Patent US3775201A successfully refreshed from Google Patents.
US3775201A
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Method for polishing semiconductor gallium phosphide planar surfaces
Assignee: International Business Machines Corp
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Filing: 1971-10-26
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Granted: 1973-11-27
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Expires: 1991-10-26
Abstract
Abstract An improved method for polishing gallium phosphide planar surfaces is disclosed comprising positioning gallium phosphide wafers or slices in close adjacency to a polishing medium providing a relative motion between said wafer and polishing medium while providing a controlled predetermined flow of OBr ions to said wafers and polishing medium and continuing the relative motion until the wafer surface is polished to a smooth and featureless condition whereupon the wafers are washed and removed from the polishing mechanism.
Inventors
- 👤 J Basi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 17:45
CPC Classifications
H; H10; H10P; H10P52/00; H10P52/40; H10P52/402
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
15 words
A method in accordance with claim 1 wherein said oxybromide polishing solution is potassium oxybromide.
Claim 2
Dependent Claim
15 words
A method in accordance with claim 1 wherein said oxybromide polishing solution is sodium oxybromide.
Claim 3
Dependent Claim
15 words
A method in accordance with claim 1 wherein said oxybromide polishing solution is calcium oxybromide.
Claim 4
Dependent Claim
15 words
A method in accordance with claim 1 wherein said oxybromide polishing solution is lithium oxybromide.
Claim 5
Independent Claim
65 words
A method for polishing gallium phosphide surfaces comprising mounting said gallium phosphide upon a surface polishing means providing a flow of an oxybromide solution selected from the group consisting of potassium oxybromide, sodium oxybromide, calcium oxybromide and lithium oxybromide, and an alkali metal solution onto the gallium phosphide while polishing the said gallium phosphide, washing in situ and removing said gallium phosphide from polishing means.
Claim 6
Dependent Claim
15 words
A method in accordance with claim 6 wherein said alkali metal solution is sodium carbonate.
Claim 7
Dependent Claim
15 words
A method in accordance with claim 6 wherein said alkali metal solution is sodium hydroxide.
References Cited (Backward Citations)
US3262825A
Cited
US3629023A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-11-26 | 1977-05-28 | 1977-11-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-11-26 | 1981-05-28 | 1981-11-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-11-26 | 1985-05-28 | 1985-11-27 | $7700.00 | Window Closed / Lapsed |