GB2123441A
Expired / Lapsed
GB
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Method and apparatus for coating materials by ion plating
Assignee: Citizen Watch Co Ltd
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Filing: 1983-06-02
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Granted: —
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Expires: 2003-06-02
Abstract
No abstract record available.
Inventors
- 👤 Yasutomo Sasanuma
- 👤 Masao Koshi
- 👤 Teruaki Takahashi
- 👤 Shotaro Shimizu
- 👤 Mitsugu Enomoto
- 👤 Youji Yoshilkawa
Bibliographic Details
Application Number
—
Jurisdiction
GB
Data Source
google_patents
Last Synchronized
2026-10-23 01:51
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32422; C; C23; C23C; C23C14/00; C23C14/22; C23C14/24; C23C14/32; Y; Y10; Y10T; Y10T428/00; Y10T428/31504; Y10T428/31678
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
145 words
CLAIMS 1. A method for coating materials by ion plating comprising the steps of: 50 (a) providing an ion plating apparatus having an 115 ionizing means operated independently of a potential of a substrate; (b) at an initial stage, ionizing a gas introduced from a gas inlet and a vapor of an evaporation material from a vapor source, and ion plating a surface of said substrate with a film of said evaporation material or a compound of said evaporation material and said introduced gas, said substrate being cathodically biased relative to said vapor source; (c) at an intermediate stage, while driving said ionizing means, continuing ion plating with the potential of said substrate left floating; and (d) at a final stage, while driving said ionizing means, continuing ion plating with the potential of said substrate again made negative relative to that of said vapor source.
Claim 2
Dependent Claim
25 words
A method for coating materials by ion plating according to claim 1 wherein said film comprises a hard material apt to accumulate a residual stress.
Claim 3
Dependent Claim
19 words
A method for coating materials by ion plating according to claim 2 wherein said hard material is titanium nitride.
Claim 4
Dependent Claim
19 words
A method for coating materials by ion plating according to claim 2 wherein said hard material is titanium carbonitride.
Claim 5
Dependent Claim
18 words
A method for coating materials by ion plating according to claim 2 wherein said hard material is chromium.
Claim 6
Independent Claim
170 words
A method for coating materials by ion plating comprising the steps of: (a) providing an ion plating apparatus having an ionizing means operated independently of a potential of a substrate; (b) at an initial stage, ionizing a gas introduced from a gas inlet and a vapor of an evaporation material from a vapor source, and ion plating a surface of said substrate with a film of said evaporation material or a compound of said evaporation material and said introduced gas, said substrate being cathodically biased relative to that of said vapor source; (c) at an intermediate stage, while driving said ionizing means, repeating alternately the ion plating step with the potential of said substrate left floating and the ion plating step with the potential of said substrate made negative relative to that of said vapor source so as to stack films; (d) at a final stage, while driving said ionizing means, continuing ion plating with the potential of said substrate again made negative relative to that of said vapor source.
Claim 7
Dependent Claim
25 words
A method for coating materials by ion plating according to claim 6 wherein said film comprises a hard material apt to accumulate a residual stress.
Claim 8
Dependent Claim
19 words
A method for coating materials by ion plating according to claim 7 wherein said hard material is titanium nitride.
Claim 9
Dependent Claim
19 words
A method for coating materials by ion plating according to claim 7 wherein said hard material is titanium carbonitride.
Claim 10
Dependent Claim
18 words
A method for coating materials by ion plating according to claim 7 wherein said hard material is chromium.
Claim 11
Dependent Claim
123 words
An ion plating apparatus comprising: (a) a vapor source at ground potential; (b) a substrate holder located above said vapor source; (c) a pair of anodes located on the side of said vapor source with respect to said substrate holder and the opposite side of said substrate holder; (d) one or more thermoelectron emitting filaments located between said anodes; (e) a vacuum chamber for accommodating said elements, said vacuum chamber having a gas inlet and an evacuation system; (f) means for applying a negative potential relative to that of said vapor source to a substrate 4 GB 2 123 441 A 4 supported by said substrate holder; and (g) means for removing said negative potential to leave the potential of said substrate floating.
Claim 12
Dependent Claim
33 words
An ion plating apparatus according to claim 11 wherein said plurality of thermoelectron emitting filaments are located symmetrically with respect to a center axis of said chamber near the substrate within said chamber.
Claim 13
Dependent Claim
37 words
An ion plating apparatus according to claim vapor source with respect to said substrate holder is of a ring shape and the anode located on the opposite side of said substrate holder is of a disc shape.
Claim 14
Independent Claim
18 words
A method for coating materials by ion plating substantially as hereinbefore described with reference to the accompanying drawing.
Claim 15
Dependent Claim
55 words
An ion plating apparatus substantially as hereinbefore described with reference to the 11 wherein the anode located on the side of said 20 accompanying drawing. Printed for Her Majesty's Stationery Office by the Courier Press, Leamington Spa, 1984. Published by the Patent Ofice, 25 Southampton Buildings, London, WC2A lAY, from which copies may be obtained.
References Cited (Backward Citations)
GB2010920A
Cited
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