US6402806B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for unreacted precursor conversion and effluent removal
Assignee: Applied Materials Inc
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Filing: 2000-06-30
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Granted: 2002-06-11
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Expires: 2020-06-30
Abstract
Abstract A hot trap converts unreacted organic metal-film precursor from the exhaust stream of a CVD process. The converted precursor forms a metal film on the surface of the hot trap, thereby protecting hot vacuum pump surfaces from metal build up. A cold trap downstream from the hot trap freezes effluents from the exhaust stream. The metal captured by the hot trap and the effluents captured by the cold trap may then be recycled, rather than being released as environmental emissions.
Inventors
- 👤 John Vincent Schmitt
- 👤 Ling Chen
- 👤 George Michael Bleyle
- 👤 Yu Cong
- 👤 Alfred Mak
- 👤 Mei Chang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 02:45
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/4412; C23C16/455; C23C16/45561; B; B01; B01D; B01D53/00; B01D53/002; B01D53/34; B01D53/46; B01D53/72; C23C16/4401; C23C16/4404; C23C16/45593; C30; C30B; C30B25/00; C30B25/02; C30B25/14; H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32798; H01J37/32816; H01J37/32834
Claims Analysis
Total Claims: 36
Claim 1
Independent Claim
119 words
A method for converting unreacted metal-film precursor from an effluent stream and abating emissions from a chemical vapor deposition chamber, the method comprising: (a) flowing the effluent stream over a hot surface of a hot trap, the hot surface being maintained at a first temperature; (b) forming a metal film and an emission product from the unreacted metal-film precursor, the metal film being formed on the hot surface and the emission product being volatile at the first temperature and freezing at a second temperature; (c) thereafter, flowing the effluent stream over a cold surface of a cold trap, the cold surface being maintained at or below the second temperature; and (d) freezing the emission product onto the cold surface.
Claim 2
Independent Claim
119 words
A method for converting unreacted metal-film precursor from an effluent stream and abating emissions from a chemical vapor deposition chamber, the method comprising: (a) flowing the effluent stream over a hot surface of a hot trap, the hot surface being maintained at a first temperature; (b) forming a metal film and an emission product from the unreacted metal-film precursor, the metal film being formed on the hot surface and the emission product being volatile at the first temperature and freezing at a second temperature; (c) thereafter, flowing the effluent stream over a cold surface of a cold trap, the cold surface being maintained at or below the second temperature; and (d) freezing the emission product onto the cold surface.
Claim 3
Dependent Claim
48 words
The method of claim 1 further comprising: (e) monitoring a flow resistance through the cold trap; (f) stopping the effluent stream from flowing through the cold trap when the flow resistance meets or exceeds a predetermined limit; and (g) flowing the effluent stream through a bypass cold trap.
Claim 4
Dependent Claim
44 words
The method of claim 1 further comprising: (e) a vacuum pump coupled between the hot trap and the cold trap, wherein the effluent stream flows from the hot trap to the vacuum pump; and (f) thereafter, flowing the effluent stream through the cold trap.
Claim 5
Dependent Claim
19 words
The method of claim 3 wherein the vacuum pump is maintained at a third temperature above the second temperature.
Claim 6
Dependent Claim
29 words
The method of claim 1 further comprising: (e) a vacuum pump coupled to the cold trap, wherein the effluent stream flows from the cold trap to the vacuum pump.
Claim 7
Dependent Claim
16 words
The method of claim 1 wherein the unreacted metal-film precursor includes copper and a hexafluoro-organic compound.
Claim 8
Dependent Claim
14 words
The method of claim 6 wherein the unreacted metal-film precursor includes Cu + (TMVS)(hfac).
Claim 9
Dependent Claim
19 words
The method of claim 6 wherein the effluent stream includes the unreacted metal-film precursor, the hexafluoro-organic compound and TMVS.
Claim 10
Dependent Claim
13 words
The method of claim 1 wherein the emission product includes a hexafluoro-organic compound.
Claim 11
Dependent Claim
15 words
The method of claim 9 wherein the hexafluoro-organic compound includes Cu 2+ (hfac) 2 .
Claim 12
Dependent Claim
11 words
The method of claim 10 wherein the hexafluoro-organic compound includes hfac-dihydrate.
Claim 13
Dependent Claim
11 words
The method of claim 1 wherein the emission product includes TMVS.
Claim 14
Dependent Claim
13 words
The method of claim 1 wherein the first temperature is above 200° C.
Claim 15
Dependent Claim
14 words
The method of claim 13 wherein the first temperature is about 250° C.-260° C.
Claim 16
Dependent Claim
13 words
The method of claim 1 wherein the second temperature is below 70° C.
Claim 17
Dependent Claim
24 words
The method of claim 1 further comprising, after flowing the effluent stream over said cold surface, flowing the effluent stream through a burn box.
Claim 18
Independent Claim
137 words
A method for abating and recovery of effluents from a copper CVD process, comprising: (a) flowing an effluent stream from the copper CVD process over a hot surface of a hot trap, the hot surface being maintained at a first temperature, wherein said effluent stream includes an unreacted copper precursor; (b) forming a copper film, a first emission product and a second emission product from the unreacted copper precursor, the copper film being formed on the hot surface and the first and second emission products being volatile at the first temperature and the first emission product freezing at a second temperature; (c) thereafter, flowing the effluent stream over a cold surface of a cold trap, the cold surface being maintained at or below the second temperature; and (d) freezing the first emission product onto the cold surface.
Claim 19
Independent Claim
137 words
A method for abating and recovery of effluents from a copper CVD process, comprising: (a) flowing an effluent stream from the copper CVD process over a hot surface of a hot trap, the hot surface being maintained at a first temperature, wherein said effluent stream includes an unreacted copper precursor; (b) forming a copper film, a first emission product and a second emission product from the unreacted copper precursor, the copper film being formed on the hot surface and the first and second emission products being volatile at the first temperature and the first emission product freezing at a second temperature; (c) thereafter, flowing the effluent stream over a cold surface of a cold trap, the cold surface being maintained at or below the second temperature; and (d) freezing the first emission product onto the cold surface.
Claim 20
Dependent Claim
48 words
The method of claim 17 further comprising: (e) monitoring a flow resistance through the cold trap; (f) stopping the effluent stream from flowing through the cold trap when the flow resistance meets or exceeds a predetermined limit; and (g) flowing the effluent stream through a bypass cold trap.
Claim 21
Dependent Claim
36 words
The method of claim 17 further comprising: (e) after flowing the effluent stream over said cold surface, flowing the effluent stream through a burn box; and (f) thereafter, flowing the effluent stream through a wet scrubber.
Claim 22
Dependent Claim
44 words
The method of claim 17 further comprising: (e) a vacuum pump coupled between the hot trap and the cold trap, wherein the effluent stream flows from the hot trap to the vacuum pump; and (f) thereafter, flowing the effluent stream through the cold trap.
Claim 23
Dependent Claim
19 words
The method of claim 20 wherein the vacuum pump is maintained at a third temperature above the second temperature.
Claim 24
Dependent Claim
29 words
The method of claim 17 further comprising: (e) a vacuum pump coupled to the cold trap, wherein the effluent stream flows from the cold trap to the vacuum pump.
Claim 25
Dependent Claim
16 words
The method of claim 17 wherein the unreacted copper precursor includes copper and a hexafluoro-organic compound.
Claim 26
Dependent Claim
14 words
The method of claim 23 wherein the unreacted copper precursor includes Cu + (TMVS)(hfac).
Claim 27
Dependent Claim
19 words
The method of claim 23 wherein the effluent stream includes the unreacted copper precursor, the hexafluoro-organic compound and TMVS.
Claim 28
Dependent Claim
15 words
The method of claim 17 wherein the first emission product includes a hexafluoro organic compound.
Claim 29
Dependent Claim
15 words
The method of claim 26 wherein the hexafluoro-organic compound includes Cu 2+ (hfac) 2 .
Claim 30
Dependent Claim
11 words
The method of claim 27 wherein the hexafluoro-organic compound includes hfac-dihydrate.
Claim 31
Dependent Claim
12 words
The method of claim 17 wherein the second emission product includes TMVS.
Claim 32
Dependent Claim
13 words
The method of claim 17 wherein the first temperature is above 200° C.
Claim 33
Dependent Claim
14 words
The method of claim 29 wherein the first temperature is about 250° C.-260° C.
Claim 34
Dependent Claim
13 words
The method of claim 17 wherein the second temperature is below 70° C.
Claim 35
Dependent Claim
13 words
The method of claim 17 wherein the third temperature is above 80° C.
Claim 36
Dependent Claim
24 words
The method of claim 17 further comprising, after flowing the effluent stream over said cold surface, flowing the effluent stream through a burn box.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2005-06-10 | 2005-12-10 | 2006-06-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-06-10 | 2009-12-10 | 2010-06-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-06-10 | 2013-12-10 | 2014-06-11 | $7700.00 | Window Closed / Lapsed |