US5940651A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Drip catching apparatus for receiving excess photoresist developer solution
Assignee: Advanced Micro Devices Inc
•
Filing: 1998-02-13
•
Granted: 1999-08-17
•
Expires: 2018-02-13
Abstract
Abstract A drip catching apparatus includes a trough 2 formed by a sidewall 26 and a drip catching surface 28 to prevent excess drops of a photoresist developer solution from dripping onto a semiconductor wafer 8 in a photoresist development cup 4. One or more holes 30 may be provided to drain the photoresist developer solution received by the drip trough 2.
Inventors
- 👤 Christopher Lee Pike
- 👤 David Ashby Steele
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 07:01
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0448; B; B05; B05C; B05C11/00; B05C11/02; B05C11/08; B05C11/10; B05C11/1039; G; G03; G03F; G03F7/00; G03F7/26; G03F7/30
Claims Analysis
Total Claims: 90
Claim 1
Independent Claim
57 words
An apparatus, comprising: (a) a cup defined by a base, a sidewall and an open top; (b) a wafer holder on the base of the cup; (c) a drip trough connected to the sidewall of the cup, the drip trough having a drip catching surface facing the open top and extending from the sidewall of the cup.
Claim 2
Independent Claim
57 words
An apparatus, comprising: (a) a cup defined by a base, a sidewall and an open top; (b) a wafer holder on the base of the cup; (c) a drip trough connected to the sidewall of the cup, the drip trough having a drip catching surface facing the open top and extending from the sidewall of the cup.
Claim 3
Dependent Claim
23 words
The apparatus of claim 1, further comprising a dispense nozzle capable of being positioned to dispense a developer solution onto the wafer holder.
Claim 4
Dependent Claim
16 words
The apparatus of claim 2, wherein the dispense nozzle is movable with respect to the cup.
Claim 5
Dependent Claim
20 words
The apparatus of claim 1, wherein the drip trough further includes at least one hole in the drip catching surface.
Claim 6
Dependent Claim
19 words
The apparatus of claim 4, wherein the at least one hole is positioned adjacent the sidewall of the cup.
Claim 7
Dependent Claim
16 words
The apparatus of claim 4, further comprising a drain line connected to the least one hole.
Claim 8
Dependent Claim
20 words
The apparatus of claim 1, wherein the drip catching surface forms an acute angle with the sidewall of the cup.
Claim 9
Dependent Claim
25 words
The apparatus of claim 1, wherein the drip catching surface is positioned to extend upward from the sidewall to the open top of the cup.
Claim 10
Dependent Claim
16 words
The apparatus of claim 1, wherein the wafer holder is adapted to support a semiconductor wafer.
Claim 11
Dependent Claim
24 words
The apparatus of claim 9, further comprising a dispense nozzle capable of being positioned to dispense a photoresist developer solution onto the semiconductor wafer.
Claim 12
Dependent Claim
16 words
The apparatus of claim 10, wherein the dispense nozzle is movable with respect to the cup.
Claim 13
Dependent Claim
20 words
The apparatus of claim 1, further comprising a deflecting surface on the base of the cup below the drip trough.
Claim 14
Dependent Claim
11 words
The apparatus of claim 1, wherein the cup is substantially cylindrical.
Claim 15
Dependent Claim
21 words
The apparatus of claim 13, wherein the drip trough comprises a substantially annular trough immediately adjacent the sidewall of the cup.
Claim 16
Dependent Claim
46 words
The apparatus of claim 13, further comprising an additional drip trough, the drip troughs comprising respective substantially semi-annular troughs immediately adjacent the sidewall of the cup, the semi-annular troughs having respective drip catching surfaces facing the open top and extending from the sidewall of the cup.
Claim 17
Dependent Claim
20 words
The apparatus of claim 15, wherein the drip troughs further include a plurality of holes in the drip catching surfaces.
Claim 18
Dependent Claim
16 words
The apparatus of claim 16, wherein the holes are positioned adjacent the sidewall of the cup.
Claim 19
Dependent Claim
77 words
A photoresist drip catching apparatus, comprising: (a) a photoresist development cup defined by a base, a sidewall, and an open top opposite the base; (b) a wafer holder on the base of the photoresist development cup; (c) a drip trough connected to the sidewall of the photoresist development cup, the drip trough comprising a sidewall and a drip catching surface extending from the sidewall of the drip trough to the open top of the photoresist development cup.
Claim 20
Dependent Claim
77 words
A photoresist drip catching apparatus, comprising: (a) a photoresist development cup defined by a base, a sidewall, and an open top opposite the base; (b) a wafer holder on the base of the photoresist development cup; (c) a drip trough connected to the sidewall of the photoresist development cup, the drip trough comprising a sidewall and a drip catching surface extending from the sidewall of the drip trough to the open top of the photoresist development cup.
Claim 21
Dependent Claim
23 words
The apparatus of claim 18, further comprising a dispense nozzle capable of being positioned to dispense a developer solution onto the wafer holder.
Claim 22
Dependent Claim
18 words
The apparatus of claim 19, wherein the dispense nozzle is movable with respect to the photoresist development cup.
Claim 23
Dependent Claim
20 words
The apparatus of claim 18, wherein the drip trough further includes at least one hole in the drip catching surface.
Claim 24
Dependent Claim
20 words
The apparatus of claim 21, wherein the at least one hole is positioned adjacent the sidewall of the drip trough.
Claim 25
Dependent Claim
17 words
The apparatus of claim 21, further comprising a drain line connected to the at least one hole.
Claim 26
Dependent Claim
21 words
The apparatus of claim 18, wherein the drip catching surface forms an acute angle with the sidewall of the drip trough.
Claim 27
Dependent Claim
16 words
The apparatus of claim 18, wherein the wafer holder is adapted to support a semiconductor wafer.
Claim 28
Dependent Claim
25 words
The apparatus of claim 25, further comprising a developer dispense nozzle capable of being positioned to dispense a photoresist developer solution onto the semiconductor wafer.
Claim 29
Dependent Claim
19 words
The apparatus of claim 26, wherein the developer dispense nozzle is movable with respect to the photoresist development cup.
Claim 30
Dependent Claim
20 words
The apparatus of claim 18, further comprising a deflecting surface on the base of the cup below the drip trough.
Claim 31
Dependent Claim
23 words
The apparatus of claim 18, wherein the drip trough comprises a substantially annular trough immediately adjacent the sidewall of the photoresist development cup.
Claim 32
Dependent Claim
57 words
The apparatus of claim 18, further comprising an additional drip trough, the drip troughs comprising respective substantially semi-annular troughs immediately adjacent the sidewall of the photoresist development cup, the semi-annular troughs comprising respective sidewalls and drip catching surfaces facing the open top of the photoresist development cup and extending from the sidewalls of the respective drip troughs.
Claim 33
Dependent Claim
20 words
The apparatus of claim 30, wherein the drip troughs further include a plurality of holes in the drip catching surfaces.
Claim 34
Dependent Claim
17 words
The apparatus of claim 31, wherein the holes are positioned adjacent the sidewalls of the drip troughs.
Claim 35
Dependent Claim
13 words
The apparatus of claim 18, wherein the photoresist development cup is substantially cylindrical.
Claim 36
Independent Claim
107 words
An apparatus for applying a photoresist developer solution to a semiconductor wafer, comprising: (a) a photoresist development cup defined by a base, a sidewall and an open top; (b) a wafer holder on the base of the photoresist development cup adapted to support the semiconductor wafer; (c) a drip trough connected to the sidewall of the photoresist development cup, the drip trough comprising a sidewall and a drip catching surface extending from the sidewall of the drip trough to the open top of the photoresist development cup; and (d) a developer dispense nozzle capable of being positioned to dispense the photoresist developer solution onto the semiconductor wafer.
Claim 37
Independent Claim
107 words
An apparatus for applying a photoresist developer solution to a semiconductor wafer, comprising: (a) a photoresist development cup defined by a base, a sidewall and an open top; (b) a wafer holder on the base of the photoresist development cup adapted to support the semiconductor wafer; (c) a drip trough connected to the sidewall of the photoresist development cup, the drip trough comprising a sidewall and a drip catching surface extending from the sidewall of the drip trough to the open top of the photoresist development cup; and (d) a developer dispense nozzle capable of being positioned to dispense the photoresist developer solution onto the semiconductor wafer.
Claim 38
Dependent Claim
19 words
The apparatus of claim 34, wherein the developer dispense nozzle is movable with respect to the photoresist development cup.
Claim 39
Dependent Claim
27 words
The apparatus of claim 34, wherein the drip trough further includes at least one hole in the drip catching surface positioned to drain the photoresist developer solution.
Claim 40
Dependent Claim
20 words
The apparatus of claim 36, wherein the at least one hole is positioned adjacent the sidewall of the drip trough.
Claim 41
Dependent Claim
16 words
The apparatus of claim 36, further comprising a drain line connected to the least one hole.
Claim 42
Dependent Claim
21 words
The apparatus of claim 34, wherein the drip catching surface forms an acute angle with the sidewall of the drip trough.
Claim 43
Dependent Claim
20 words
The apparatus of claim 34, further comprising a deflecting surface on the base of the cup below the drip trough.
Claim 44
Dependent Claim
13 words
The apparatus of claim 34, wherein the photoresist development cup is substantially cylindrical.
Claim 45
Dependent Claim
23 words
The apparatus of claim 41, wherein the drip trough comprises a substantially annular trough immediately adjacent the sidewall of the photoresist development cup.
Claim 46
Dependent Claim
57 words
The apparatus of claim 41, further comprising an additional drip trough, the drip troughs comprising respective substantially semi-annular troughs immediately adjacent the sidewall of the photoresist development cup, the semi-annular troughs comprising respective sidewalls and drip catching surfaces facing the open top of the photoresist development cup and extending from the sidewalls of the respective drip troughs.
Claim 47
Dependent Claim
27 words
The apparatus of claim 43, wherein the drip troughs further include a plurality of holes in the drip catching surfaces positioned to drain the photoresist developer solution.
Claim 48
Dependent Claim
17 words
The apparatus of claim 44, wherein the holes are positioned adjacent the sidewalls of the drip troughs.
Claim 49
Dependent Claim
82 words
A photoresist drip catching apparatus, comprising: (a) a photoresist development cup defined by a base, a sidewall and an open top; (b) a wafer holder on the base of the photoresist development cup; (c) a drip trough connected to the sidewall of the photoresist development cup, the drip trough having a drip catching surface facing the open top and extending from the sidewall of the photoresist development cup, the drip trough further including at least one hole in the drip catching surface.
Claim 50
Dependent Claim
82 words
A photoresist drip catching apparatus, comprising: (a) a photoresist development cup defined by a base, a sidewall and an open top; (b) a wafer holder on the base of the photoresist development cup; (c) a drip trough connected to the sidewall of the photoresist development cup, the drip trough having a drip catching surface facing the open top and extending from the sidewall of the photoresist development cup, the drip trough further including at least one hole in the drip catching surface.
Claim 51
Dependent Claim
25 words
The apparatus of claim 46, further comprising a developer dispense nozzle capable of being positioned to dispense a photoresist developer solution onto the wafer holder.
Claim 52
Dependent Claim
19 words
The apparatus of claim 47, wherein the developer dispense nozzle is movable with respect to the photoresist development cup.
Claim 53
Dependent Claim
21 words
The apparatus of claim 46, wherein the at least one hole is positioned adjacent the sidewall of the photoresist development cup.
Claim 54
Dependent Claim
16 words
The apparatus of claim 46, further comprising a drain line connected to the least one hole.
Claim 55
Dependent Claim
22 words
The apparatus of claim 46, wherein the drip catching surface forms an acute angle with the sidewall of the photoresist development cup.
Claim 56
Dependent Claim
27 words
The apparatus of claim 46, wherein the drip catching surface is positioned to extend upward from the sidewall to the open top of the photoresist development cup.
Claim 57
Dependent Claim
16 words
The apparatus of claim 46, wherein the wafer holder is adapted to support a semiconductor wafer.
Claim 58
Dependent Claim
25 words
The apparatus of claim 53, further comprising a developer dispense nozzle capable of being positioned to dispense a photoresist developer solution onto the semiconductor wafer.
Claim 59
Dependent Claim
19 words
The apparatus of claim 54, wherein the developer dispense nozzle is movable with respect to the photoresist development cup.
Claim 60
Dependent Claim
20 words
The apparatus of claim 46, further comprising a deflecting surface on the base of the cup below the drip trough.
Claim 61
Dependent Claim
13 words
The apparatus of claim 46, wherein the photoresist development cup is substantially cylindrical.
Claim 62
Dependent Claim
23 words
The apparatus of claim 57, wherein the drip trough comprises a substantially annular trough immediately adjacent the sidewall of the photoresist development cup.
Claim 63
Dependent Claim
50 words
The apparatus of claim 58, further comprising an additional drip trough, the drip troughs comprising respective substantially semi-annular troughs immediately adjacent the sidewall of the photoresist development cup, the semi-annular troughs having respective drip catching surfaces facing the open top and extending from the sidewall of the photoresist development cup.
Claim 64
Dependent Claim
95 words
A photoresist drip catching apparatus, comprising: (a) a substantially cylindrical photoresist development cup defined by a base, a sidewall substantially perpendicular to the base, and an open top opposite the base; (b) a wafer holder on the base of the photoresist development cup; and (c) two substantially semi-annular drip troughs connected to the sidewall of the photoresist development cup, the drip troughs having respective drip catching surfaces facing the open top and extending from the sidewall of the photoresist development cup, the drip troughs further including a plurality of holes in the drip catching surfaces.
Claim 65
Dependent Claim
95 words
A photoresist drip catching apparatus, comprising: (a) a substantially cylindrical photoresist development cup defined by a base, a sidewall substantially perpendicular to the base, and an open top opposite the base; (b) a wafer holder on the base of the photoresist development cup; and (c) two substantially semi-annular drip troughs connected to the sidewall of the photoresist development cup, the drip troughs having respective drip catching surfaces facing the open top and extending from the sidewall of the photoresist development cup, the drip troughs further including a plurality of holes in the drip catching surfaces.
Claim 66
Dependent Claim
25 words
The apparatus of claim 60, further comprising a developer dispense nozzle capable of being positioned to dispense a photoresist developer solution onto the wafer holder.
Claim 67
Dependent Claim
19 words
The apparatus of claim 61, wherein the developer dispense nozzle is movable with respect to the photoresist development cup.
Claim 68
Dependent Claim
18 words
The apparatus of claim 60, wherein the holes are positioned adjacent the sidewall of the photoresist development cup.
Claim 69
Dependent Claim
18 words
The apparatus of claim 60, further comprising a plurality of drain lines connected to the plurality of holes.
Claim 70
Dependent Claim
21 words
The apparatus of claim 60, wherein the drip catching surfaces form acute angles with the sidewall of the photoresist development cup.
Claim 71
Dependent Claim
27 words
The apparatus of claim 60, wherein the drip catching surfaces are positioned to extend upward from the sidewall to the open top of the photoresist development cup.
Claim 72
Dependent Claim
16 words
The apparatus of claim 60, wherein the wafer holder is adapted to support a semiconductor wafer.
Claim 73
Dependent Claim
25 words
The apparatus of claim 67, further comprising a developer dispense nozzle capable of being positioned to dispense a photoresist developer solution onto the semiconductor wafer.
Claim 74
Dependent Claim
19 words
The apparatus of claim 68, wherein the developer dispense nozzle is movable with respect to the photoresist development cup.
Claim 75
Dependent Claim
20 words
The apparatus of claim 60, further comprising a deflecting surface on the base of the cup below the drip trough.
Claim 76
Independent Claim
141 words
An apparatus for applying a photoresist developer solution to a semiconductor wafer, comprising: (a) a substantially cylindrical photoresist development cup defined by a base, a sidewall substantially perpendicular to the base, and an open top opposite the base; (b) a wafer holder on the base of the photoresist development cup adapted to support the semiconductor wafer; (c) a drip trough connected to the sidewall of the photoresist development cup, the drip trough having a drip catching surface facing the open top and extending from the sidewall of the photoresist development cup, the drip trough further including at least one hole in the drip catching surface positioned to drain the photoresist developer solution; and (d) a developer dispense nozzle movable with respect to the photoresist development cup and capable of being positioned to dispense the photoresist developer solution onto the semiconductor wafer.
Claim 77
Independent Claim
141 words
An apparatus for applying a photoresist developer solution to a semiconductor wafer, comprising: (a) a substantially cylindrical photoresist development cup defined by a base, a sidewall substantially perpendicular to the base, and an open top opposite the base; (b) a wafer holder on the base of the photoresist development cup adapted to support the semiconductor wafer; (c) a drip trough connected to the sidewall of the photoresist development cup, the drip trough having a drip catching surface facing the open top and extending from the sidewall of the photoresist development cup, the drip trough further including at least one hole in the drip catching surface positioned to drain the photoresist developer solution; and (d) a developer dispense nozzle movable with respect to the photoresist development cup and capable of being positioned to dispense the photoresist developer solution onto the semiconductor wafer.
Claim 78
Dependent Claim
21 words
The apparatus of claim 71, wherein the at least one hole is positioned adjacent the sidewall of the photoresist development cup.
Claim 79
Dependent Claim
16 words
The apparatus of claim 71, further comprising a drain line connected to the least one hole.
Claim 80
Dependent Claim
22 words
The apparatus of claim 71, wherein the drip catching surface forms an acute angle with the sidewall of the photoresist development cup.
Claim 81
Dependent Claim
27 words
The apparatus of claim 71, wherein the drip catching surface is positioned to extend upward from the sidewall to the open top of the photoresist development cup.
Claim 82
Dependent Claim
20 words
The apparatus of claim 71, further comprising a deflecting surface on the base of the cup below the drip trough.
Claim 83
Dependent Claim
23 words
The apparatus of claim 71, wherein the drip trough comprises a substantially annular trough immediately adjacent the sidewall of the photoresist development cup.
Claim 84
Dependent Claim
50 words
The apparatus of claim 71, further comprising an additional drip trough, the drip troughs comprising respective substantially semi-annular troughs immediately adjacent the sidewall of the photoresist development cup, the semi-annular troughs having respective drip catching surfaces facing the open top and extending from the sidewall of the photoresist development cup.
Claim 85
Dependent Claim
28 words
A photoresist drip catch, comprising a substantially annular trough comprising a sidewall and a drip catching surface immediately connected to and forming an acute angle with the sidewall.
Claim 86
Dependent Claim
28 words
A photoresist drip catch, comprising a substantially annular trough comprising a sidewall and a drip catching surface immediately connected to and forming an acute angle with the sidewall.
Claim 87
Dependent Claim
24 words
The drip catch of claim 79, wherein the annular trough further includes at least one hole in the drip catching surface adjacent the sidewall.
Claim 88
Dependent Claim
40 words
A photoresist drip catch, comprising two substantially semi-annular troughs connected to each other, the semi-annular troughs comprising respective sidewalls and drip catching surfaces immediately connected to the respective sidewalls, the drip catching surfaces forming acute angles with the respective sidewalls.
Claim 89
Dependent Claim
40 words
A photoresist drip catch, comprising two substantially semi-annular troughs connected to each other, the semi-annular troughs comprising respective sidewalls and drip catching surfaces immediately connected to the respective sidewalls, the drip catching surfaces forming acute angles with the respective sidewalls.
Claim 90
Dependent Claim
25 words
The drip catch of claim 81, wherein the semi-annular troughs further include a plurality of holes in the drip catching surfaces adjacent the respective sidewalls.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-08-16 | 2003-02-15 | 2003-08-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-08-16 | 2007-02-15 | 2007-08-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-08-16 | 2011-02-15 | 2011-08-17 | $7700.00 | Window Closed / Lapsed |