Method of fibricating a semiconductor device having a trench

Claim 1

A method for manufacturing a semiconductor device having a trench, comprising the steps of: forming a first silicon oxide film on a semiconductor substrate, etching a trench in said semiconductor substrate with the silicon oxide film used as an etching mask, forming a second silicon oxide film on the entire exposed surface of said semiconductor substrate and said first silicon oxide film, anisotropically etching said second silicon oxide film until the second silicon oxide film remains only on the side walls of said trench, enlarging the trench by etching the semiconductor substrate, previously exposed only on a bottom surface of said trench by an isotropic etching process, to enlarge the width of a bottom portion of said trench, wherein said second oxide film is formed on the side wall portion and the bottom surface portion of said trench, forming a silicon nitride film which will be the oxidation mask on said second oxide film and comprising the further step of forming, a further silicon oxide film which will be the etching mask on the side wall portion of the trench formed on the silicon nitride film.

Claim 2

A method for manufacturing a semiconductor device having a trench, comprising the steps of: forming a first silicon oxide film on a semiconductor substrate, etching a trench in said semiconductor substrate with the silicon oxide film used as an etching mask, forming a second silicon oxide film on the entire exposed surface of said semiconductor substrate and said first silicon oxide film, anisotropically etching said second silicon oxide film until the second silicon oxide film remains only on the side walls of said trench, enlarging the trench by etching the semiconductor substrate, previously exposed only on a bottom surface of said trench by an isotropic etching process, to enlarge the width of a bottom portion of said trench, wherein said second oxide film is formed on the side wall portion and the bottom surface portion of said trench, forming a silicon nitride film which will be the oxidation mask on said second oxide film and comprising the further step of forming, a further silicon oxide film which will be the etching mask on the side wall portion of the trench formed on the silicon nitride film.

Claim 4

A method for manufacturing a semiconductor device having a trench, comprising the steps of: forming a first silicon oxide film on a semiconductor substrate, etching a trench in said semiconductor substrate with the silicon oxide film used as an etching mask, forming a second silicon oxide film on the entire exposed surface of said semiconductor substrate and said first silicon oxide film, anisotropically etching said second silicon oxide film until the second silicon oxide film remains only on the side walls of said trench, enlarging the trench by etching the semiconductor substrate, previously exposed only on a bottom surface of said trench by an isotropic etching process, to enlarge the width of a bottom portion of said trench, and which further comprises the step of forming a region for isolation by forming a region for isolating elements of thick silicon oxide film on the bottom portion region of the trench by thermal oxidation.

Claim 5

A method for manufacturing a semiconductor device having a trench, comprising the steps of: forming a first silicon oxide film on a semiconductor substrate, etching a trench in said semiconductor substrate with the silicon oxide film used as an etching mask, forming a second silicon oxide film on the entire exposed surface of said semiconductor substrate and said first silicon oxide film, anisotropically etching said second silicon oxide film until the second silicon oxide film remains only on the side walls of said trench, enlarging the trench by etching the semiconductor substrate, previously exposed only on a bottom surface of said trench by an isotropic etching process, to enlarge the width of a bottom portion of said trench, and which further comprises the step of forming a region for isolation by forming a region for isolating elements of thick silicon oxide film on the bottom portion region of the trench by thermal oxidation.

Claim 7

A method for manufacturing a semiconductor device having a trench, comprising the steps of: forming a first silicon oxide film on a semiconductor substrate, etching a trench in said semiconductor substrate with the silicon oxide film used as an etching mask, forming a second silicon oxide film on the entire exposed surface of said semiconductor substrate and said first silicon oxide film, anisotropically etching said second silicon oxide film until the second silicon oxide film remains only on side walls of said trench, enlarging the trench by etching the semiconductor substrate, previously exposed only on a bottom surface of said trench by an isotropic etching process, to enlarge the width of a bottom portion of said trench, wherein said step of forming a second oxide film comprises the steps of forming a thin silicon oxide film on the side wall portion and the bottom surface portion of said trench by thermal oxidation, forming a silicon nitride film which will be the oxide mask on said silicon oxide film, and forming a further silicon oxide film which will be the etching mask on the side wall portion of the trench on the silicon nitride film wherein said step of forming a first oxide film comprises the steps of forming a thin silicon oxide film on the semiconductor substrate by thermal oxidation, forming a silicon nitride film which will be the oxide mask on the thin silicon oxide film, forming a thick silicon oxide film on said silicon nitride film and patterning the thick silicon oxide film by photolithography.

Claim 8

A method for manufacturing a semiconductor device having a trench, comprising the steps of: forming a first silicon oxide film on a semiconductor substrate, etching a trench in said semiconductor substrate with the silicon oxide film used as an etching mask, forming a second silicon oxide film on the entire exposed surface of said semiconductor substrate and said first silicon oxide film, anisotropically etching said second silicon oxide film until the second silicon oxide film remains only on side walls of said trench, enlarging the trench by etching the semiconductor substrate, previously exposed only on a bottom surface of said trench by an isotropic etching process, to enlarge the width of a bottom portion of said trench, wherein said step of forming a second oxide film comprises the steps of forming a thin silicon oxide film on the side wall portion and the bottom surface portion of said trench by thermal oxidation, forming a silicon nitride film which will be the oxide mask on said silicon oxide film, and forming a further silicon oxide film which will be the etching mask on the side wall portion of the trench on the silicon nitride film wherein said step of forming a first oxide film comprises the steps of forming a thin silicon oxide film on the semiconductor substrate by thermal oxidation, forming a silicon nitride film which will be the oxide mask on the thin silicon oxide film, forming a thick silicon oxide film on said silicon nitride film and patterning the thick silicon oxide film by photolithography.