US4004044A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for forming patterned films utilizing a transparent lift-off mask
Assignee: International Business Machines Corp
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Filing: 1975-05-09
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Granted: 1977-01-18
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Expires: 1995-05-09
Abstract
Abstract A lift-off method for use in depositing thin films in the fabrication of integrated circuits which avoids edge tearing of the films. The method involves depositing an organic polymeric first masking material on a substrate, and forming on said material a layer of a polydimethylsiloxane resin material. The material, in turn, is covered by a second masking layer, preferably an organic polymeric resist material into which openings are placed in a selected pattern utilizing lithographic techniques. Then, conforming openings are placed in the underlying polydimethylsiloxane resin material and the openings are extended through the underlying resist material by successive reactive sputter etching steps to expose the substrate surface in the aforesaid selected pattern. The thin film to be deposited is then applied over the resulting structure; it is, thereby, deposited on the substrate in said openings. The final reactive sputter etching step affords edges in the openings through the resin material layer which overhang the edges in the openings through the first masking layer affording easy lift-off of the unwanted areas of the deposited film when the first masking layer is totally removed by application of solvent.
Inventors
- 👤 Jack R. Franco
- 👤 Janos Havas
- 👤 Lewis J. Rompala
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 16:07
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922; G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/094; G03F7/095; H05; H05K; H05K3/00; H05K3/02; H05K3/04; H05K3/046; H05K3/048; H10P14/40; H10P14/412; H10P14/63; H10P14/6326; H10P14/6342; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; H10P76/00; H10P76/20; H10P76/202; Y; Y10; Y10S; Y10S148/00; Y10S148/106; Y10S148/118; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/951
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
178 words
A lift-off method for forming a patterned film on a substrate comprising: forming on said substrate a first masking layer of organic polymeric material, forming on said first layer a transparent layer of polydimethylsiloxane resin material having a preponderance of Si-O bonds relative to the number of Si-CH 3 bonds, forming on said layer of resin material a second masking layer having openings in a desired pattern, forming by reactive sputter etching in a fist gas ambient including a fluorine-containing gas openings through said layer of resin material aligned with said openings in said second masking layer, forming by reactive sputter etching in a second gas ambient including oxygen openings through said first masking layer aligned with said openings in said layer of resin material, the last named reactive sputter etching being continued until the edges in said openings through said resin material overhang the edges in said openings through said first masking layer, depositing said film onto said substrate through said openings in said layer of resin material and said first masking layer, and removing said layers.
Claim 2
Dependent Claim
178 words
A lift-off method for forming a patterned film on a substrate comprising: forming on said substrate a first masking layer of organic polymeric material, forming on said first layer a transparent layer of polydimethylsiloxane resin material having a preponderance of Si-O bonds relative to the number of Si-CH 3 bonds, forming on said layer of resin material a second masking layer having openings in a desired pattern, forming by reactive sputter etching in a fist gas ambient including a fluorine-containing gas openings through said layer of resin material aligned with said openings in said second masking layer, forming by reactive sputter etching in a second gas ambient including oxygen openings through said first masking layer aligned with said openings in said layer of resin material, the last named reactive sputter etching being continued until the edges in said openings through said resin material overhang the edges in said openings through said first masking layer, depositing said film onto said substrate through said openings in said layer of resin material and said first masking layer, and removing said layers.
Claim 3
Dependent Claim
21 words
The method defined in claim 1 wherein said reactive sputter etching steps take place successively in the same sputter etching chamber.
Claim 4
Dependent Claim
22 words
The method defined in claim 1 wherein said first layer is baked prior to said forming of said layer of resin material.
Claim 5
Dependent Claim
15 words
The method defined in claim 1 wherein said second masking layer is a photoresist material.
Claim 6
Dependent Claim
17 words
The method defined in claim 1 wherein said second masking layer is an electron beam resist material.
Claim 7
Independent Claim
124 words
A method for forming a patterned mask on a substrate comprising: forming on said substrate a first masking layer of organic polymeric material, forming on said first layer a layer of polydimethylsiloxane resin material having a preponderance of Si-O bonds relative to the number of Si-CH 3 bonds, forming on said layer of resin material a second masking layer having openings in a desired pattern, forming by reactive sputter etching in a first gas ambient including a fluorine-containing gas openings through said layer of resin material aligned with said openings in said second masking layer, and forming by reactive sputter etching in a second gas ambient including oxygen openings through said first masking layer aligned with said openings in said layer of resin material.
Claim 8
Independent Claim
124 words
A method for forming a patterned mask on a substrate comprising: forming on said substrate a first masking layer of organic polymeric material, forming on said first layer a layer of polydimethylsiloxane resin material having a preponderance of Si-O bonds relative to the number of Si-CH 3 bonds, forming on said layer of resin material a second masking layer having openings in a desired pattern, forming by reactive sputter etching in a first gas ambient including a fluorine-containing gas openings through said layer of resin material aligned with said openings in said second masking layer, and forming by reactive sputter etching in a second gas ambient including oxygen openings through said first masking layer aligned with said openings in said layer of resin material.
Claim 9
Dependent Claim
21 words
The method defined in claim 6 wherein said reactive sputter etching steps take place successively in the same sputter etching chamber.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-01-18 | 1980-07-19 | 1981-01-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-01-18 | 1984-07-19 | 1985-01-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-01-18 | 1988-07-19 | 1989-01-18 | $7700.00 | Window Closed / Lapsed |