Patent US3135638A successfully refreshed from Google Patents.
US3135638A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photochemical semiconductor mesa formation
Assignee: Raytheon Co
•
Filing: 1960-10-27
•
Granted: 1964-06-02
•
Expires: 1980-10-27
Abstract
No abstract record available.
Inventors
- 👤 Preston V Cheney
- 👤 John G Quetsch
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 19:05
CPC Classifications
H; H10; H10P; H10P95/00; H10P50/00; H10P50/60; H10P50/64; H10P50/642; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; H10W; H10W74/00; H10W74/40; H10W74/43; Y; Y10; Y10S; Y10S148/00; Y10S148/043; Y10S148/106
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
160 words
A PROCESS FOR PRODUCING A MESA FORMATION ON A GERMANIUM BODY, WHICH COMPRISES: FORMING A FIRST FILM OF SILICON OXIDE ON A SURFACE OF SAID BODY; FORMING A SECOND FILM OF A METAL WHICH MAY BE SELECTIVELY ETHCHED IN THE PRESENCE OF GERMANIUM AND SILICON OXIDE, AND WHICH SELECTIVELY RESISTS GERMANIUM AND SILICON OXIDE ETCHANTS, ON SAID FIRST FILM, FORMING A THIRD FILM OF PHOTOSENSITIVE POLYMERIZABLE MATERIAL ON SAID SECOND FILM; EXPOSING A PORTION OF SAID THIRD FILM TO SUFFICIENT LIGHT TO POLYMERIZE SAID PORTION; DEVELOPING SAID THIRD FILM TO REMOVE THE UNPOLYMERIZED PORTION OF SAID THIRD FILM; SELECTIVELY REMOVING THE PORTION OF SAID SECOND FILM UNCOVERED BY REMOVING SAID UNPOLYMERIZED THIRD FILM PORTION; REMOVING THE PORTIONS OF SAID FIRST FILM UNCOVERED BY REMOVING SAID PORTION OF SAID METAL FILM; AND REMOVING A PORTION OF THE GERMANIUM BODY ADJACENT THE SURFACE THEREOF UNCOVERED BY REMOVING SAID PORTION OF SAID FIRST FILM, WHEREBY TO FORM A MESS ON SAID GERMANIUM BODY.
Claim 2
Dependent Claim
160 words
A PROCESS FOR PRODUCING A MESA FORMATION ON A GERMANIUM BODY, WHICH COMPRISES: FORMING A FIRST FILM OF SILICON OXIDE ON A SURFACE OF SAID BODY; FORMING A SECOND FILM OF A METAL WHICH MAY BE SELECTIVELY ETHCHED IN THE PRESENCE OF GERMANIUM AND SILICON OXIDE, AND WHICH SELECTIVELY RESISTS GERMANIUM AND SILICON OXIDE ETCHANTS, ON SAID FIRST FILM, FORMING A THIRD FILM OF PHOTOSENSITIVE POLYMERIZABLE MATERIAL ON SAID SECOND FILM; EXPOSING A PORTION OF SAID THIRD FILM TO SUFFICIENT LIGHT TO POLYMERIZE SAID PORTION; DEVELOPING SAID THIRD FILM TO REMOVE THE UNPOLYMERIZED PORTION OF SAID THIRD FILM; SELECTIVELY REMOVING THE PORTION OF SAID SECOND FILM UNCOVERED BY REMOVING SAID UNPOLYMERIZED THIRD FILM PORTION; REMOVING THE PORTIONS OF SAID FIRST FILM UNCOVERED BY REMOVING SAID PORTION OF SAID METAL FILM; AND REMOVING A PORTION OF THE GERMANIUM BODY ADJACENT THE SURFACE THEREOF UNCOVERED BY REMOVING SAID PORTION OF SAID FIRST FILM, WHEREBY TO FORM A MESS ON SAID GERMANIUM BODY.
References Cited (Backward Citations)
US1857929A
Cited
US1922434A
Cited
US2215128A
Cited
US2731333A
Cited
US2799637A
Cited
US2968555A
Cited
US2899344A
Cited
US3012920A
Cited
US3079254A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1967-06-02 | 1967-12-02 | 1968-06-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1971-06-02 | 1971-12-02 | 1972-06-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1975-06-02 | 1975-12-02 | 1976-06-02 | $7700.00 | Window Closed / Lapsed |