Patent US4747922A successfully refreshed from Google Patents.
US4747922A
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Confined ion beam sputtering device and method
Assignee: United States Department of Energy
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Filing: 1986-03-25
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Granted: 1988-05-31
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Expires: 2006-03-25
Abstract
Abstract A hollow cylindrical target, lined internally with a sputter deposit material and open at both ends, surrounds a substrate on which sputtered deposition is to be obtained. An ion beam received through either one or both ends of the open cylindrical target is forced by a negative bias applied to the target to diverge so that ions impinge at acute angles at different points of the cylindrical target surface. The ion impingement results in a radially inward and downstream directed flux of sputter deposit particles that are received by the substrate. A positive bias applied to the substrate enhances divergence of the approaching ion beams to generate a higher sputtered deposition flux rate. Alternatively, a negative bias applied to the substrate induces the core portion of the ion beams to reach the substrate and provide ion polishing of the sputtered deposit thereon.
Inventors
- 👤 Donald J. Sharp
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 14:18
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3178; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; H01J37/305
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
125 words
A confined ion beam sputtering device comprising: a hollow cylindrical target having at least an inner wall surface of material selected for ion sputtering; a substrate supported within and electrically insulated from said cylindrical target; a first ion beam source means at one end of the cylindrical target for generating a first ion beam and directing the beam axially into the hollow cylindrical target toward said substrate; first biasing means for electrically biasing said substrate; and second biasing means for electrically biasing said cylindrical target independent of the first biasing means; whereby ions entering the cylindrical target may be electrically deflected circumferentially to impinge on the inner wall surface of the target at acute angles for efficiently sputtering material therefrom for deposit on the substrate.
Claim 2
Dependent Claim
125 words
A confined ion beam sputtering device comprising: a hollow cylindrical target having at least an inner wall surface of material selected for ion sputtering; a substrate supported within and electrically insulated from said cylindrical target; a first ion beam source means at one end of the cylindrical target for generating a first ion beam and directing the beam axially into the hollow cylindrical target toward said substrate; first biasing means for electrically biasing said substrate; and second biasing means for electrically biasing said cylindrical target independent of the first biasing means; whereby ions entering the cylindrical target may be electrically deflected circumferentially to impinge on the inner wall surface of the target at acute angles for efficiently sputtering material therefrom for deposit on the substrate.
Claim 3
Dependent Claim
37 words
A confined ion beam sputtering device as set forth in claim 1, wherein the first and second biasing means are adjustable positively or negatively with respect to each other and to the charge of the ion beam.
Claim 4
Dependent Claim
47 words
A confined ion beam sputtering device as set forth in claim 1, and including a second ion beam source means at the opposite end of the cylindrical target for generating a second ion beam and directing the beam axially into the hollow cylindrical target toward said substrate.
Claim 5
Dependent Claim
37 words
A confined ion beam sputtering device as set forth in claim 3, wherein the first and second biasing means are adjustable positively or negatively with respect to each other and to the charge of the ion beam.
Claim 6
Independent Claim
86 words
A method of sputter deposition of a substrate comprising the steps of: positioning the substrate within a hollow cylindrical target lined with material to be sputtered; directing an ion beam axially into the hollow cylindrical target toward said substrate; and electrically biasing the target and the substrate with respect to each other and the charge of the ion beam to divert the ion beam into impingement with the lined material of the target at acute angles for efficiently sputtering material therefrom for deposit on the subtrate.
Claim 7
Independent Claim
86 words
A method of sputter deposition of a substrate comprising the steps of: positioning the substrate within a hollow cylindrical target lined with material to be sputtered; directing an ion beam axially into the hollow cylindrical target toward said substrate; and electrically biasing the target and the substrate with respect to each other and the charge of the ion beam to divert the ion beam into impingement with the lined material of the target at acute angles for efficiently sputtering material therefrom for deposit on the subtrate.
Claim 8
Dependent Claim
27 words
The method according to claim 5, including directing two ion beams collinearly via opposite open ends of said target toward opposite sides of said substrate located therebetween.
Claim 9
Dependent Claim
61 words
A method according to claim 5, including directing two ion beams coplanarly along intersecting paths via opposite open ends of said target and symmetrically with respect to said target, with said substrate being so located adjacent said cylindrical surface of said target as to receive substantial amounts of target material sputtered off by impingement of said ion beams on said target.
Claim 10
Dependent Claim
34 words
A method of sputter deposition as set forth in claim 5, wherein the target is electrically biased negatively to pull the ion beam circumferentially outwardly into contact with the lined material of the target.
Claim 11
Dependent Claim
33 words
A method of sputter deposition as set forth in claim 5, wherein the substrate is electrically biased positively to diverge the ion beam outwardly into contact with the lined material of the target.
Claim 12
Dependent Claim
43 words
A method of sputter deposition as set forth in claim 5, wherein the substrate is electrically biased negatively and the target is electrically biased negatively such that some of the ions impinge upon the substrate during sputter deposition to perform ion beam polishing.
Claim 13
Dependent Claim
36 words
A method of sputter deposition as set forth in claim 5, and including the step of first electrically biasing the substrate negatively and setting the target bias to ground potential for ion cleaning of the substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-05-31 | 1991-11-30 | 1992-05-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-05-31 | 1995-11-30 | 1996-05-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-05-31 | 1999-11-30 | 2000-05-31 | $7700.00 | Window Closed / Lapsed |