Method of manufacturing synthetic bone coated surgical implants

Claim 2

A process for manufacturing a hydroxylapatite-coated implant suitable for implantation into an animal said implant having a fully crystalline hydroxylapatite coating comprising the steps of: directing a high energy beam, operating at at least 10 kev energy, against a hydroxylpatite target positioned such that HA ions kicked off of the target strike the implant and apply an ion beam sputter coating of hydroxylapatite to said implant, applying a negative potential to said implant material, ranging between about 300 volts and about 1000 volts, while the high energy beam is directed at the target, heating said implant for between about 1 hour and about 24 hours at a temperature of between about 300° C. and about 900° C., conducting said process under a vacuum of less than or equal to 10 -5 torr in the presence of a preselected amount of oxygen gas, and recovering a fully crystalline hydroxylapatite-coated implant.

Claim 3

The process of claim 1 wherein said high energy beam comprises a Xenon ion beam.

Claim 4

The process of claim 1 wherein said metal implant is sputter-etched prior to said ion beam sputter coating.

Claim 5

The process of claim 1 wherein the Xenon ion beam is directed substantially horizontally, the implant material is located above the beam and the target is positioned in the path of the beam such that HA ions are directed up onto the implant material.

Claim 6

The process of claim 4 wherein the implant material is located on a water cooled rotating platter.

Claim 7

The process of claim 4 wherein said hydroxylapatite target comprises a solid hydroxylapatite coating on a water cooled substrate.

Claim 8

The process of claim 4 wherein said hydroxylapatite target comprises a sintered hydroxylapatite coating on a water-cooled substrate.

Claim 9

The process of claim 1 wherein said implant material is selected from the group consisting of titanium, titanium alloys, stainless steel and cobalt-chrome-molybdenum.

Claim 10

The process of claim 1 wherein said oxygen is present in amounts ranging between about 10 -5 torr and about 10 -15 torr partial pressure.

Claim 11

The process of claim 11 wherein said oxygen is present in amounts ranging between about 3×10 -6 torr and about 5×10 -6 torr partial pressure.

Claim 12

The process of claim 1 wherein said hydroxylapatite target comprises powdered hydroxylapatite located on a water cooled tray.

Claim 13

The process of claim 1, wherein said hydroxylapatite-coated implant is first plasma spray coated with titanium before hydroxylapatite coating.

Claim 14

A hydroxylapatite-coated implant, suitable for implantation into an animal in need of such treatment, said implant having a fully crystalline hydroxylapatite-coating manufactured by a process comprising the steps of: directing a high energy beam, operating at least 10 kev energy, against a hydroxylapatite target positioned such that HA ions kicked off of the target strike the implant and apply an ion beam sputter coating of hydroxylapatite to said implant, applying a negative potential to said implant material, ranging between about 300 volts and about 1000 volts, while the high energy beam is directed at the target, heating said implant for between about 1 hour and about 24 hours at a temperature of between about 300° C. and about 900° C. conducting said process under a vacuum of less than or equal to 10 -5 torr in the presence of a preselected amount of oxygen gas, and recovering a fully crystalline hydroxylapatite-coated implant.

Claim 15

A hydroxylapatite-coated implant, suitable for implantation into an animal in need of such treatment, said implant having a fully crystalline hydroxylapatite-coating manufactured by a process comprising the steps of: directing a high energy beam, operating at least 10 kev energy, against a hydroxylapatite target positioned such that HA ions kicked off of the target strike the implant and apply an ion beam sputter coating of hydroxylapatite to said implant, applying a negative potential to said implant material, ranging between about 300 volts and about 1000 volts, while the high energy beam is directed at the target, heating said implant for between about 1 hour and about 24 hours at a temperature of between about 300° C. and about 900° C. conducting said process under a vacuum of less than or equal to 10 -5 torr in the presence of a preselected amount of oxygen gas, and recovering a fully crystalline hydroxylapatite-coated implant.

Claim 16

The implant of claim 13 wherein the high energy ion beam comprises a Xenon ion beam.

Claim 17

The implant of claim 13 wherein the implant is first plasma spray coated with titanium before hydroxylapatite coating.

Claim 18

The implant of claim 13 wherein said oxygen is present in amounts ranging between about 10 -5 torr and about 10 -7 torr.