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US4453151A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor gas sensor

Assignee: EASTERN TECHNICAL PRODUCTS A CO PARTNERSHIP
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Filing: 1982-06-07
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Granted: 1984-06-05
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Expires: 2002-06-07
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Abstract

Abstract A semiconductor gas sensor for use in equipment for detecting small amounts of H 2 S. The method of sensor fabrication comprises spray deposition of a mixture of metal oxides mixed together with various metal and non-metal materials which serve in the finished product as activators, dopants, and/or film binder materials, and including in suspension a molecular sieve material, for enhancing and defining porosity on a scale of molecular dimensions in the finished sensor. All of the foregoing materials are suspended in a suitable solution and preferably sprayed onto a heated insulating substrate to form the finished product. The example sensor, capable of selective detection of H 2 S in air and a sensitivity of less than 1 PPM (part per million), is comprised of a platinum activated alumina, tin oxide, and zeolite molecular sieve material.

Inventors

  • 👤 David J. Leary
  • 👤 James O. Barnes

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 19:29
CPC Classifications
G; G01; G01N; G01N27/00; G01N27/02; G01N27/04; G01N27/12; Y; Y10; Y10T; Y10T436/00; Y10T436/18; Y10T436/182; Y10T436/184

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 81 words
A semiconductor sensor for specific gases comprising a multiple layered structure including an insulating substrate having a discrete semiconductor layer deposited thereon formed by spraying a liquid suspension of a mixture comprising a preselected solid metal/oxide semiconductor capable of sensing a specific gas and a porosity enhancing and defining agent capable of defining pore sizes in said layer of a predetermined size which is selected to permit a predetermined specific gas to come into contact with the semiconductor within said layer.
Claim 2
Dependent Claim 81 words
A semiconductor sensor for specific gases comprising a multiple layered structure including an insulating substrate having a discrete semiconductor layer deposited thereon formed by spraying a liquid suspension of a mixture comprising a preselected solid metal/oxide semiconductor capable of sensing a specific gas and a porosity enhancing and defining agent capable of defining pore sizes in said layer of a predetermined size which is selected to permit a predetermined specific gas to come into contact with the semiconductor within said layer.
Claim 3
Dependent Claim 22 words
The article of claim 1 wherein said mixture of solids in addition contains a transition metal activator for the metal oxide semiconductor.
Claim 4
Dependent Claim 42 words
The article of claim 2 wherein said insulating substrate has deposited thereon at least two electrical contacts between the substrate and the semiconductor containing layer, said contacts being separated from each other and capable of being electrically connected through said semiconductor layer.
Claim 5
Dependent Claim 42 words
The article of claim 3 wherein said insulating substrate contains a resistance heating element incorporated therein which is physically separated from said electrical contacts and said semiconductor layer and capable of heating said substrate to a temperature in excess of 150° C.
Claim 6
Dependent Claim 20 words
The article of claim 1 wherein the porosity increasing and defining agent includes zeolite to define a predetermined pore size.
Claim 7
Dependent Claim 23 words
The article of claim 5 wherein at least 70% by weight of the semiconductor gas sensor layer is a gas sensing metal oxide.
Claim 8
Dependent Claim 32 words
The article of claim 6 wherein the metal-oxide is selected from the group of metal oxides including stannic oxide, zinc oxide, aluminum oxide, gallium oxide, ferric oxide, indium oxide, or mixtures thereof.

References Cited (Backward Citations)

US4013943A Cited
US4197089A Cited
US4338281A Cited
US4347732A Cited
EP0059557A2 Cited
US4387165A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-06-05 1987-12-05 1988-06-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-06-05 1991-12-05 1992-06-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-06-05 1995-12-05 1996-06-05 $7700.00 Window Closed / Lapsed

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