Pattern forming method

Claim 2

A pattern forming method comprising: a step of forming on a substrate an energy responsive monomolecular film of a straight chain hydrocarbon having a terminal chlorosilane or silanol group at one end of the chain for bonding to the substrate, and a terminal vinyl, acetylene or cyano group at another end of the chain as responsive groups which undergo chemical reaction under irradiation by energy beams; a step of deactivating the responsive groups in a pattern by irradiating energy beams in the pattern onto said responsive film; and a step of bonding a chemical reagent to the parts of said responsive film where the responsive groups remain.

Claim 3

The pattern forming method of claim 1, wherein said step of bonding the chemical reagent is repeated plural number of times, using as the chemical substance molecules having at one end thereof a group which tends to react with said responsive group and at the other end thereof a group which tends to perform the same function as said responsive group.

Claim 4

The pattern forming method of claim 1, wherein said responsive film is formed by the Langmuir-Blodgett technique or an adsorption process in such a manner that the responsive groups are juxtaposed on the substrate surface.

Claim 5

The pattern of forming method of claim 1, wherein substances containing Si are used as said chmical reagent.

Claim 6

The pattern forming method of claim 1, wherein said responsive groups which undergo chemical reaction under irradiation of energy beams include the vinyl group.

Claim 7

A pattern forming method comprising: a step of forming on an arbitrary substrate an energy responsive monomolecular film of a straight chain hydrocarbon having a terminal chlorosilane or silanol group at one end of the chain for bonding to the substrate, and a terminal vinyl, acetylene or cyano group at another end of the chain as responsive groups which undergo chemical reaction under irradiation of energy beams; a step of deactivating or activating the responsive groups in a pattern by irradiating energy beams in the pattern onto said responsive film; and a step of selectively combining a chemical reagent with the remaining parts, wherein a straight chain siloxane having chlorine combined at both ends thereof is used as the chemical reagent.

Claim 8

A pattern forming method comprising: a step of forming on an arbitrary substrate an energy responsive monomolecular film of a straight chain hydrocarbon having a terminal chlorosilane or silanol group at one end of the chain for bonding to the substrate, and a terminal vinyl, acetylene or cyano group at another end of the chain as responsive groups which undergo chemical reaction under irradiation of energy beams; a step of deactivating or activating the responsive groups in a pattern by irradiating energy beams in the pattern onto said responsive film; and a step of selectively combining a chemical reagent with the remaining parts, wherein a straight chain siloxane having chlorine combined at both ends thereof is used as the chemical reagent.

Claim 9

The pattern forming method of claim 6, wherein a substrate whose surface is hydrophobic is used, and the surface is rendered hydrophilic by means of plasma treatment, coating or adsorption of a surface active agent.

Claim 10

The pattern forming method of claim 6, wherein said responsive film is formed on an arbitrary substrate, interposed by an organic film, siloxane molecules are selectively bonded to surface parts of the responsive film and, thereafter, through treatment with oxygen plasma, the pattern formed of the siloxane molecules is transferred to the organic film.

Claim 11

The pattern forming method of claim 6 further comprising a step of replacing with hydroxyl group the chlorine at one end of each of the remaining siloxane molecules after the bonding reaction and a step of subjecting the hydroxyl groups to a bonding reaction with straight chain siloxane molecules having chlorine bonded at both ends thereof, which steps are performed more than once.

Claim 12

A pattern forming method comprising: a step of forming an organic film on a substrate; a step of forming on said organic film an energy responsive monomolecular film of a straight chain hydrocarbon having a terminal chlorosilane or silanol group at one end of the chain for bonding to the substrate, and a terminal vinyl, acetylene or cyano group at another end of the chain as responsive groups which undergo chemical reaction under irradiation of energy beams; a step of deactivating said responsive groups in a pattern by irradiating energy beams onto the responsive film in a pattern; a step of bonding a chemical reagent to parts of said responsive film where the responsive groups remain, said chemical reagent being resistant to etching by oxygen plasma and containing silicon; and a step of transferring said pattern to the organic film by subjecting said substrate to oxygen plasma treatment.

Claim 13

A pattern forming method comprising: a step of forming an organic film on a substrate; a step of forming on said organic film an energy responsive monomolecular film of a straight chain hydrocarbon having a terminal chlorosilane or silanol group at one end of the chain for bonding to the substrate, and a terminal vinyl, acetylene or cyano group at another end of the chain as responsive groups which undergo chemical reaction under irradiation of energy beams; a step of deactivating said responsive groups in a pattern by irradiating energy beams onto the responsive film in a pattern; a step of bonding a chemical reagent to parts of said responsive film where the responsive groups remain, said chemical reagent being resistant to etching by oxygen plasma and containing silicon; and a step of transferring said pattern to the organic film by subjecting said substrate to oxygen plasma treatment.