US4882008A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Dry development of photoresist
Assignee: Texas Instruments Inc
•
Filing: 1988-07-08
•
Granted: 1989-11-21
•
Expires: 2008-07-08
Abstract
Abstract A process for developing a photolithographic pattern on the surface of an exposed workpiece in a process chamber; disposing the workpiece in a process chamber; heating the workpiece and introducing a silylating agent to the process chamber and to a face of the workpiece to be processed; generating activated species from a source of oxygen; and introducing the activated species to the face of the workpiece.
Inventors
- 👤 Cesar M. Garza
- 👤 Monte A. Douglas
- 👤 Lee M. Loewenstein
- 👤 Cecil J. Davis
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 18:20
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; G; G03; G03F; G03F7/00; G03F7/26; G03F7/265
Claims Analysis
Total Claims: 33
Claim 1
Independent Claim
68 words
A process for developing a photolithographic pattern on the surface of a workpiece in a process chamber; (a) disposing the workpiece in a process chamber; (b) heating the workpiece and introducing a silylating agent to the process chamber and to a face of the workpiece to be processed; (c) generating activated species froma source of oxygen; and (d) introducing the activated species to the face of the workpiece.
Claim 2
Dependent Claim
68 words
A process for developing a photolithographic pattern on the surface of a workpiece in a process chamber; (a) disposing the workpiece in a process chamber; (b) heating the workpiece and introducing a silylating agent to the process chamber and to a face of the workpiece to be processed; (c) generating activated species froma source of oxygen; and (d) introducing the activated species to the face of the workpiece.
Claim 3
Dependent Claim
11 words
The process of claim 1 wherein the silylating agent is hexamethyldisilizane.
Claim 4
Dependent Claim
11 words
The process of claim 1 wherein the silylating agent is organosilane.
Claim 5
Dependent Claim
12 words
The process of claim 1 wherein the silylating agent is a silane.
Claim 6
Dependent Claim
13 words
The process of claim 1 wherein the source of oxygen is nitrous oxide.
Claim 7
Dependent Claim
14 words
The process of claim 1 wherein carried out at a pressure less than ambient.
Claim 8
Dependent Claim
13 words
The process of claim 1 wherein the face to be processed faces downward.
Claim 9
Dependent Claim
11 words
The process of claim 1 wherein the workpiece is a wafer.
Claim 10
Dependent Claim
10 words
The process of claim 8 wherein the wafer is silicon.
Claim 11
Dependent Claim
11 words
The process of claim 1 wherein the workpiece is heated continuously.
Claim 12
Dependent Claim
15 words
The process of claim 1 wherein the activated species are generated in the process chamber.
Claim 13
Dependent Claim
19 words
The process of claim 1 wherein the activated species are generated in a chamber remote from the process chamber.
Claim 14
Dependent Claim
78 words
A process for developing a photolithographic pattern on the surface of a workpiece in a process chamber; (a) disposing the workpiece in a process chamber; (b) heating the workpiece and introducing a silylating agent to the process chamber and to a face of the workpiece to be processed; (c) generating activated species from a source of oxygen; (d) introducing the activated species to the face of the workpiece; and (e) performing additional process steps in the process chamber.
Claim 15
Dependent Claim
78 words
A process for developing a photolithographic pattern on the surface of a workpiece in a process chamber; (a) disposing the workpiece in a process chamber; (b) heating the workpiece and introducing a silylating agent to the process chamber and to a face of the workpiece to be processed; (c) generating activated species from a source of oxygen; (d) introducing the activated species to the face of the workpiece; and (e) performing additional process steps in the process chamber.
Claim 16
Dependent Claim
11 words
The process of claim 13 wherein the silylating agent is hexamethyldisilizane.
Claim 17
Dependent Claim
12 words
The process of claim 13 wherein the silylating agent is an organosilane.
Claim 18
Dependent Claim
13 words
The process of claim 13 wherein the source of oxygen is nitrous oxide.
Claim 19
Dependent Claim
13 words
The process of claim 13 wherein the source of oxygen is nitrous oxide.
Claim 20
Dependent Claim
14 words
The process of claim 13 wherein carried out at a pressure less than ambient.
Claim 21
Dependent Claim
13 words
The process of claim 13 wherein the face to be processed faces downward.
Claim 22
Dependent Claim
11 words
The process of claim 13 wherein the workpiece is a wafer.
Claim 23
Dependent Claim
10 words
The process of claim 20 wherein the wafer is silicon.
Claim 24
Dependent Claim
11 words
The process of claim 13 wherein the workpiece is heated continuously
Claim 25
Dependent Claim
15 words
The process of claim 13 wherein the activated species are generated in the process chamber.
Claim 26
Dependent Claim
19 words
The process of claim 13 wherein the activated species are generated in a chamber remote from the process chamber.
Claim 27
Dependent Claim
79 words
A process for developing a photolithographic pattern on the surface of a workpiece; (a) disposing said workpiece into a first process chamber; (b) heating said workpiece introducing a silylating agent to the first process chamber and to the surface of said workpiece; (c) transporting said wafer from said first process chamber to a second process chamber under vacuum; (d) generating activated species from a source of oxygen; and (e) introducing the activated species to the surface of the workpiece.
Claim 28
Dependent Claim
79 words
A process for developing a photolithographic pattern on the surface of a workpiece; (a) disposing said workpiece into a first process chamber; (b) heating said workpiece introducing a silylating agent to the first process chamber and to the surface of said workpiece; (c) transporting said wafer from said first process chamber to a second process chamber under vacuum; (d) generating activated species from a source of oxygen; and (e) introducing the activated species to the surface of the workpiece.
Claim 29
Dependent Claim
15 words
The process of 25 wherein the transporting step is performed using a vacuum wafer carrier.
Claim 30
Dependent Claim
15 words
The process of 25 wherein the transporting step is performed using a vacuum wafer carrier.
Claim 31
Dependent Claim
41 words
The process of claim 25 wherein the transporting step is performed by moving the wafer from said first to said second process chamber using a central handling module connected to said first and second process chambers and maintained at a vacuum.
Claim 32
Dependent Claim
15 words
The process of claim 25 wherein the activated species are generated in the process chamber.
Claim 33
Dependent Claim
19 words
The process of claim 25 wherein the activated species are generated in a chamber remote from the process chamber.
References Cited (Backward Citations)
US4782008A
Cited
US4751170A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-11-20 | 1993-05-22 | 1993-11-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-11-20 | 1997-05-22 | 1997-11-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-11-20 | 2001-05-22 | 2001-11-21 | $7700.00 | Window Closed / Lapsed |