US4486286A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of depositing a carbon film on a substrate and products obtained thereby
Assignee: Technion Research and Development Foundation Ltd
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Filing: 1982-09-28
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Granted: 1984-12-04
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Expires: 2002-09-28
Abstract
Abstract There is disclosed a method for depositing a diamond or diamond-like carbon film on at least one substrate employing a hydrocarbon gas and at least one gas which preferentially removes by chemical sputtering other forms of carbon, especially graphite from said film to thereby obtain useful carbon film coated products.
Inventors
- 👤 Gerhard Lewin
- 👤 Dan Nir
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 14:55
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/26; C23C16/27; C23C16/277; A; A61; A61L; A61L27/00; A61L27/28; A61L27/30; A61L27/303; C23C14/00; C23C14/22; C23C14/24; C23C14/32; C23C16/276; C23C16/44; C23C16/50; C23C16/513; A61F; A61F2310/00; A61F2310/00389; A61F2310/00574; Y; Y10; Y10T; Y10T428/00; Y10T428/30
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
96 words
A method of forming a diamond-like carbon film on a substrate comprising: (a) providing a source of carbon ions; (b) directing carbon ions to a substrate under conditions producing a diamond-like carbon film which may contain other forms of carbon; (c) providing a source of second ions from a non-hydrocarbon gas in greater than an impurity amount capable of preferentially removing said other forms of carbon by chemical sputtering; and (d) directing said second ions to said substrate under conditions effective to promote the preferential chemical sputtering of said other forms of carbon in said film.
Claim 2
Independent Claim
96 words
A method of forming a diamond-like carbon film on a substrate comprising: (a) providing a source of carbon ions; (b) directing carbon ions to a substrate under conditions producing a diamond-like carbon film which may contain other forms of carbon; (c) providing a source of second ions from a non-hydrocarbon gas in greater than an impurity amount capable of preferentially removing said other forms of carbon by chemical sputtering; and (d) directing said second ions to said substrate under conditions effective to promote the preferential chemical sputtering of said other forms of carbon in said film.
Claim 3
Dependent Claim
19 words
The method of claim 1 wherein said carbon ions and said second ions are simultaneously directed to said substrate.
Claim 4
Dependent Claim
13 words
The method of claim 1 wherein said other form of carbon is graphite.
Claim 5
Dependent Claim
34 words
The method of claim 1 wherein said second ions are obtained from at least one non-hydrocarbon gas containing at least one element selected from the group consisting of carbon, oxygen, chlorine, fluorine and hydrogen.
Claim 6
Dependent Claim
26 words
The method of claim 4 wherein said gases are selected from the group consisting of carbon dioxide, oxygen, carbon monoxide, carbon tetrachloride, carbon tetrafluoride and hydrogen.
Claim 7
Dependent Claim
22 words
The method of claim 1 further comprising utilizing a non-reactive gas to stabilize the discharge of said carbon ions and second ions.
Claim 8
Dependent Claim
11 words
The method of claim 6 wherein said non-reactive gas is argon.
Claim 9
Dependent Claim
18 words
The method of claim 1 further comprising at least one hydrocarbon gas as the source of carbon ions.
Claim 10
Dependent Claim
17 words
The method of claim 8 wherein said hydrocarbon gases contain at least 40 atomic percent of carbon.
Claim 11
Dependent Claim
19 words
The method of claim 9 wherein said hydrocarbon gases are selected from the group consisting of acetylene and benzene.
Claim 12
Dependent Claim
58 words
The method of claim 4 further comprising obtaining said second ions from an oxygen containing gas and adding a hydrogen containing gas in an amount sufficient to limit the absorption of infrared radiation of a one micron film layer at a wavelength of about 9.5 micrometers to a value of no more than about 6 to 8 percent.
Claim 13
Dependent Claim
17 words
The method of claim 11 wherein said hydrogen containing gas is selected from hydrogen gas and deuterium.
Claim 14
Dependent Claim
49 words
The method of claim 1 wherein acetylene is the source of carbon ions and carbon dioxide is the source of second ions and the pressure ratio of acetylene to carbon dioxide is between about 0.5-5.0:1 as read on a thermocouple gauge calibrated for air before the discharge is started.
Claim 15
Dependent Claim
29 words
The method of claim 13 wherein the ratio of acetylene to carbon dioxide is about 3:1 in the initial stages of deposition and is thereafter reduced to about 1:1.
Claim 16
Dependent Claim
20 words
The method of claim 1 further comprising heating the substrate to a temperature between about 100° C. and 200° C.
Claim 17
Dependent Claim
23 words
The method of claim 1 further comprising producing said carbon ions and said second ions in the same radiofrequency discharge with said substrate.
Claim 18
Dependent Claim
15 words
The method of claim 16 wherein said substrate is in contact with a radiofrequency electrode.
Claim 19
Dependent Claim
21 words
The method of claim 1 further comprising producing said carbon ions and said second ions in at least one ion-producing source.
Claim 20
Dependent Claim
38 words
The method of claim 18 wherein said carbon ions and said second ions are produced in separate ion-producing sources to form first and second plasma or ion beams and contacting said beams at the surface of said substrate.
Claim 21
Dependent Claim
37 words
The method of claim 18 wherein said carbon ions and said second ions are produced in separate ion-producing sources to form first and second plasma or ion beams and contacting said beams in front of said substrate.
Claim 22
Dependent Claim
19 words
The method of claim 19 or 20 wherein one beam is negatively biased with respect to the other beam.
Claim 23
Dependent Claim
37 words
The method of claim 18 further comprising producing a plasma beam containing said carbon ions and electrons and applying a magnetic field substantially perpendicular to said plasma beam to thereby remove a portion of said plasma electrons.
Claim 24
Dependent Claim
14 words
A substrate having a diamond-like carbon film produced by the process of claim 1.
References Cited (Backward Citations)
US3840451A
Cited
US3961103A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-12-04 | 1988-06-04 | 1988-12-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-12-04 | 1992-06-04 | 1992-12-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-12-04 | 1996-06-04 | 1996-12-04 | $7700.00 | Window Closed / Lapsed |