Patent US4964945A successfully refreshed from Google Patents.
US4964945A
Expired / Lapsed
US
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Lift off patterning process on a flexible substrate
Assignee: 3M Co
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Filing: 1988-12-09
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Granted: 1990-10-23
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Expires: 2008-12-09
Abstract
Abstract A method of providing patterned, thin-film materials on flexible substrates by depositing a first, etchable, integral mask onto a substrate, depositing a second pattern material over the mask region and then removing the mask, such as by etching. Patterned films useful as printed circuits and the like can be prepared by this method. In an alternate embodiment, patterned particles can be prepared for dispersion in a vehicle or matrix using the described process.
Inventors
- 👤 Clyde D. Calhoun
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 18:09
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/02; H05K3/06; H05K3/04; H05K3/046; H05K3/048; C; C23; C23C; C23C14/00; C23C14/04; C23C14/042; C23F; C23F1/00; C23F1/02; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802; Y10T428/29; Y10T428/2982; Y10T428/2991; Y10T428/2993; Y10T428/2998
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
142 words
A method of making a patterned deposit on a flexible substrate comprising the steps of: providing a flexible, sheet-like substrate and integral with at least a portion of one major surface of said sheet a first, etchable masking material which stiffens the flexible substrate and defines physical protrusions generally normal to said surface of said substrate; and depositing over at least a portion of the masked region a second, pattern material chemically different from said first material, said second, pattern material being deposited primarily on said exposed substrate and mask surfaces which are parallel to the plane of said major surface of said substrate,; controlling said deposition so that said mask material is not completely covered or sealed; and applying a chemical agent to selectively etch away said first masking material whereby a pattern of said second material remains on said substrate.
Claim 2
Independent Claim
142 words
A method of making a patterned deposit on a flexible substrate comprising the steps of: providing a flexible, sheet-like substrate and integral with at least a portion of one major surface of said sheet a first, etchable masking material which stiffens the flexible substrate and defines physical protrusions generally normal to said surface of said substrate; and depositing over at least a portion of the masked region a second, pattern material chemically different from said first material, said second, pattern material being deposited primarily on said exposed substrate and mask surfaces which are parallel to the plane of said major surface of said substrate,; controlling said deposition so that said mask material is not completely covered or sealed; and applying a chemical agent to selectively etch away said first masking material whereby a pattern of said second material remains on said substrate.
Claim 3
Dependent Claim
23 words
A method according to claim 1 wherein said deposition is continuous and is accomplished by continuously moving said substrate past a deposition station.
Claim 4
Dependent Claim
13 words
A method according to claim 1 wherein the substrate is a polymeric film.
Claim 5
Dependent Claim
21 words
A method according to claim 3 wherein said polymeric film is selected from the group consisting of polyimide and polyester polymers.
Claim 6
Dependent Claim
22 words
A method according to claim 1 wherein said mask material is selected to provide rigidity and stability to the substrate during patterning.
Claim 7
Dependent Claim
14 words
A method according to claim 5 wherein the mask material is a conductive metal.
Claim 8
Dependent Claim
17 words
A method according to claim 5 wherein the masking material is deposited on the substrate by electroplating.
Claim 9
Dependent Claim
22 words
A method according to claim 5 wherein the masking material is selected from the group consisting of copper and etchable organic materials.
Claim 10
Dependent Claim
21 words
A method according to claim 1 wherein said second material is selected from the group consisting of metals, ceramics, and polymers.
Claim 11
Dependent Claim
25 words
A method according to claim 1 wherein said second material is a material selected from the group consisting of electrically conductive, magnetic, and dielectric materials.
Claim 12
Dependent Claim
28 words
A method according to claim 1 wherein said second pattern material comprises multiple layers wherein at least one layer is chemically different from at least one other layer.
Claim 13
Dependent Claim
24 words
A method according to claim 1 wherein the second material is deposited by a process selected from the group consisting of evaporation and sputtering.
Claim 14
Dependent Claim
18 words
A method according to claim 1 wherein said chemical agent for removing the masking material is an acid.
Claim 15
Dependent Claim
17 words
A method according to claim 13 wherein said mask is copper and said acid is chromic acid.
Claim 16
Independent Claim
135 words
A method of making articles having a shape corresponding to a pre-selected pattern comprising the steps of: providing a substrate and covering at least a portion of said substrate with a first, etchable masking material integral with said substrate, and which includes physical protrusions normal to said surface of said substrate, depositing on at least a portion of the masked region a second, pattern material chemically different from said first masking material, said second pattern material being deposited primarily on said first masking material which is parallel to the surfaces of said substrate; and discontinuing said deposition before all of said masking material is completely covered; and applying a chemical agent to selectively etch away said first masking material underneath said pattern material whereby said pieces of said pattern material are released from said substrate.
Claim 17
Independent Claim
135 words
A method of making articles having a shape corresponding to a pre-selected pattern comprising the steps of: providing a substrate and covering at least a portion of said substrate with a first, etchable masking material integral with said substrate, and which includes physical protrusions normal to said surface of said substrate, depositing on at least a portion of the masked region a second, pattern material chemically different from said first masking material, said second pattern material being deposited primarily on said first masking material which is parallel to the surfaces of said substrate; and discontinuing said deposition before all of said masking material is completely covered; and applying a chemical agent to selectively etch away said first masking material underneath said pattern material whereby said pieces of said pattern material are released from said substrate.
Claim 18
Dependent Claim
25 words
A method according to claim 15 wherein said masking material protrusions define boundaries for said pattern material to be deposited as discrete islands of material.
Claim 19
Dependent Claim
22 words
A method according to claim 15 wherein said pattern pieces are separated from said etching material and said substrate and collected together.
Claim 20
Dependent Claim
16 words
A method according to claim 17 wherein said collected pieces are dispersed in a liquid vehicle.
Claim 21
Dependent Claim
16 words
A method according to claim 17 wherein said collected pieces are dispersed in a polymeric resin.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-10-22 | 1994-04-23 | 1994-10-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-10-22 | 1998-04-23 | 1998-10-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-10-22 | 2002-04-23 | 2002-10-23 | $7700.00 | Window Closed / Lapsed |