← Back to Patent Explorer
US3132046A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for the deposition of thin films by electron bombardment

Assignee: SPACE TECHNOLOGY LAB Inc
•
Filing: 1960-09-28
•
Granted: 1964-05-05
•
Expires: 1980-09-28
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

No abstract record available.

Inventors

  • 👤 Horace T Mann

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-22 18:32
CPC Classifications
B; B05; B05D; B05D1/00; B05D1/60; C; C23; C23C; C23C14/00; C23C14/04; C23C14/042; C23C14/048; H; H01; H01B; H01B1/00; B05D3/00; B05D3/06; B05D3/068; Y; Y10; Y10S; Y10S148/00; Y10S148/15; Y10S148/169; Y10S505/00; Y10S505/80; Y10S505/815; Y10S505/818; Y10S505/819

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 131 words
A METHOD OF FABRICATING A THIN-FILM METAL ELEMENT OF PREDETERMINED SIZE AND SHAPE ON A SUBSTRATE, SAID METHOD COMPRISING: DEPOSITING ON SAID SUBSTATE BY ELECTRON BEAM POLYMERIZATION A LAYER OF DIELECTRIC MATERIAL FORMED WITH AT LEAST ONE STEEP-SIDED DEPRESSION CORRESPONDING IN SIZE AND SHAPE TO SAID METAL ELEMENT, PLACING AN APERTURED MASKING MEMBER ADJACENT TO SAID DIELECTRIC LAYER WITH SAID DEPRESSION ALIGNED WITH AN APERTURE OF SAID MEMBER, SAID APERTURE ALSO BEING FORMED TO CORRESPOND IN SIZE AND SHAPE TO SAID METAL ELEMENT, AND VACUUM EVAPORATING METAL THROUGH SAID APERTURE FROM A SOURCE IN SUBSTANTIAL ALIGNMENT WITH SAID DEPRESSION AND SAID APERTURE TO FORM IN SAID DEPRESSION A METAL DEPOSIT OF A THICKNESS LESS THAN THE DEPTH OF SAID DEPRESSION, SAID DEPOSIT BEING CONTINUOUS ONLY IN THE BOTTOM OF SAID DEPRESSION.
Claim 2
Independent Claim 131 words
A METHOD OF FABRICATING A THIN-FILM METAL ELEMENT OF PREDETERMINED SIZE AND SHAPE ON A SUBSTRATE, SAID METHOD COMPRISING: DEPOSITING ON SAID SUBSTATE BY ELECTRON BEAM POLYMERIZATION A LAYER OF DIELECTRIC MATERIAL FORMED WITH AT LEAST ONE STEEP-SIDED DEPRESSION CORRESPONDING IN SIZE AND SHAPE TO SAID METAL ELEMENT, PLACING AN APERTURED MASKING MEMBER ADJACENT TO SAID DIELECTRIC LAYER WITH SAID DEPRESSION ALIGNED WITH AN APERTURE OF SAID MEMBER, SAID APERTURE ALSO BEING FORMED TO CORRESPOND IN SIZE AND SHAPE TO SAID METAL ELEMENT, AND VACUUM EVAPORATING METAL THROUGH SAID APERTURE FROM A SOURCE IN SUBSTANTIAL ALIGNMENT WITH SAID DEPRESSION AND SAID APERTURE TO FORM IN SAID DEPRESSION A METAL DEPOSIT OF A THICKNESS LESS THAN THE DEPTH OF SAID DEPRESSION, SAID DEPOSIT BEING CONTINUOUS ONLY IN THE BOTTOM OF SAID DEPRESSION.

References Cited (Backward Citations)

US2921006A Cited
US2848359A Cited
US2898241A Cited
US2937351A Cited
US2932591A Cited
US2936435A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1967-05-05 1967-11-04 1968-05-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1971-05-05 1971-11-04 1972-05-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1975-05-05 1975-11-04 1976-05-05 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag