US5156988A
Expired / Lapsed
US
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A method of manufacturing a quantum interference semiconductor device
Assignee: Sony Corp
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Filing: 1991-09-11
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Granted: 1992-10-20
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Expires: 2011-09-11
Abstract
Abstract A method of making a quantum interference semiconductor device comprising the steps of forming a first semiconductor layer on a semi-insulating semiconductor substrate, forming a semi-insulating second semiconductor layer on the first semiconductor layer, forming a metal film so as to form a gate electrode on the second semiconductor layer, forming a first opening by selectively removing the metal film to form the gate electrode, forming a mask on the first opening and etching until midway in the film thickness direction of the semi-insulative second semiconductor layer by anitropic etching through said first opening and subsequently forming an etching until an upper surface of the semiconductor substrate by isotropic etching occurs so as to form a second opening into the semi-insulative second semiconductor layer and the first semiconductor layer which is continuous with the first opening portion and forming a cathode from the first semiconductor layer and a blocker made of the second semiconductor layer.
Inventors
- 👤 Yoshifumi Mori
- 👤 Akira Ishibashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 12:30
CPC Classifications
H; H01; H01J; H01J21/00; H01J21/02; H01J21/06; H01J21/10; H01J21/105; H01J9/00; H01J9/02; H01J9/022; H01J9/025; Y; Y10; Y10S; Y10S438/00; Y10S438/962
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
274 words
A method of making a quantum interference semiconductor device, comprising the steps of: forming a first semiconductor layer onto a semiinsulative semiconductor substrate; forming a semiinsulative second semiconductor layer onto said first semiconductor layer; forming a metal film to form a gate electrode onto said second semiconductor layer; forming a first opening portion by selectively removing the metal film to form the gate electrode; forming a mask into said first opening portion; performing an etching until a midway in a film thickness direction of said semiinsulative second semiconductor layer by an anisotropic etching through said first opening portion and subsequently performing an etching until an upper surface of said semiconductor substrate by an isotropic etching occurs, thereby forming a second opening portion into the semiinsulative second semiconductor layer and the first semiconductor layer so as to be continuous with said first opening portion and also forming a cathode made of the first semiconductor layer and a blocker made of the second semiconductor layer; flattening a surface by filling up the inside of said second opening portion by using a surface flattening material; forming an insulative film onto the whole surface of the substrate; forming a third opening portion by selectively removing a part of the insulative film over the first opening portion; removing said surface flattening material and said mask through said third opening portion; setting the first to third opening portions into a vacuum state by coating a metal film to form an anode onto the insulative film in a vacuum; and selectively removing said metal film to form an anode so as to leave the metal film on the third opening portion.
Claim 2
Independent Claim
274 words
A method of making a quantum interference semiconductor device, comprising the steps of: forming a first semiconductor layer onto a semiinsulative semiconductor substrate; forming a semiinsulative second semiconductor layer onto said first semiconductor layer; forming a metal film to form a gate electrode onto said second semiconductor layer; forming a first opening portion by selectively removing the metal film to form the gate electrode; forming a mask into said first opening portion; performing an etching until a midway in a film thickness direction of said semiinsulative second semiconductor layer by an anisotropic etching through said first opening portion and subsequently performing an etching until an upper surface of said semiconductor substrate by an isotropic etching occurs, thereby forming a second opening portion into the semiinsulative second semiconductor layer and the first semiconductor layer so as to be continuous with said first opening portion and also forming a cathode made of the first semiconductor layer and a blocker made of the second semiconductor layer; flattening a surface by filling up the inside of said second opening portion by using a surface flattening material; forming an insulative film onto the whole surface of the substrate; forming a third opening portion by selectively removing a part of the insulative film over the first opening portion; removing said surface flattening material and said mask through said third opening portion; setting the first to third opening portions into a vacuum state by coating a metal film to form an anode onto the insulative film in a vacuum; and selectively removing said metal film to form an anode so as to leave the metal film on the third opening portion.
Claim 3
Dependent Claim
23 words
A method according to claim 1, wherein said semiconductor substrate, said first semiconductor layer, and said second semiconductor layer are made of GaAs.
Claim 4
Dependent Claim
23 words
A method according to claim 2, wherein an impurity concentration of the first semiconductor layer is higher than that of the semiconductor substrate.
Claim 5
Dependent Claim
22 words
A method according to claim 1, wherein said semiconductor substrate, said first semiconductor layer, said second semiconductor layer are made of silicon.
Claim 6
Dependent Claim
23 words
A method according to claim 4, wherein an impurity concentration of the first semiconductor layer is higher than that of the semiconductor substrate.
References Cited (Backward Citations)
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