US4553069A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Wafer holding apparatus for ion implantation
Assignee: Varian Semiconductor Equipment Associates Inc
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Filing: 1984-01-05
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Granted: 1985-11-12
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Expires: 2004-01-05
Abstract
Abstract An apparatus is disclosed for the implantation of ions into semiconductor wafers wherein a plurality of storage compartments are connected through valves to a vacuum chamber. A wafer handling device transfers wafers between the storage compartments and a wafer holding device. The wafer holding device positions the wafers in front of an ion beam source. The wafer holding device is a rotatable frustum having a rear end, front end and four trapezoidally shaped sides. Clamps are provided on each side for holding the wafer against the side.
Inventors
- 👤 Kenneth H. Purser
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 16:18
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/30; H10P72/33; H10P72/3306; H01; H01J; H01J37/00; H01J37/02; H01J37/18; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H10P72/3308; H10P72/70; H10P72/76; H10P72/7602; Y; Y10; Y10S; Y10S414/00; Y10S414/135; Y10S414/137; Y10S414/139; Y10S414/141
Claims Analysis
Total Claims: 28
Claim 1
Independent Claim
173 words
An apparatus for the implantation of ion into semiconductor wafers comprising: a plurality of storage compartments that are loaded with a plurality of said wafers at atmospheric pressure; means for pumping down each of said storage compartments to a vacuum; a vacuum chamber for receiving an ion beam directed into said chamber; valve means connected between each of said storage compartments and said vacuum chamber, each of said valve means being opened when its corresponding storage compartment has been pumped down to a vacuum; a rotatable block located within said vacuum chamber for holding said wafers in position with respect to said ion beam so as to obtain ion implantation into said wafer, said rotatable block having a rear end, a front end and a plurality of sides connecting the rear end to the front end; clamping means on each side of said block for holding a wafer against said block; and wafer handling means located within said vacuum chamber for transferring said wafers between said storage compartments and said wafer holding means.
Claim 2
Independent Claim
173 words
An apparatus for the implantation of ion into semiconductor wafers comprising: a plurality of storage compartments that are loaded with a plurality of said wafers at atmospheric pressure; means for pumping down each of said storage compartments to a vacuum; a vacuum chamber for receiving an ion beam directed into said chamber; valve means connected between each of said storage compartments and said vacuum chamber, each of said valve means being opened when its corresponding storage compartment has been pumped down to a vacuum; a rotatable block located within said vacuum chamber for holding said wafers in position with respect to said ion beam so as to obtain ion implantation into said wafer, said rotatable block having a rear end, a front end and a plurality of sides connecting the rear end to the front end; clamping means on each side of said block for holding a wafer against said block; and wafer handling means located within said vacuum chamber for transferring said wafers between said storage compartments and said wafer holding means.
Claim 3
Dependent Claim
13 words
The apparatus of claim 1 wherein said rotatable block includes four trapezoidal sides.
Claim 4
Dependent Claim
12 words
The apparatus of claim 1 wherein said clamping means is air operated.
Claim 5
Independent Claim
149 words
An apparatus for the implantation of ions into semiconductor comprising: a plurality of storage compartments that are loaded with a stack of said wafers at atmospheric pressure, said storage compartments including elevator means for raising and lowering said stack of said wafers; means for pumping down each of said storage compartments to a vacuum; a vacuum chamber for receiving an ion beam directed into said chamber; valve means connected between each of said storage compartments and said vacuum chamber, each of said valve means being opened when its corresponding storage compartment has been pumped down to a vacuum; wafer holding means located within said vacuum chamber for holding said wafers in position with respect to said ion beam so as to obtain ion implantation into said wafer; and wafer handling means located within said vacuum chamber for transferring said wafers between said storage compartments and said wafer holding means.
Claim 6
Independent Claim
149 words
An apparatus for the implantation of ions into semiconductor comprising: a plurality of storage compartments that are loaded with a stack of said wafers at atmospheric pressure, said storage compartments including elevator means for raising and lowering said stack of said wafers; means for pumping down each of said storage compartments to a vacuum; a vacuum chamber for receiving an ion beam directed into said chamber; valve means connected between each of said storage compartments and said vacuum chamber, each of said valve means being opened when its corresponding storage compartment has been pumped down to a vacuum; wafer holding means located within said vacuum chamber for holding said wafers in position with respect to said ion beam so as to obtain ion implantation into said wafer; and wafer handling means located within said vacuum chamber for transferring said wafers between said storage compartments and said wafer holding means.
Claim 7
Dependent Claim
54 words
A wafer holding apparatus comprising: a rotatable block having a rear end, a front end and a plurality of sides connecting the rear end to the front end; clamping means on each side of said block for holding a wafer against said block; means for supporting said block; and means for rotating said block.
Claim 8
Dependent Claim
54 words
A wafer holding apparatus comprising: a rotatable block having a rear end, a front end and a plurality of sides connecting the rear end to the front end; clamping means on each side of said block for holding a wafer against said block; means for supporting said block; and means for rotating said block.
Claim 9
Dependent Claim
21 words
The wafer holding apparatus of claim 5 wherein said supporting means is arranged to horizontally position a side of said block.
Claim 10
Dependent Claim
18 words
The wafer holding apparatus of claim 6 wherein said supporting means is a shaft inclined relative to horizontal.
Claim 11
Dependent Claim
25 words
The wafer holding apparatus of claim 5 wherein said rotatable block includes passage under its surfaces for allowing a coolant to circulate through the block.
Claim 12
Dependent Claim
17 words
The wafer holding apparatus of claim 5 wherein the sides of said rotatable block are trapezoidally shaped.
Claim 13
Dependent Claim
14 words
The wafer holding apparatus of claim 5 wherein said rotatable block has four sides.
Claim 14
Dependent Claim
23 words
The wafer holding apparatus of claim 5 wherein each side of said rotatable block includes a slot for receiving a wafer handling device.
Claim 15
Dependent Claim
13 words
The wafer holding apparatus of claim 5 wherein said clamping means is air-operated.
Claim 16
Dependent Claim
74 words
A wafer holding apparatus comprising: a rotatable frustum having a front end, a rear end and four trapezoidally shaped sides; clamping means on each trapezoidally shaped side of said frustum for holding a wafer against said frustum; a shaft inclined relative to horizontal to support said frustum so that the trapezoidal side in a top position is horizontal; and means for rotating said frustum so that each side will go through the top position.
Claim 17
Dependent Claim
74 words
A wafer holding apparatus comprising: a rotatable frustum having a front end, a rear end and four trapezoidally shaped sides; clamping means on each trapezoidally shaped side of said frustum for holding a wafer against said frustum; a shaft inclined relative to horizontal to support said frustum so that the trapezoidal side in a top position is horizontal; and means for rotating said frustum so that each side will go through the top position.
Claim 18
Dependent Claim
16 words
The wafer holding apparatus of claim 13 wherein said clamping means comprises air operated reciprocating heads.
Claim 19
Dependent Claim
23 words
The wafer holding apparatus of claim 13 wherein each side of said rotatable frustum includes a slot for receiving a wafer handling device.
Claim 20
Dependent Claim
24 words
The wafer holding apparatus of claim 15 wherein each side of said rotatable frustum includes stopping means for positioning a wafer on the side.
Claim 21
Independent Claim
137 words
An apparatus for the implantation of ions into semiconductor wafers comprising: a vacuum chamber; an ion beam source directing an ion beam into said chamber; and a wafer holding apparatus including: a rotatable block having a rear end, a front end and a plurality of sides connecting the rear end to the front end; clamping means on each side of said block for holding a wafer against said block; means for supporting said block so that the side of said block in a top position is horizontal and so that one other side of said block is aligned at an angle with respect to the perpendicular to said ion beam for implantation of ions into the wafer on said other side; and means for rotating said block so that each side will go through the top position.
Claim 22
Independent Claim
137 words
An apparatus for the implantation of ions into semiconductor wafers comprising: a vacuum chamber; an ion beam source directing an ion beam into said chamber; and a wafer holding apparatus including: a rotatable block having a rear end, a front end and a plurality of sides connecting the rear end to the front end; clamping means on each side of said block for holding a wafer against said block; means for supporting said block so that the side of said block in a top position is horizontal and so that one other side of said block is aligned at an angle with respect to the perpendicular to said ion beam for implantation of ions into the wafer on said other side; and means for rotating said block so that each side will go through the top position.
Claim 23
Dependent Claim
24 words
The ion implantation apparatus of claim 17 wherein said block includes passages under its surfaces for allowing a coolant to circulate through said block.
Claim 24
Dependent Claim
14 words
The ion implantation apparatus of claim 17 wherein said clamping means is air operated.
Claim 25
Dependent Claim
18 words
The ion implantation apparatus of claim 17 wherein said supporting means comprises a shaft inclined relative to horizontal.
Claim 26
Dependent Claim
34 words
The ion implantation apparatus of claim 17 further comprising wafer handling means located within said vacuum chamber for loading and unloading wafers to and from the side of said block in the top position.
Claim 27
Dependent Claim
17 words
The ion implantation apparatus of claim 21 wherein said loading and unloading means comprises a robot arm.
Claim 28
Dependent Claim
39 words
The ion implantation apparatus of claim 21 further comprising elevator means connected with said vacuum chamber for raising or lowering a stack of wafers so that said wafer handling means can easily access the desired wafer from said stack.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-11-11 | 1989-05-13 | 1989-11-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-11-11 | 1993-05-13 | 1993-11-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-11-11 | 1997-05-13 | 1997-11-12 | $7700.00 | Window Closed / Lapsed |