Patent US4322276A successfully refreshed from Google Patents.
US4322276A
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Method for producing an inhomogeneous film for selective reflection/transmission of solar radiation
Assignee: Bekaert NV SA
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Filing: 1979-06-20
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Granted: 1982-03-30
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Expires: 1999-06-20
Abstract
Abstract A sputtered thin film coating characterized by a stepwise and/or variable refractive index as a function of film depth. By means of an in-line assembly of planar magnetrons, each magnetron essentially isolated from the others but for a region of sputtering overlap, select materials and combinations of said materials with reactive gases can be continuously deposited upon a dynamic substrate whereby to obtain pre-determined refractive index gradients. Substrates coated with an inhomogeneous thin film exhibit superior non-spectral reflective characteristics particularly desirable for architectural designs and applications.
Inventors
- 👤 Nathan K. Meckel
- 👤 Benjamin B. Meckel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 12:16
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/56; C03; C03C; C03C17/00; C03C17/001; C03C17/002; F; F24; F24S; F24S23/00; F24S23/70; F24S23/82; Y; Y02; Y02E; Y02E10/00; Y02E10/40
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
196 words
A method for sputtering an inhomogeneous thin film laminate upon a transparent substrate which comprises the steps of: (a) positioning a substrate upon a holder within a vacuum chamber, said chamber defined by two or more essentially isolated sub-chambers; (b) adjusting apertures through which said substrate translates into adjacent sub-chambers whereby to form regions of overlap wherein said substrate simultaneously receives sputter deposition from magnetron cathodes contained within adjacent sub-chambers; (c) positioning at least one magnetron cathode within each of said sub-chambers, said cathodes comprising material to be sputter deposited; (d) evacuating said chamber to a predetermined low pressure; (e) flushing said evacuated chamber with non-reactive gas thereby to reduce wall gas impurities contained therein; (f) back filling each of said sub-chambers to predetermined pressures with non-reactive gas; (g) further introducing reactive gas into one or more of said sub-chambers whereby predetermined atmospheres are produced within each of said sub-chambers; (h) differentially pumping said gases through said sub-chambers whereby the predetermined atmospheres within each of said sub-chambers are maintained; and (i) sequentially translating said substrate at a constant rate of speed through each of said sub-chambers whereby an inhomogeneous coating of cathode material is deposited thereon.
Claim 2
Independent Claim
196 words
A method for sputtering an inhomogeneous thin film laminate upon a transparent substrate which comprises the steps of: (a) positioning a substrate upon a holder within a vacuum chamber, said chamber defined by two or more essentially isolated sub-chambers; (b) adjusting apertures through which said substrate translates into adjacent sub-chambers whereby to form regions of overlap wherein said substrate simultaneously receives sputter deposition from magnetron cathodes contained within adjacent sub-chambers; (c) positioning at least one magnetron cathode within each of said sub-chambers, said cathodes comprising material to be sputter deposited; (d) evacuating said chamber to a predetermined low pressure; (e) flushing said evacuated chamber with non-reactive gas thereby to reduce wall gas impurities contained therein; (f) back filling each of said sub-chambers to predetermined pressures with non-reactive gas; (g) further introducing reactive gas into one or more of said sub-chambers whereby predetermined atmospheres are produced within each of said sub-chambers; (h) differentially pumping said gases through said sub-chambers whereby the predetermined atmospheres within each of said sub-chambers are maintained; and (i) sequentially translating said substrate at a constant rate of speed through each of said sub-chambers whereby an inhomogeneous coating of cathode material is deposited thereon.
Claim 3
Dependent Claim
12 words
The method according to claim 1 wherein said non-reactive gas is argon.
Claim 4
Dependent Claim
11 words
The method of claim 1 wherein said reactive gas is oxygen.
Claim 5
Dependent Claim
17 words
The method according to claim 1 wherein said substrate comprises a coil of transparent polymeric sheet material.
Claim 6
Dependent Claim
104 words
The method according to claim 1 wherein said substrate sequentially translates through predetermined atmospheres which comprise: (a) a first reactive sputtering region wherein metallic oxide is deposited upon said substrate; (b) a first overlap region wherein said substrate simultaneously receives sputter deposition from said first reactive region and a first non-reactive sputtering region; (c) a first non-reactive sputtering region wherein metal is deposited upon said substrate; (d) a second overlap region wherein said substrate simultaneously receives sputter deposition from said first non-reactive region and a second reactive sputtering region; and (e) a second reactive sputtering region wherein metallic oxide is deposited upon said substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-03-29 | 1985-09-28 | 1986-03-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-03-29 | 1989-09-28 | 1990-03-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-03-29 | 1993-09-28 | 1994-03-30 | $7700.00 | Window Closed / Lapsed |