979-08-27
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Granted: 1981-07-14
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Expires: 1999-08-27
Abstract
Abstract An apparatus and method are provided for depositing submicron patterns on a substrate. The apparatus includes an evaporative source located opposite the substrate so that molecules from the source can be deposited directly on the substrate. A mask is located between the evaporative source and the substrate, the mask having openings which correspond to the desired pattern to be deposited on the substrate. A plate is located between the mask and the substrate, the plate having an aperture for allowing evaporated molecules to be deposited on the substrate according to the pattern of the mask.
Inventors
- 👤 Edward C. Jelks
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 08:14
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/04; C23C14/042
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
97 words
An apparatus for depositing submicron patterns on a substrate comprising: an evaporative source located opposite the substrate and spaced therefrom so that molecules from the source can be deposited directly on the substrate; a mask located between the evaporative source and the substrate and spaced therefrom, said mask having openings which correspond to the desired pattern to be deposited on the substrate; and a plate located between the mask and the substrate and spaced therefrom, said plate having an aperture for allowing evaporated molecules to be deposited on the substrate according to the pattern of said mask.
Claim 2
Independent Claim
97 words
An apparatus for depositing submicron patterns on a substrate comprising: an evaporative source located opposite the substrate and spaced therefrom so that molecules from the source can be deposited directly on the substrate; a mask located between the evaporative source and the substrate and spaced therefrom, said mask having openings which correspond to the desired pattern to be deposited on the substrate; and a plate located between the mask and the substrate and spaced therefrom, said plate having an aperture for allowing evaporated molecules to be deposited on the substrate according to the pattern of said mask.
Claim 3
Dependent Claim
22 words
An apparatus as claimed in claim 1 including: the largest distance across the aperture in the plate being less than one micron.
Claim 4
Dependent Claim
16 words
An apparatus as claimed in claim 2 including: the aperture in the plate being substantially square.
Claim 5
Dependent Claim
10 words
An apparatus as claimed in claim 1 including: the substrate.
Claim 6
Dependent Claim
22 words
An apparatus as claimed in claim 4 including: the largest distance across the aperture in the plate being less than one micron.
Claim 7
Dependent Claim
16 words
An apparatus as claimed in claim 5 including: the aperture in the plate being substantially square.
Claim 8
Dependent Claim
24 words
An apparatus as claimed in claim 6 including: the evaporative source being a pan of aluminum; and the plate and the mask being metal.
Claim 9
Independent Claim
110 words
A method of depositing submicron patterns on a substrate comprising the steps of: evaporating molecules from a source of metal opposite the substrate so that the molecules of metal will be directed toward the substrate; interposing a mask with an open pattern between the source of metal and the substrate so that molecules of metal will be directed through the open pattern toward the substrate; and further interposing a plate with a small aperture between the mask and the substrate so that all metal molecules have to pass through said aperture, whereby metal molecules will be deposited directly on the substrate in the pattern of the openings on the mask.
Claim 10
Independent Claim
110 words
A method of depositing submicron patterns on a substrate comprising the steps of: evaporating molecules from a source of metal opposite the substrate so that the molecules of metal will be directed toward the substrate; interposing a mask with an open pattern between the source of metal and the substrate so that molecules of metal will be directed through the open pattern toward the substrate; and further interposing a plate with a small aperture between the mask and the substrate so that all metal molecules have to pass through said aperture, whereby metal molecules will be deposited directly on the substrate in the pattern of the openings on the mask.
Claim 11
Dependent Claim
32 words
A method as claimed in claim 8 including: the step of interposing the plate with a small aperture includes the aperture being square with its largest dimension being less than one micron.
Claim 12
Dependent Claim
27 words
A method as claimed in claim 9 including: the distance between the plate and the substrate being less than the distance between the plate and the mask.
References Cited (Backward Citations)
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Cited
US4022932A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-07-13 | 1985-01-12 | 1985-07-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-07-13 | 1989-01-12 | 1989-07-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-07-13 | 1993-01-12 | 1993-07-14 | $7700.00 | Window Closed / Lapsed |