US4359519A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for forming a high resolution recording medium
Assignee: Dr Johannes Heidenhain GmbH
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Filing: 1980-01-29
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Granted: 1982-11-16
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Expires: 2000-01-29
Abstract
Abstract A process for forming a high resolution recording medium including at least a high resolution, patterned interference filter formed from at least two reflecting layers separated by an interference layer including the step of removing patterned portions of a reflective layer not protected by a photosensitive layer by means of chemical etching or ion beam etching. When chemical etching is used, the etching process is accelerated to reduce under-etching by maintaining a rapid, thorough, and continuous boundary surface exchange of the etching solution at the boundary between the etching solution and the reflective layer being etched.
Inventors
- 👤 Heinz Kraus
- 👤 Erich Bayer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 19:40
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/0035; G03C; G03C7/00; Y; Y10; Y10S; Y10S428/00; Y10S428/913; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
219 words
A process for producing a high resolution recording medium comprising the following steps: (a) applying a first reflecting layer of an inorganic material to a first side of a substrate; (b) apply a first layer of photosensitive material to the first reflecting layer; then (c) exposing a patterned portion of the photosensitive material and thereupon developing the photosensitive material; then (d) removing those portions of the first reflecting layer not covered by photosensitive material by wet chemical etching, wherein etching agent is applied to the first reflecting layer as a spray; then (e) removing the remaining photosensitive material; then (f) applying an interference layer to the first side of the substrate, said interference layer having a substantially uniform thickness and comprising an inorganic material which is substantially absorption-free in the visible range of the spectrum; (g) applying at least a second reflecting layer of inorganic material to the interference layer; (h) applying a second layer of photosensitive material to the second reflecting layer; then (i) exposing a patterned portion of the photosensitive material and thereupon developing the photosensitive layer; then (j) removing those portions of the second reflecting layer not covered by photosensitive material by wet chemical etching, wherein etching agent is applied to the second reflecting layer as a spray; and then (k) removing the remaining photosensitive material.
Claim 2
Dependent Claim
219 words
A process for producing a high resolution recording medium comprising the following steps: (a) applying a first reflecting layer of an inorganic material to a first side of a substrate; (b) apply a first layer of photosensitive material to the first reflecting layer; then (c) exposing a patterned portion of the photosensitive material and thereupon developing the photosensitive material; then (d) removing those portions of the first reflecting layer not covered by photosensitive material by wet chemical etching, wherein etching agent is applied to the first reflecting layer as a spray; then (e) removing the remaining photosensitive material; then (f) applying an interference layer to the first side of the substrate, said interference layer having a substantially uniform thickness and comprising an inorganic material which is substantially absorption-free in the visible range of the spectrum; (g) applying at least a second reflecting layer of inorganic material to the interference layer; (h) applying a second layer of photosensitive material to the second reflecting layer; then (i) exposing a patterned portion of the photosensitive material and thereupon developing the photosensitive layer; then (j) removing those portions of the second reflecting layer not covered by photosensitive material by wet chemical etching, wherein etching agent is applied to the second reflecting layer as a spray; and then (k) removing the remaining photosensitive material.
Claim 3
Dependent Claim
60 words
The process of claim 1 wherein each of the removing steps (d) and (j) includes the steps of applying an etching solution to the respective reflecting layer and maintaining a rapid, thorough and continuous boundary surface exchange of the etching solution at the boundary surface of the etching solution adjacent the respective reflecting layer to accelerate the respective removing step.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-11-15 | 1986-05-17 | 1986-11-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-11-15 | 1990-05-17 | 1990-11-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-11-15 | 1994-05-17 | 1994-11-16 | $7700.00 | Window Closed / Lapsed |