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US4522663A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for optimizing photoresponsive amorphous alloys and devices

Assignee: Sovonics Solar Systems
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Filing: 1982-04-14
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Granted: 1985-06-11
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Expires: 2002-04-14
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Abstract

Abstract The production of improved photoresponsive amorphous alloys and devices, such as photovoltaic, photoreceptive devices and the like; having improved wavelength threshold characteristics is made possible by adding one or more band gap adjusting elements to the alloys and devices. The adjusting element or elements are added at least to the active photoresponsive regions of amorphous devices containing silicone and fluorine, and preferably hydrogen. One adjusting element is germanium which narrows the band gap from that of the materials without the adjusting element incorporated therein. Other adjusting elements can be used such as tin. The silicon and adjusting elements are concurrently combined and deposited as amorphous alloys by vapor deposition, sputtering or glow discharge decomposition. The addition of fluorine bonding and electronegativity to the alloy acts as a compensating or altering element to reduce the density of states in the energy gap thereof. The fluorine bond strength allows the adjusting element(s) to be added to the alloy to adjust the band gap without reducing the electronic qualities of the alloy. Hydrogen also acts as a compensating or altering element to compliment fluorine when utilized therewith. The compensating or altering element(s) can be added during deposition of the alloy or following deposition. The addition of the adjusting element(s) to the alloys adjusts the band gap to a selected optimum wavelength threshold for a particular device to increase the photoabsorption efficiency to enhance the device photoresponsive without adding states in the gap which decrease the efficiency of the devices. The adjusting element(s) can be added in varying amounts, in discrete layers or in substantially constant amounts in the alloys and devices.

Inventors

  • 👤 Stanford R. Ovshinsky
  • 👤 Masatsugu Izu

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 15:46
CPC Classifications
H; H10; H10F; H10F10/00; H10F10/10; H10F10/17; H10F10/172; C; C23; C23C; C23C14/00; C23C14/0021; C23C14/0026; C23C14/06; C23C14/22; C23C14/24; C23C14/32; C23C16/00; C23C16/22; H10D; H10D62/00; H10D62/40; H10D62/402; H10D62/80; H10D62/83; H10F71/00; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02E10/548; Y10; Y10S; Y10S420/00; Y10S420/903

Claims Analysis

Total Claims: 26
Claim 1
Independent Claim 75 words
A method of making an improved photoresponsive amorphous alloy, said method comprising depositing on a substrate a material including at least silicon and incorporating in said material at least one density of states reducing element, said element being fluorine, and introducing at least one band gap adjusting element into said material without substantially increasing the states in the band gap to produce an alloy having a band gap adjusted for a specified photoresponse wavelength threshold.
Claim 2
Independent Claim 75 words
A method of making an improved photoresponsive amorphous alloy, said method comprising depositing on a substrate a material including at least silicon and incorporating in said material at least one density of states reducing element, said element being fluorine, and introducing at least one band gap adjusting element into said material without substantially increasing the states in the band gap to produce an alloy having a band gap adjusted for a specified photoresponse wavelength threshold.
Claim 3
Dependent Claim 13 words
The method as defined in claim 1 wherein said adjusting element is germanium.
Claim 4
Dependent Claim 29 words
The method as defined in claim 1 wherein said alloy is glow discharge deposited from at least a mixture of SiF 4 , H 2 and GeH 4 .
Claim 5
Dependent Claim 18 words
The method as defined in claim 3 wherein said mixture includes up to one percent GeH 4 .
Claim 6
Dependent Claim 27 words
The method as defined in claim 4 wherein said mixture of SiF 4 and H 2 has a ratio of 4 to 1 to 10 to 1.
Claim 7
Dependent Claim 30 words
An amorphous alloy made by the process of claim 4 wherein said mixture of SiF 4 and H 2 has a ratio of 4 to 1 to 10 to 1.
Claim 8
Dependent Claim 21 words
An amorphous alloy made by the process of claim 3 wherein said mixture includes up to one percent GeH 4 .
Claim 9
Dependent Claim 29 words
The method as defined in claim 1 wherein said alloy is deposited with an active photoresponsive region therein and said adjusting element is introduced at least in said region.
Claim 10
Dependent Claim 86 words
The method as defined in claim 1 wherein said method forms one step in a multi-step process for forming successively deposited alloy layers of opposite (p and n) conductivity type, the n-type layer being formed by introducing during the deposition of the layer an n-dopant element which is deposited with the deposited layer to produce an n-type layer and the p-type layer being formed by introducing during deposition of the layer of p-dopant element which is deposited with the deposited layer to produce a p-type layer.
Claim 11
Dependent Claim 44 words
The method as defined in claim 9 wherein there is deposited between said p and n doped layers an intrinsic amorphous alloy layer without a p or n dopant element present therein, at least a portion of said intrinsic layer containing said adjusting element.
Claim 12
Dependent Claim 22 words
The method as defined in claim 1 further including introducing a second density of states reducing element, said second element being hydrogen.
Claim 13
Dependent Claim 29 words
The method as defined in claim 11 wherein both said density of states reducing elements are incorporated into said depositing alloy substantially simultaneously with said band gap adjusting element.
Claim 14
Dependent Claim 19 words
The method as defined in claim 1 wherein said reducing element is incorporated into said alloy after deposition thereof.
Claim 15
Dependent Claim 20 words
The method as defined in claim 1 wherein said adjusting element is introduced into said alloy in substantially discrete layers.
Claim 16
Dependent Claim 19 words
The method as defined in claim 1 wherein said adjusting element is introduced into said alloy in varying amounts.
Claim 17
Dependent Claim 19 words
The method as defined in claim 1 including evaporating said adjusting element prior to introducing it into said alloy.
Claim 18
Dependent Claim 21 words
The method as defined in claim 16 including plasma activating said adjusting element as it is being introduced into said alloy.
Claim 19
Dependent Claim 17 words
The method as defined in claim 17 including activating said adjusting element by plasma activated vapor deposition.
Claim 20
Dependent Claim 20 words
An amorphous alloy made by the process of claim 17 including activating said adjusting element by plasma activated vapor deposition.
Claim 21
Dependent Claim 24 words
An amorphous alloy made by the process of claim 16 including plasma activating said adjusting element as it is being introduced into said alloy.
Claim 22
Dependent Claim 38 words
The method as defined in claim 1 wherein said method includes depositing at least a portion of said alloy with one of a p or n dopant element therein to form a p or n conductivity type alloy.
Claim 23
Dependent Claim 16 words
An amorphous alloy made by the process of claim 1 wherein said adjusting element is germanium.
Claim 24
Dependent Claim 32 words
An amorphous alloy made by the process of claim 1 wherein said alloy is glow discharge deposited from at least a mixture of SiF 4 , H 2 and GeH 4 .
Claim 25
Dependent Claim 22 words
An amorphous alloy made by the process of claim 1 wherein said adjusting element is introduced into said alloy in varying amounts.
Claim 26
Dependent Claim 22 words
An amorphous alloy made by the process of claim 1 including evaporating said adjusting element prior to introducing it into said alloy.

References Cited (Backward Citations)

US4217374A Cited
US4342044A Cited
US4226898A Cited
US4239554A Cited
GB2038086A Cited
US4251287A Cited
US4377723A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-06-10 1988-12-10 1989-06-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-06-10 1992-12-10 1993-06-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-06-10 1996-12-10 1997-06-11 $7700.00 Window Closed / Lapsed

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