Patent CH645831A5 successfully refreshed from Google Patents.
US4759958A
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Method for forming polyimide film by chemical vapor deposition
Assignee: Hitachi Ltd
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Filing: 1987-07-23
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Granted: 1988-07-26
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Expires: 2007-07-23
Abstract
Abstract A method for forming a polyimide film on a substrate surface by chemical vapor deposition comprises evaporating an aromatic monomer compound having one amino group and two adjacent carboxyl groups or its derivative group, such as esters of 4-amino phthalic acid, and 4-(p-anilino) phthalic acid, thus a high strength polyimide is obtained represented by the general formula having its imide groups being unidirectionally arranged in its backbone chain: ##STR1## wherein R is nil or divalent aliphatic or aromatic group and n is an integer.
Inventors
- 👤 Shunichi Numata
- 👤 Ikeda Takayoshi
- 👤 Koji Fujisaki
- 👤 Takao Miwa
- 👤 Noriyuki Kinjo
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 06:56
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/68; H10P14/683; B; B05; B05D; B05D1/00; B05D1/60; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
100 words
A method for forming a polyimide film on a substrate surface by chemical vapor deposition comprising: a step of evaporating under vacuum at least one aromatic monomer compound having one amino group and two adjacent carboxyl groups or its derivative group; a step of depositing the evaporated aromatic monomer compound on the substrate surface; and a step of polymerizing the deposited aromatic monomer compound into polyimide which is represented by the general formula having its imide groups being unidirectionally arranged in its backbone chain: ##STR5## wherein R is nil or divalent aliphatic or aromatic group and n is an integer.
Claim 2
Independent Claim
100 words
A method for forming a polyimide film on a substrate surface by chemical vapor deposition comprising: a step of evaporating under vacuum at least one aromatic monomer compound having one amino group and two adjacent carboxyl groups or its derivative group; a step of depositing the evaporated aromatic monomer compound on the substrate surface; and a step of polymerizing the deposited aromatic monomer compound into polyimide which is represented by the general formula having its imide groups being unidirectionally arranged in its backbone chain: ##STR5## wherein R is nil or divalent aliphatic or aromatic group and n is an integer.
Claim 3
Dependent Claim
83 words
The method for forming a polyimide film on a substrate surface by chemical vapor deposition according to claim 1 wherein the aromatic monomer compound having one amino group and two adjacent carboxyl groups or its derivative group is represented by the general formula: ##STR6## wherein X and Y are a hydroxyl or alkoxyl group or a halogen atom or an anhydride (X+Y) and may be the same or different and R is --C p H 2p -- (p is a positive integer), ##STR7##
Claim 4
Dependent Claim
62 words
The method for forming a polyimide film on a substrate surface by chemical vapor deposition according to claim 3 wherein the aromatic monomer compound having one amino group and two adjacent carboxyl groups or its derivative group is selected from the group consisting of free carboxylic acid type aromatic monomer compounds having one amino group and monoesters, diesters, chlorides and anhydrides thereof.
Claim 5
Dependent Claim
92 words
The method for forming a polyimide film on a substrate surface by chemical vapor deposition according to claim 3 wherein the aromatic monomer compound having one amino group and two adjacent carboxyl groups or its derivative group is selected from the group consisting of 4-aminophthalic acid, 4-aminomethylphthalic acid, 4-(m-anilino)phthalic acid, 4-(p-anilino)phthalic acid, 3-(m-anilino)phthalic acid, 3-(p-anilino)phthalic acid, 4-(3-aminophenoxy)phthalic acid, 4-(4-aminophenoxy)phthalic acid, 3-amino-3',4'-dicarboxybenzophenone, 4-amino-3',4'dicarboxybenzophenone, 3-anilino ester of trimellitic acid, 4-anilino ester of trimellitic acid, 4-anilino amide of trimellitic acid, 3-amino-3',4'-dicarboxydiphenyl sulfone, 4-amino-3',4'-dicarboxydiphenyl sulfone, 4-(4-aminobenzyl) phthalic acid, 2-(p-anilino)-2-(3,4-dicarboxylphenyl)-hexafluoropropane, and monoesters, diesters, chlorides and anhydrides thereof.
Claim 6
Dependent Claim
51 words
The method for forming a polyimide film on a substrate surface by chemical vapor deposition according to claim 1 wherein the aromatic monomer compound having one amino group and two adjacent carboxyl groups or its derivative group is selected from the group consisting of 4-aminophthalic acid, 4-(p-anilino)phthalic acid and their derivatives.
Claim 7
Dependent Claim
51 words
The method for forming a polyimide film on a substrate surface by chemical vapor deposition according to claim 1 wherein the aromatic monomer compound having one amino group and two adjacent carboxyl groups or its derivative group is selected from the group consisting of esters of 4-aminophthalic acid, and 4-(p-anilino)phthalic acid.
Claim 8
Dependent Claim
48 words
The method for forming a polyimide film on a substrate surface by chemical vapor deposition according to claim 1 wherein at least two different aromatic monomer compounds each having one amino group and two adjacent carboxyl groups or its derivative group are simultaneously evaporated in said evaporating step.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-07-26 | 1992-01-25 | 1992-07-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-07-26 | 1996-01-25 | 1996-07-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-07-26 | 2000-01-25 | 2000-07-26 | $7700.00 | Window Closed / Lapsed |