Abstract The present invention provides a production method of a metal foil comprising the steps of: depositing component particles from a deposition source material consisting of predetermined metal components in a vapor phase onto a substrate disposed to face the deposition source material and having an inert surface moving continuously, by a physical vapor phase deposition method in vacuum or in an inert gas atmosphere so as to form sequentially a thin film having a predetermined film thickness; and peeling off the thin film from the substrate surface to obtain a metal foil. The metal foils thus obtained may be in the state of an amorphous phase, a crystalline phase or a composite thereof by adjusting the gas pressure inside the apparatus, the distance between the substrate surface and the deposition source material, etc. Particularly, metal foils having at least 50 vol.% of an amorphous phase or a surface roughness (Rmax) not greater than 0.2 µm are very useful for various industrial applications because of their superior properties.
A production method of a metal foil comprising the steps of: depositing component particles from a deposition source material consisting of predetermined metal components within the range of from one of the ends to the other of a substrate disposed to face said deposition source material and having an inert surface moving continuously, by a physical vapor phase deposition method in vacuum or in an inert gas atmosphere so as to form sequentially a thin film having a predetermined film thickness; and peeling off said thin film from said substrate surface to obtain said metal foil.
Claim 2
Dependent Claim
96 words
A production method of a metal foil comprising the steps of: depositing component particles from a deposition source material consisting of predetermined metal components within the range of from one of the ends to the other of a substrate disposed to face said deposition source material and having an inert surface moving continuously, by a physical vapor phase deposition method in vacuum or in an inert gas atmosphere so as to form sequentially a thin film having a predetermined film thickness; and peeling off said thin film from said substrate surface to obtain said metal foil.
Claim 3
Dependent Claim
43 words
A production method of a metal foil according to claim 1, wherein said deposition source material is disposed at a predetermined distance from said substrate surface, and said metal foil consists of a composite having at least 50% (vol%) of an amorphous phase.
Claim 4
Dependent Claim
93 words
A metal foil produced by depositing component particles from a deposition source material consisting of predetermined metal components onto a substrate disposed to face said deposition source material by a physical vapor phase deposition method in vacuum or in an inert gas atmosphere so as to form sequentially a thin film having a predetermined film thickness and then peeling off said thin film from said substrate surface to obtain said metal foil, the maximum height (Rmax) of the surface roughness of both faces of said metal foil being not greater than 0.2 µm.
Claim 5
Dependent Claim
93 words
A metal foil produced by depositing component particles from a deposition source material consisting of predetermined metal components onto a substrate disposed to face said deposition source material by a physical vapor phase deposition method in vacuum or in an inert gas atmosphere so as to form sequentially a thin film having a predetermined film thickness and then peeling off said thin film from said substrate surface to obtain said metal foil, the maximum height (Rmax) of the surface roughness of both faces of said metal foil being not greater than 0.2 µm.
Claim 6
Dependent Claim
20 words
A metal foil according to Claim 3, wherein the thickness of said metal foil is from 2 to 10 µm.
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