US4426247A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for forming micropattern
Assignee: NTT Inc
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Filing: 1983-04-06
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Granted: 1984-01-17
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Expires: 2003-04-06
Abstract
Abstract A method for forming a micropattern, comprises the steps of forming an organic polymeric material layer on a substrate, forming a silicone layer on the organic polymeric material layer, selectively irradiating a surface of the silicone layer with a high-energy beam, exposing the surface of the silicone layer to a radical addition polymerizable monomer gas so as to form a graft polymer film on an irradiated portion of the surface of the silicone layer, performing reactive ion etching using the graft polymer film as a mask so as to form a silicone pattern, and performing reactive ion etching using the silicone pattern as a mask so as to form an organic polymeric material pattern. The method allows formation of a resist pattern with a high precision and a high aspect ratio.
Inventors
- 👤 Toshiaki Tamamura
- 👤 Saburo Imamura
- 👤 Masao Morita
- 👤 Osamu Kogure
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 13:28
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/265; G03F7/004; G03F7/075; G03F7/0757; G03F7/36; G03F7/38; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/95
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
121 words
A method for forming a micropattern, comprising the steps of: forming an organic polymeric material layer on a substrate; forming a silicone layer on said organic polymeric material layer; selectively irradiating a surface of said silicone layer with a high-energy beam; exposing the surface of said silicone layer to a radical addition polymerizable monomer gas so as to form a graft polymer film on an irradiated portion of the surface of said silicone layer; performing dry etching using said graft polymer film as a mask so as to form a pattern of said silicone layer; and performing dry etching using said pattern of said silicone layer as a mask so as to form a pattern of said organic polymeric material layer.
Claim 2
Independent Claim
121 words
A method for forming a micropattern, comprising the steps of: forming an organic polymeric material layer on a substrate; forming a silicone layer on said organic polymeric material layer; selectively irradiating a surface of said silicone layer with a high-energy beam; exposing the surface of said silicone layer to a radical addition polymerizable monomer gas so as to form a graft polymer film on an irradiated portion of the surface of said silicone layer; performing dry etching using said graft polymer film as a mask so as to form a pattern of said silicone layer; and performing dry etching using said pattern of said silicone layer as a mask so as to form a pattern of said organic polymeric material layer.
Claim 3
Dependent Claim
37 words
A method according to claim 1, wherein said step of performing dry etching so as to form said pattern of said silicone layer comprises a reactive ion etching using a mixture of tetrafluoride gas and hydrogen gas.
Claim 4
Dependent Claim
33 words
A method according to claim 1, wherein said step of performing dry etching so as to form said pattern of said organic polymeric material layer comprises a reactive ion etching using oxygen gas.
Claim 5
Dependent Claim
15 words
A method according to claim 1, wherein said silicone layer comprises a silicone resin layer.
Claim 6
Dependent Claim
21 words
A method according to claim 4, wherein said silicone resin layer comprises a ternary curing-type silicone resin having a vinyl group.
Claim 7
Dependent Claim
19 words
A method according to claim 1, wherein said organic polymeric material layer is thicker than said silicone resin layer.
Claim 8
Dependent Claim
13 words
A method according to claim 1, wherein said substrate comprises a silicon substrate.
Claim 9
Dependent Claim
14 words
A method according to claim 1, wherein said monomer gas comprises a styrene gas.
Claim 10
Independent Claim
98 words
A method for forming a micropattern, comprising the steps of: forming a ternary curing-type silicone resin layer of a ternary curing-type silicone resin having a vinyl group on a substrate; selectively irradiating a surface of said silicone resin layer with a high-energy beam; exposing the surface of said silicone resin layer to a radical addition polymerizable monomer gas so as to form a graft polymer film on an irradated portion of said silicone resin layer; and performing dry etching using said graft polymer film as a mask so as to form a pattern of said silicone resin layer.
Claim 11
Independent Claim
98 words
A method for forming a micropattern, comprising the steps of: forming a ternary curing-type silicone resin layer of a ternary curing-type silicone resin having a vinyl group on a substrate; selectively irradiating a surface of said silicone resin layer with a high-energy beam; exposing the surface of said silicone resin layer to a radical addition polymerizable monomer gas so as to form a graft polymer film on an irradated portion of said silicone resin layer; and performing dry etching using said graft polymer film as a mask so as to form a pattern of said silicone resin layer.
Claim 12
Dependent Claim
36 words
A method according to claim 9, wherein said step of performing dry etching for forming said pattern of said silicone resin layer comprises a reactive ion etching using a mixture of tetrafluoride gas and hydrogen gas.
Claim 13
Dependent Claim
13 words
A method according to claim 9, wherein said substrate comprises a silicon substrate.
Claim 14
Dependent Claim
14 words
A method according to claim 9, wherein said monomer gas comprises a styrene gas.
References Cited (Backward Citations)
US4195108A
Cited
US4370405A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-01-16 | 1987-07-18 | 1988-01-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-01-16 | 1991-07-18 | 1992-01-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-01-16 | 1995-07-18 | 1996-01-17 | $7700.00 | Window Closed / Lapsed |