Synthetic plasma ion source

Claim 2

An ion beam source comprising: means for forming a collimated molecular beam of gas atoms; means for generating low-energy electrons and adding them to the collimated molecular beam; means for forming a primary beam of ions of a species of atoms having an ionization potential similar in value to the particles in said molecular beam and projecting said primary ion beam through said molecular beam in a region of ionization to form a substantially undeflected secondary ion beam; a synthetic plasma being formed thereby in the region of ionization and downstream thereof; and electrode means for forming an electrostatic field for extracting secondary ions from the downstream edge of the plasma.

Claim 3

The ion beam source defined in claim 1, wherein: said electrode means forms an immersion lens.

Claim 4

The ion beam source defined in claim 2, wherein said electrode means comprises: an anode and cathode, said anode being formed with a pair of shaped apertures, coaxial with each other and with said secondary ion beam, the upstream aperture being smaller in diameter than both the downstream aperture and the cross-sectional area of the upstream secondary ion beam, so that the upstream aperture forms a lens stop.

Claim 5

The ion beam source defined in claim 2, wherein said electrode means comprises: a pair of electrodes for forming an electrostatic field, one said electrode formed with a tube having its axis in the direction of travel of said secondary beam, said tube having an aperture therein smaller in diameter than said tube and forming a lens stop, said aperture being formed in the end thereof closest to ionization region, the field between the electrodes permitting the plasma to extend through the aperture into the tube and forming the downstream edge of the plasma within the tube into one end of a lens.

Claim 6

An ion beam source comprising: means for forming a collimated molecular beam of gas atoms; means for forming a primary beam of ions of a species of atoms having an ionization potential similar in value to the particles in said molecular beam and projecting said primary ion beam through said molecular beam in a region of ionization to form a substantially undeflected secondary ion; means for generating low-energy electrons and adding them to the collimated molecular beam in the region and upstream of the region of ionization, a synethetic plasma being formed thereby in the region of ionization and downstream thereof; aperture means formed with a first aperture smaller in the area than the cross-sectional area of the secondary ion beam, said aperture being located in the path of said secondary ion beam to be axially coincident with said beam; and ion extraction means for producing an electric field for accelerating said secondary ion beam, said extraction means formed with an aperture greater in area than said first aperture and located to be axially coincident with said first aperture, said plasma extending through said first aperture and coacting with said electric field so that the plasma edge is curved to form a lens for said secondary ion beam.

Claim 7

An ion beam source comprising: means for forming a collimated molecular beam of gas atoms; means for forming a primary beam of ions of a species of atoms having an ionization potential similar in value to the particles in said molecular beam and projecting said primary ion beam through said molecular beam in a region of ionization to form a substantially undeflected secondary ion; means for generating low-energy electrons and adding them to the collimated molecular beam in the region and upstream of the region of ionization, a synethetic plasma being formed thereby in the region of ionization and downstream thereof; aperture means formed with a first aperture smaller in the area than the cross-sectional area of the secondary ion beam, said aperture being located in the path of said secondary ion beam to be axially coincident with said beam; and ion extraction means for producing an electric field for accelerating said secondary ion beam, said extraction means formed with an aperture greater in area than said first aperture and located to be axially coincident with said first aperture, said plasma extending through said first aperture and coacting with said electric field so that the plasma edge is curved to form a lens for said secondary ion beam.

Claim 8

An ion beam source as defined in claim 5, wherein: said ion extraction means comprises an anode and a cathode spaced downstream thereof, the anode being formed with a tube extending upstream thereof to form said aperture means, the upstream end of the tube being formed with said first aperture therein and the downstream end of said tube comprising said second aperture.

Claim 9

An ion beam source as defined in claim 6, wherein: said primary ion beam is projected orthogonally through said molecular beam.

Claim 10

An ion beam source as defined in claim 6, wherein: said gas forming the molecular beam is argon.

Claim 11

An ion beam source as defined in claim 6, wherein: said gas forming the molecular beam is helium.

Claim 12

A synthetic plasma source comprising: means for forming a secondary ion beam from crossed molecular and ion beams by means of charge exchange between the beams; and electron beam means for generating an electron beam and bending it upstream of where said molecular beam crosses said ion beam into coincidence with the molecular beam so that ionization of the molecules occurs in the presence of intermingled electrons, and the secondary ion beam contains intermingled electrons traveling in the same direction whereby a synthetic plasma is formed.

Claim 13

A synthetic plasma source comprising: means for forming a secondary ion beam from crossed molecular and ion beams by means of charge exchange between the beams; and electron beam means for generating an electron beam and bending it upstream of where said molecular beam crosses said ion beam into coincidence with the molecular beam so that ionization of the molecules occurs in the presence of intermingled electrons, and the secondary ion beam contains intermingled electrons traveling in the same direction whereby a synthetic plasma is formed.

Claim 14

A synthetic plasma source as defined in claim 10, further including: aperture means placed in the path of said secondary ion beam to form a lens stop therefor.

Claim 15

A synthetic plasma source as defined in claim 10, further including: aperture means formed with a first aperture smaller in area than the cross-sectional area of the secondary ion beam, said aperture being located in the path of said secondary ion beam to be axially coincident therewith; and ion extraction means for producing an electric field for accelerating said secondary ion beam and reflecting said electrons, a part of said extraction means formed with a second aperture greater in area than said first aperture and located to be axially coincident with said first aperture, said plasma extending through said first aperture and coacting with said electric field so that the plasma edge is curved to form one end of a lens for said secondary ion beam.

Claim 16

A synthetic plasma source as defined in claim 12 wherein: said aperture means and said part of said ion extraction means are at the same electric potential.

Claim 17

A synthetic plasma source as defined in claim 12, wherein: said ion extraction means comprises an anode and a cathode located downstream of said anode, said anode being formed with a tube therein extending upstream of said anode, the upstream end of said tube being formed with said first aperture and the anode end of said tube forming said second aperture.

Claim 18

An electrostatic immersion lens for an intense ion source, comprising: a cathode; an anode spaced from said cathode; means for forming a substantially cylindrical, free-standing column of plasma, said anode and cathode having apertures therein, the axes of said apertures and said column of plasma being coaxial; the plasma column being located substantially to one side of the anode aperture, and the cathode being located on the other side, the cross-sectional area of the plasma column being smaller than the area of the anode aperture; means for providing a voltage difference between said anode and cathode, the field produced by said voltage difference acting to form a meniscus at the downstream edge of the plasma column, the meniscus being roughly coincident with a plane containing said anode aperture, ions being extracted from the meniscus edge of said plasma column toward said cathode.

Claim 19

An electrostatic immersion lens for an intense ion source, comprising: a cathode; an anode spaced from said cathode; means for forming a substantially cylindrical, free-standing column of plasma, said anode and cathode having apertures therein, the axes of said apertures and said column of plasma being coaxial; the plasma column being located substantially to one side of the anode aperture, and the cathode being located on the other side, the cross-sectional area of the plasma column being smaller than the area of the anode aperture; means for providing a voltage difference between said anode and cathode, the field produced by said voltage difference acting to form a meniscus at the downstream edge of the plasma column, the meniscus being roughly coincident with a plane containing said anode aperture, ions being extracted from the meniscus edge of said plasma column toward said cathode.

Claim 20

An immersion lens as defined in claim 15, wherein: the anode and cathode are formed as non-planar surfaces of revolution.

Claim 21

An immersion lens as defined in claim 15, wherein: said anode aperture is preceded by a lens-stop aperture which aids in forming the plasma column.

Claim 22

An immersion lens as defined in claim 17, wherein: said lens-stop aperture and said anode aperture are joined by a tube of conducting material.

Claim 23

An immersion lens as defined in claim 15, wherein: said anode, cathode and means forming a lens-stop aperture are each formed from a thin sheet of electrically conductive material, each sheet being placed orthogonally to the aperture and plasma column axes, the apertures being arranged in the sequence of lens stop, anode aperture and cathode aperture.

Claim 26

A method as defined in claim 20, wherein: the molecular beam is ionized by a process of charge exchange.

Claim 27

A method as defined in claim 20, wherein: the molecular beam is ionized by electromagnetic radiation.

Claim 28

A method as defined in claim 20, wherein: the electron kinetic energy is adjustable.

Claim 29

A method as defined in claim 20, including the further step of: passing the plasma through a collimating aperture to form a substantially cylindrical plasma column of uniform density and known diameter.

Claim 30

A method as defined in claim 20, wherein: the electrons are confined radially with a uniform axial magnetic field.

Claim 31

A method as defined in claim 20, wherein: the average electron kinetic energy in the plasma is set equal to a few tenths of an electron volt.

Claim 32

A method as defined in claim 20, wherein: the average electron kinetic energy in the plasma is set at a value of approximately a tenth of an electron volt.