EP0166349A1
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Surface treatment process
Assignee: Sumitomo Electric Industries Ltd
•
Filing: 1985-06-14
•
Granted: —
•
Expires: 2005-06-14
Abstract
Abstract A surface treatment process for forming a thin film on the surface of a substrate thereby to obtain a hard layer, by forming a metal vapor atmosphere around the substrate to inject a metal or nonmetal ion into the substrate while ionizing the metal vapor.
Inventors
- 👤 Yasuhiro C/O Itami Works Shimizu
- 👤 Akira C/O Itami Works Doi
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-22 23:57
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/0021; C23C14/24; C23C14/32
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
32 words
A surface treatment process of forming a metal vapor atmosphere around a substrate to be treated thereby to inject a metal or nonmetal ion into said substrate while ionizing said metal vapor.
Claim 2
Dependent Claim
32 words
A surface treatment process of forming a metal vapor atmosphere around a substrate to be treated thereby to inject a metal or nonmetal ion into said substrate while ionizing said metal vapor.
Claim 3
Dependent Claim
19 words
A surface treatment process in accordance with claim 1, wherein said substrate to be treated is a cutting tool.
Claim 4
Dependent Claim
41 words
A surface treatment process in accordance with claim 1, wherein said evaporation metal is made of a substance or two or more substances selected from a group of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Si, Al and B.
Claim 5
Dependent Claim
53 words
A surface treatment process in accordance with claim 1, wherein said injected metal or nonmetal ion is made of a substance or two or more substances selected from a group of N 2 + , N , O 2 + , O + , C + , Si + and B + .
Claim 6
Dependent Claim
21 words
A surface treatment process in accordance with claim 1, wherein said ionization of said metal vapor is performed by high-frequency discharge.
Claim 7
Dependent Claim
22 words
A surface treatment process in accordance with claim 1, wherein said ionization of said metal vapor is performed by DC arc discharge.
Claim 8
Dependent Claim
21 words
A surface treatment process in accordance with claim 1, wherein said ionization of said metal vapor is performed by thermoion emission.
Claim 9
Dependent Claim
33 words
A surface treatment process in accordance with claim 1, wherein said metal vapor is obtained by an HCD gun, said ionization of said metal vapor being performed by electrons of said HCD gun.
Claim 10
Dependent Claim
21 words
A surface treatment process in accordance with claim 1, wherein an acceleration voltage is applied to said substrate to be treated.
Claim 11
Dependent Claim
30 words
A surface treatment process in accordance with claim 1, wherein a compound of said evaporation metal and said injected ion is formed and coated on said substrate to be treated.
References Cited (Backward Citations)
DE2305359A1
Cited
GB1490063A
Cited
DE2624005A1
Cited
US4108751A
Cited
DE2842407A1
Cited
EP0029747A1
Cited
GB2075069A
Cited
GB2073254A
Cited
EP0095384A2
Cited
US4407712A
Cited
GB2123441A
Cited
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.