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US4614563A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for producing multilayer conductor structure

Assignee: Fujifilm Holdings Corp
•
Filing: 1985-07-29
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Granted: 1986-09-30
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Expires: 2005-07-29
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Abstract

Abstract A process for producing a multilayer conductor structure having at least two conductor patterns in layers and a smooth surface over the upper pattern, which comprises the steps of: (1) forming a first conductor pattern on a substrate or a layer provided on the substrate; (2) providing a conductor layer over an intermediate insulation layer formed on said first conductor pattern; (3) providing a resin layer on said conductor layer to form a smooth surface thereover; and (4) etching said resin layer and a part of said conductor layer provided on the first conductor pattern to form a second conductor pattern having a smooth surface thereon.

Inventors

  • 👤 Takashi Kubo

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 15:05
CPC Classifications
G; G11; G11B; G11B5/00; G11B5/127; G11B5/31; G11B5/3163; H; H01; H01F; H01F41/00; H01F41/32; H01F41/34; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/056; H10W20/062; H10W20/063

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 107 words
A process for producing a multilayer conductor structure having at least two conductor patterns in layers and a smooth surface over the upper pattern, which comprises the steps of: (1) forming a first conductor pattern on a substrate or on a layer provided on the substrate; (2) providing a conductor layer over an intermediate insulation layer formed on said first conductor pattern; (3) providing a resin layer on said conductor layer to form a smooth surface thereon; and (4) etching said resin layer and a part of said conductor layer provided on the first conductor pattern to form a second conductor pattern having a smooth surface thereon.
Claim 2
Dependent Claim 107 words
A process for producing a multilayer conductor structure having at least two conductor patterns in layers and a smooth surface over the upper pattern, which comprises the steps of: (1) forming a first conductor pattern on a substrate or on a layer provided on the substrate; (2) providing a conductor layer over an intermediate insulation layer formed on said first conductor pattern; (3) providing a resin layer on said conductor layer to form a smooth surface thereon; and (4) etching said resin layer and a part of said conductor layer provided on the first conductor pattern to form a second conductor pattern having a smooth surface thereon.
Claim 3
Dependent Claim 75 words
The process for producing a multilayer conductor structure as claimed in claim 1, wherein said conductor layer provided over the intermediate insulation layer has a thickness equal to or greater than that of the first conductor pattern, the said conductor layer has a step of a height in the range of 0.8 to 8 μm, and the thickness of said resin layer is in the range of 1 to 20 μm in the recessed area.
Claim 4
Dependent Claim 41 words
The process for producing a multilayer conductor structure as claimed in claim 1, wherein said conductor is of a conductive metal composed of Cu, Al, Au, an alloy thereof or permalloy and said resin layer is of a quinone diazide photoresist.
Claim 5
Dependent Claim 24 words
The process for producing a multilayer conductor structure as claimed in claim 1, wherein said etching is performed by ion-beam etching or sputter etching.
Claim 6
Dependent Claim 24 words
The process for producing a multilayer conductor structure as claimed in claim 1, wherein the steps (1) to (4) are repeated at least twice.
Claim 7
Dependent Claim 31 words
The process for producing a multilayer conductor structure as claimed in any of claims 1 to 5, wherein said multilayer conductor structure is a multilayer coil of a thin-film magnetic head.

References Cited (Backward Citations)

US3671312A Cited
US4119483A Cited
US4239587A Cited
JPS5518062A Cited
US4501060A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-09-29 1990-03-31 1990-09-30 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-09-29 1994-03-31 1994-09-30 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-09-29 1998-03-31 1998-09-30 $7700.00 Window Closed / Lapsed

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