Patent US5445707A successfully refreshed from Google Patents.
US5445707A
Expired / Lapsed
US
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Method of manufacturing article having magnetic patterns
Assignee: Nabtesco Corp
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Filing: 1994-06-07
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Granted: 1995-08-29
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Expires: 2014-06-07
Abstract
Abstract An article comprising a substrate formed with predetermined patterns and magnetized magnetic substances arranged in the substrate in accordance with the predetermined patterns, and a method of manufacturing an article with magnetized magnetic substances arranged according to predetermined patterns, comprising the steps of arranging said magnetic substances in a substrate in accordance with the predetermined patterns and magnetizing the magnetic substances.
Inventors
- 👤 Kiyoshi Toyama
- 👤 Masayuki Togawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 19:22
CPC Classifications
G; G08; G08B; G08B13/00; G08B13/22; G08B13/24; G08B13/2402; G08B13/2405; G08B13/2408; G06; G06K; G06K19/00; G06K19/06; G06K19/06187; G06K19/06196; G08B13/2428; G08B13/2437; G08B13/244; G08B13/2442; G11; G11B; G11B5/00; G11B5/84; G11B5/855; H; H01; H01F; H01F1/00; H01F1/0027; H01F10/00; H01F10/26; H01F10/28; H01F41/00; H01F41/14; H01F41/16; H01F41/18; H01F41/24; H01F41/26; H02; H02K; H02K15/00; H02K15/02; H02K15/03
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
165 words
A method of manufacturing an article with magnetized magnetic substances arranged according to patterns, comprising the steps of: oxidizing a substrate made of silicon or silicon containing impurities in such a manner that a passivating layer of silicon dioxide is formed on an outer surface of the oxidized substrate; coating a photoresist on said passivating layer formed on said outer surface of said oxidized substrate; exposing said photoresist through a photomask having said patterns so that it is formed with said patterns; removing the exposed or unexposed parts of said photoresist from said oxidized substrate by dissolving it in a developer in such a manner that said passivating layer is partially uncovered; etching the uncovered portions of sid passivating layer from said oxidized substrate in such a manner that windows are formed in said passivating layer; anisotropically etching said oxidized substrate through said windows so as to form grooves in said oxidized substrate; burying said magnetic substances into said grooves; and magnetizing said magnetic substances.
Claim 2
Independent Claim
165 words
A method of manufacturing an article with magnetized magnetic substances arranged according to patterns, comprising the steps of: oxidizing a substrate made of silicon or silicon containing impurities in such a manner that a passivating layer of silicon dioxide is formed on an outer surface of the oxidized substrate; coating a photoresist on said passivating layer formed on said outer surface of said oxidized substrate; exposing said photoresist through a photomask having said patterns so that it is formed with said patterns; removing the exposed or unexposed parts of said photoresist from said oxidized substrate by dissolving it in a developer in such a manner that said passivating layer is partially uncovered; etching the uncovered portions of sid passivating layer from said oxidized substrate in such a manner that windows are formed in said passivating layer; anisotropically etching said oxidized substrate through said windows so as to form grooves in said oxidized substrate; burying said magnetic substances into said grooves; and magnetizing said magnetic substances.
Claim 3
Dependent Claim
21 words
A method as set forth in claim 1, in which said anisotropically etching step is performed by a wet etching process.
Claim 4
Dependent Claim
21 words
A method as set forth in claim 1, in which said anisotropically etching step is performed by a dry etching process.
Claim 5
Dependent Claim
32 words
A method as set forth in claim 1, in which said etching step for the uncovered portions of said passivating layer from said oxidized substrate is performed by a dry etching process.
Claim 6
Independent Claim
144 words
A method of manufacturing an article with magnetized magnetic substances arranged according to patterns, comprising the steps of: coating a substrate made of silicon or silicon containing impurities with thin film by a thin film forming process such as chemical vapor deposition and sputter deposition; coating a photoresist on said coated film; exposing said photoresist through a photomask having said patterns so that it is formed with said patterns; removing the exposed or unexposed parts of said photoresist from said substrate by dissolving it in a developer in such a manner that said film is partially uncovered; etching the uncovered portions of said film from substrate in such a manner that windows are formed in said film; anisotropically etching said substrate through said windows so as to form grooves in said substrate; burying said magnetic substances into said grooves; and magnetizing said magnetic substances.
Claim 7
Independent Claim
144 words
A method of manufacturing an article with magnetized magnetic substances arranged according to patterns, comprising the steps of: coating a substrate made of silicon or silicon containing impurities with thin film by a thin film forming process such as chemical vapor deposition and sputter deposition; coating a photoresist on said coated film; exposing said photoresist through a photomask having said patterns so that it is formed with said patterns; removing the exposed or unexposed parts of said photoresist from said substrate by dissolving it in a developer in such a manner that said film is partially uncovered; etching the uncovered portions of said film from substrate in such a manner that windows are formed in said film; anisotropically etching said substrate through said windows so as to form grooves in said substrate; burying said magnetic substances into said grooves; and magnetizing said magnetic substances.
Claim 8
Dependent Claim
21 words
A method as set forth in claim 5, in which said anisotropically etching step is performed by a wet etching process.
Claim 9
Dependent Claim
21 words
A method as set forth in claim 5, in which said anisotropically etching step is performed by a dry etching process.
Claim 10
Dependent Claim
30 words
A method as set forth in claim 5, in which said etching step for the uncovered portions of said film from said substrate is performed by a dry etching process.
Claim 11
Dependent Claim
24 words
A method as set forth in claim 1, in which said thin film is made of a metal, nitride, carbide, oxide or organic material.
References Cited (Backward Citations)
US4948460A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-08-28 | 1999-02-27 | 1999-08-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-08-28 | 2003-02-27 | 2003-08-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-08-28 | 2007-02-27 | 2007-08-29 | $7700.00 | Window Closed / Lapsed |