Method and apparatus for the ion implantation of spherical surfaces

Claim 3

The method of claim 1 wherein said cleaning step includes the use of solvents, including trichloroethylene and methanol, and also exposing said fixture without said workpieces to bombardment by said ion beam for a predetermined time.

Claim 4

The method of claim 1 wherein said ion beam is a broad electrostatically scanned beam, with uniformity over area from about 5"×5" to about 30"×30" and current densities ranging from about 0.5 uA/cm 2 to about 50 uA/cm 2 .

Claim 5

The method of claim 1 wherein said exposing said workpieces to said ion beam includes randomization effected with the aid of a computer.

Claim 6

The method of claim 1 wherein said plurality of ball cages are being reamed and polished to eliminate imperfections therein.

Claim 7

The method of claim 5 wherein said fixture further includes a cover for said plurality of ball cages, said cover provided with superimposed holes to contain said plurality of spherical workpieces therein.

Claim 8

The method of claim 6 wherein said fixture is designed to be tilted into said ion beam so as to present said plurality of spherical workpieces in the front portions of said plurality of ball cages for about 80% of their dwell time during their said exposure to said ion beam.

Claim 9

The method of claim 3 wherein said ion beam is intermittently on and off during said exposing said spherical workpieces thereto.

Claim 10

The method of claim 1 wherein the current density of said ion beam is between about 0.5 to about 100 microamperes/cm 2 at an energy level ranging from about 10 to about 250 keV, and said exposing said workpieces to said ion beam is for a time period from about 4 to about 100 hours.

Claim 11

The method of claim 1 wherein the ion species of said ion beam include Ti, Ta, C, Cr and N, and the area of the ion beam is up to about 15"×15".

Claim 12

The method of claim 1 wherein said fixture is designed to arrange said plurality of spherical workpieces in a hexagonal pattern for maximum packing.

Claim 13

In an ion implantation device, an apparatus for the ion implantation of spherical workpieces comprising: (a) a work station formed in said ion implantation device; (b) a fixture mounted within said work station and designed to accommodate and present a plurality of spherical workpieces to an ion beam; (c) said fixture comprising a member having first and second surfaces and mounted for motion about two axes normal to each other; (d) one of said two axes of motion being concentric with the axis of said member, and the motion in said one of said two axes being rotational and in said second of said two axes being rocking; (e) a plurality of cages formed in said first surface of said member and designed to accommodate loosely therein said plurality of spherical workpieces; (f) cooling means disposed on said second surface of said member; (g) a cover plate removably secured on said first surface of said member and being provided with a plurality of apertures concentric with said plurality of cages formed in said member; and (h) wherein said plurality of apertures of said cover plate are smaller than said plurality of cages of said member, and wherein said plurality of apertures of said cover plate define the angle of incidence of said ion beam on said spherical workpieces.

Claim 14

In an ion implantation device, an apparatus for the ion implantation of spherical workpieces comprising: (a) a work station formed in said ion implantation device; (b) a fixture mounted within said work station and designed to accommodate and present a plurality of spherical workpieces to an ion beam; (c) said fixture comprising a member having first and second surfaces and mounted for motion about two axes normal to each other; (d) one of said two axes of motion being concentric with the axis of said member, and the motion in said one of said two axes being rotational and in said second of said two axes being rocking; (e) a plurality of cages formed in said first surface of said member and designed to accommodate loosely therein said plurality of spherical workpieces; (f) cooling means disposed on said second surface of said member; (g) a cover plate removably secured on said first surface of said member and being provided with a plurality of apertures concentric with said plurality of cages formed in said member; and (h) wherein said plurality of apertures of said cover plate are smaller than said plurality of cages of said member, and wherein said plurality of apertures of said cover plate define the angle of incidence of said ion beam on said spherical workpieces.

Claim 15

The apparatus of claim 1 further including means to drive said disc in said two axes of motion.

Claim 16

The apparatus of claim 13 further including computer means to control the operation of said drive means.

Claim 17

The apparatus of claim 1 wherein said plurality of cages are formed in said first surface of said member with a hexagonal packing, and wherein said member is a disc.

Claim 18

In an ion implantation device, an apparatus for the ion implantation of spherical workpieces comprising: (a) a fixture mounted within said device and designed to accommodate and present a plurality of spherical workpieces to an ion beam; (b) said fixture comprising a cooling member and a plurality of plates removably secured onto said cooling member, said fixture mounted for motion about two axes normal to each other; (c) one of said two axes of motion being concentric with the axis of said member, and the motion in said one of said two axes being rotational and in said second of said two axes being rocking; (d) a plurality of cages formed in each of said plurality of plates and designed to accommodate loosely therein said plurality of spherical workpieces; (e) a plurality of covers removably secured on each of said plurality of plates and provided with a plurality of apertures concentric with said plurality of cages formed in said plurality of plates, and (f) said plurality of apertures defining an angle of incidence of said ion beam substantially normal to said spherical workpieces.

Claim 19

In an ion implantation device, an apparatus for the ion implantation of spherical workpieces comprising: (a) a fixture mounted within said device and designed to accommodate and present a plurality of spherical workpieces to an ion beam; (b) said fixture comprising a cooling member and a plurality of plates removably secured onto said cooling member, said fixture mounted for motion about two axes normal to each other; (c) one of said two axes of motion being concentric with the axis of said member, and the motion in said one of said two axes being rotational and in said second of said two axes being rocking; (d) a plurality of cages formed in each of said plurality of plates and designed to accommodate loosely therein said plurality of spherical workpieces; (e) a plurality of covers removably secured on each of said plurality of plates and provided with a plurality of apertures concentric with said plurality of cages formed in said plurality of plates, and (f) said plurality of apertures defining an angle of incidence of said ion beam substantially normal to said spherical workpieces.