Ion beam deposition unit
Abstract
Abstract AN ION BEAM DEPOSITION APPARATUS WHEREIN A SUPPLY OF IONS IS GENERATED AND PURIFIED IN AN ION SOURCE; EXTRACTED AND ACCELERATED FROM THE ION SOURCE BY A FIRST PAIR OF CONCENTRIC HEMISPHERICAL ELECTRODES; FOCUSED INTO AN ION BEAM BY A SECOND PAIR OF CONCENTRIC HEMISPHERICAL ELECTRODES AND SELECTIVELY DEFLECTED BY A PAIR OF PLANAR ELECTROSTATIC DEFLECTION PLATES TO FORM A CIRCUIT PATTERN UPON A SUBSTRATE. THE IONS ARE GENERATED IN THE ION SOURCE BY HEATING A DEPOSITION MATERIAL TO A TEMPERATURE SUFFICIENT TO INITIATE VAPORIZATION AND BY ESTABLISHING A LOCALIZED ARC DISCHARGE BETWEEN AN ELECTRODE AND THE DEPOSITION MATERIAL TO INCREASE VAPORIZATION AND TO IONIZE THE VAPORIZED ATOMS TO CREATE A UNIFORMLY CHARGED SPECIES OF IONS.
Inventors
- 👤 James W Bieber
- 👤 Douglas E Fishkin
- 👤 Allan R Wolter
- 👤 Darrell M Scattergood
Bibliographic Details
Claims Analysis
Total Claims: 0References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-03-29 | 1974-09-28 | 1975-03-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-03-29 | 1978-09-28 | 1979-03-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-03-29 | 1982-09-28 | 1983-03-30 | $7700.00 | Window Closed / Lapsed |