← Back to Patent Explorer
US4290877A Expired / Lapsed US ⏱️ 0.0 years remaining

Sputtering apparatus for coating elongated tubes and strips

Assignee: United States, INTERIOR THE, Secretary of
•
Filing: 1980-09-08
•
Granted: 1981-09-22
•
Expires: 2000-09-08
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A conventional sputtering chamber is modified to include two elongated hollow tubes which accommodate an elongated workpiece in the form of a tube or strip, of lesser diameter, during a sputter-coating operation. During the sputtering operation, the workpiece is simultaneously rotated and moved back and forth beneath at least one sputtering target to receive a uniform coating thereon.

Inventors

  • 👤 Robert Blickensderfer

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 17:17
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/50; C23C14/505

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 126 words
Apparatus for sputter-coating a layer of uniform thickness onto the surface of an elongated workpiece, comprising: a sputtering chamber with at least one disk-shaped cathode located therein; means attached to said sputtering chamber for accommodating the entire length of said elongated workpiece; said means for accommodating said workpiece being greater in length than said vacuum chamber and locating a portion of said workpiece adjacent said at least one disk-shaped cathode; means for forming a sputtering plasma in said sputtering chamber; and means located within said accommodating means for simultaneously rotating said workpiece while moving said workpiece along the length of said accommodating means and past said at least one disk-shaped cathode during a sputtering operation to deposit a coating of uniform thickness on said elongated workpiece.
Claim 2
Dependent Claim 126 words
Apparatus for sputter-coating a layer of uniform thickness onto the surface of an elongated workpiece, comprising: a sputtering chamber with at least one disk-shaped cathode located therein; means attached to said sputtering chamber for accommodating the entire length of said elongated workpiece; said means for accommodating said workpiece being greater in length than said vacuum chamber and locating a portion of said workpiece adjacent said at least one disk-shaped cathode; means for forming a sputtering plasma in said sputtering chamber; and means located within said accommodating means for simultaneously rotating said workpiece while moving said workpiece along the length of said accommodating means and past said at least one disk-shaped cathode during a sputtering operation to deposit a coating of uniform thickness on said elongated workpiece.
Claim 3
Dependent Claim 73 words
The sputter-coating apparatus of claim 1 wherein said accommodating means is comprised of at least two elongated hollow tubes placed on opposite sides of said sputtering chamber and being attached to said sputtering chamber so that said elongated workpiece can travel in a straight line from one of said at least two hollow tubes, through said sputtering chamber and into the other of said at least two hollow tubes during the sputtering operation.
Claim 4
Dependent Claim 30 words
The sputter-coating apparatus of claim 2 wherein said sputter-coating apparatus can sputter-coat a workpiece substantially equal in length to the length of one of said at least two hollow tubes.
Claim 5
Dependent Claim 48 words
The sputter-coating apparatus of claim 1 wherein said means for simultaneously rotating and moving said workpiece includes a chain mechanism for moving said workpiece through said sputtering chamber and a rack and pinion mechanism operating in response to the movement of said chain mechanism to rotate said workpiece.
Claim 6
Dependent Claim 47 words
The sputter-coating apparatus of claim 1 wherein a cathode of another material that differs from the material of said at least one cathode is located within said sputtering chamber and a gas capable of reacting therewith is admitted to said sputtering chamber for a reactive sputtering operation.

References Cited (Backward Citations)

GB1147318A Cited
US3884793A Cited
US4046712A Cited
US3884787A Cited
US3901784A Cited
US3945903A Cited
US4128466A Cited
US4151064A Cited
US4252865A Cited
US4194962A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1984-09-21 1985-03-23 1985-09-22 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1988-09-21 1989-03-23 1989-09-22 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1992-09-21 1993-03-23 1993-09-22 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag