Abstract A process for coating the surface of a material with a carbonaceous coating by vacuum deposition derives the carbon in substantially pure form from a hydrocarbon gas plasma, the surface to be coated being coupled to an A.C. power source operating at a frequency below 500 kHz at which the electrical impedance of the plasma is substantially non-varying during the deposition process. Because the plasma impedance is substantially constant the process is safe and reproducible and can be carried out without dynamic monitoring and adjustment procedures and there is no requirement for an impedance matching network between the A.C. power supply and the vacuum chamber. Frequencies in the range 300-400 kHz with applied voltages of the order of 1KV or greater have been found to give good results.
A process for applying a carbonaceous coating to a surface by vacuum deposition of carbon derived from a hydrocarbon gas in plsma form, wherein the surface is coupled to an AC power supply operating at a frequency below 500 kHz at which the electrical impedance of the plasma is substantially non-varying during the deposition process.
Claim 2
Dependent Claim
55 words
A process for applying a carbonaceous coating to a surface by vacuum deposition of carbon derived from a hydrocarbon gas in plsma form, wherein the surface is coupled to an AC power supply operating at a frequency below 500 kHz at which the electrical impedance of the plasma is substantially non-varying during the deposition process.
Claim 3
Dependent Claim
41 words
A process as claimed in claim 1, wherein the pressure during the deposition process and the voltage delivered by the AC power supply is such that the nature of the hydrocarbon gas from which the plasma is derived is not critical.
Claim 4
Dependent Claim
19 words
A process as claimed in claim 2, wherein the pressure is in the range 1×10 -3 to 10.0 torr.
Claim 5
Dependent Claim
17 words
A process as claimed in claim 2 or claim 3, wherein the voltage is about 2 KV.
Claim 6
Dependent Claim
26 words
A process as claimed in claim 1, wherein prior to the deposition process the substrate is cleaned by an ion plasma derived from an inert gas.
Claim 7
Dependent Claim
18 words
A process as claimed in claim 1, wherein the substrate is initially at a predetermined temperature above ambient.