Conditioning of polyamides for electroless plating

Claim 2

A process for electroless plating of polyamide substrates wherein the substrate is etched with an aqueous acid etch solution prior to electroless plating, the improvement which comprises conditioning the substrate prior to contact with the aqueous acid etch solution by contact with an aqueous alkaline conditioning solution having a pH of at least about 10 and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide substrate for a time sufficient to enhance aqueous acid etch of the polyamide substrate to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 3

A process as claimed in claim 1 in which the polyamide substrate is contacted with the aqueous alkaline conditioning solution for a period of time of from about 0.5 to about 20 minutes.

Claim 4

A process as claimed in claim 1 in which the polyamide substrate is contacted, prior to contact with the aqueous alkaline conditioning solution, with a dilute aqueous solution of an organic solvent for the polyamide for a time sufficient to soften the surface of the polyamide substrate.

Claim 5

A process as claimed in claim 1 in which the polyamide substrate is contacted following contact with the aqueous alkaline conditioning solution, with a dilute aqueous solution of an organic solvent for the polyamide for a time sufficient to soften the surface of the polyamide substrate.

Claim 6

A process as claimed in claim 1 in which the conditioning solution contains an organic solvent for the polyamide.

Claim 7

A process as claimed in claim 1 in which the polyamide is a filled polyamide.

Claim 8

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate for etching by contacting the polyamide substrate with an aqueous alkaline conditioning solution having a pH of at least about 10 and maintained at a temperature from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide substrate for a time sufficient to render the substrate receptive to etch by an organic acid; (b) etching the conditioned polyamide substrate by contacting the conditioned polyamide substrate with an aqueous acid etch solution comprising at least one water soluble organic acid containing from 2 to about 10 carbon atoms in the molecule and present in the aqueous solution in a concentration of at least about 3 percent by weight of the solution and sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 9

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate for etching by contacting the polyamide substrate with an aqueous alkaline conditioning solution having a pH of at least about 10 and maintained at a temperature from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide substrate for a time sufficient to render the substrate receptive to etch by an organic acid; (b) etching the conditioned polyamide substrate by contacting the conditioned polyamide substrate with an aqueous acid etch solution comprising at least one water soluble organic acid containing from 2 to about 10 carbon atoms in the molecule and present in the aqueous solution in a concentration of at least about 3 percent by weight of the solution and sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 10

A process as claimed in claim 7 in which the polyamide substrate is cleansed prior to contact with the metal catalyst by contact with an aqueous acidic or basic cleansing solution.

Claim 11

A process as claimed in claim 7 in which the polyamide substrate is contacted, prior to contact with the conditioning solution, with a dilute aqueous solution of an organic solvent for the polyamide for a time sufficient to soften the surface of the polyamide substrate.

Claim 12

A process as claimed in claim 7 in which the polyamide substrate is contacted following contact with the conditioning solution, with a dilute aqueous solution of an organic solvent for the polyamide for a time sufficient to soften the surface of the polyamide substrate.

Claim 13

A process as claimed in claim 7 in which the conditioning solution contains an organic solvent for the polyamide.

Claim 14

A process as claimed in claim 7 in which the polyamide is a filled polyamide.

Claim 15

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate for etching by contacting the polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the alkali metal hydroxide concentration of the aqueous alkaline conditioning solution is from about 2 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a time sufficient to render the polyamide substrate receptive to etch by an acetic acid compound; (b) etching the conditioned polyamide substrate by contacting the conditioned polyamide substrate with an aqueous acid etch solution comprising at least one acetic acid compound having the formula: ##STR3## wherein each X is independently selected from the group consisting of hydrogen, hydroxyl and halogen and in which the acetic acid compound concentration is sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 16

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate for etching by contacting the polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the alkali metal hydroxide concentration of the aqueous alkaline conditioning solution is from about 2 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a time sufficient to render the polyamide substrate receptive to etch by an acetic acid compound; (b) etching the conditioned polyamide substrate by contacting the conditioned polyamide substrate with an aqueous acid etch solution comprising at least one acetic acid compound having the formula: ##STR3## wherein each X is independently selected from the group consisting of hydrogen, hydroxyl and halogen and in which the acetic acid compound concentration is sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 17

A process as claimed in claim 13 in which the polyamide substrate is cleansed prior to contact with the metal catalyst by contact with an aqueous acidic or basic cleansing solution.

Claim 18

A process as claimed in claim 13 in which the polyamide substrate is contacted, prior to contact with the aqueous alkaline conditioning solution, with a dilute aqueous solution of an organic solvent for the polyamide for a time sufficient to soften the surface of the polyamide substrate.

Claim 19

A process as claimed in claim 13 in which the polyamide substrate is contacted following contact with the aqueous alkaline conditioning solution, with a dilute aqueous solution of an organic solvent for the polyamide for a time sufficient to soften the surface of the polyamide substrate.

Claim 20

A process as claimed in claim 13 in which the aqueous alkaline conditioning solution contains an organic solvent for the polyamide.

Claim 21

A process as claimed in claim 17 in which the organic solvent is an alkali soluble organic solvent.

Claim 22

A process as claimed in claim 13 in which the polyamide substrate is formed of a filled polyamide.

Claim 23

A process as claimed in claim 13 in which the total alkali metal hydroxide content of the conditioning solution is from about 10 to about 50 percent by weight of the solution.

Claim 24

A process as claimed in claim 13 in which the aqueous alkaline conditioning solution is maintained at a temperature from about 170° to about 200° F.

Claim 25

A process as claimed in claim 13 in which the contact time in the conditioning solution is from about 0.5 to about 20 minutes.

Claim 26

A process as claimed in claim 13 in which the total acetic acid compound concentration of the etch solution is from about 3 percent by weight to solution saturation.

Claim 27

A process as claimed in claim 13 in which the total acetic acid compound concentration of the aqueous acid etch solution is from about 5 to about 60 percent by weight of the solution.

Claim 28

A process as claimed in claim 13 in which the polyamide substrate is contacted with the aqueous acid etch solution for a period of time of from about 10 seconds to about 15 minutes.

Claim 29

A process as claimed in claim 13 in which the acetic acid compound is trichloroacetic acid.

Claim 30

A process as claimed in claim 13 in which the acetic acid compound is dichloroacetic acid.

Claim 31

A process as claimed in claim 13 in which the acetic acid compound is acetic acid.

Claim 32

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate by contacting the polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the total alkali metal hydroxide concentration is from about 10 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a period of time of from about 0.5 to about 20 minutes; (b) forming an etched polyamide substrate by contacting the conditioned polyamide substrate with an aqueous acid etch solution comprising at least one acetic acid compound selected from the group consisting of trichloroacetic acid, dichloroacetic acid and acetic acid in which the acetic acid compound concentration is sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 33

A process for preparing the surface of polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate by contacting the polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the total alkali metal hydroxide concentration is from about 10 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a period of time of from about 0.5 to about 20 minutes; (b) forming an etched polyamide substrate by contacting the conditioned polyamide substrate with an aqueous acid etch solution comprising at least one acetic acid compound selected from the group consisting of trichloroacetic acid, dichloroacetic acid and acetic acid in which the acetic acid compound concentration is sufficient to render the conditioned polyamide substrate substantially uniformly and directly receptive to a metal electroless plating catalyst.

Claim 34

A process as claimed in claim 29 in which the polyamide substrate is cleansed prior to contact with the metal catalyst by contact with an aqueous acidic or basic cleansing solution.

Claim 35

A process as claimed in claim 29 in which the polyamide substrate is contacted, prior to contact with the aqueous alkaline conditioning solution, with a dilute aqueous solution of an organic solvent for the polyamide for a time sufficient to soften the surface of the polyamide substrate.

Claim 36

A process as claimed in claim 29 in which the polyamide substrate is contacted following contact with the aqueous alkaline conditioning solution, with a dilute aqueous solution of an organic solvent for the polyamide for a time sufficient to soften the surface of the polyamide substrate.

Claim 37

A process as claimed in claim 29 in which the aqueous alkaline conditioning solution contains an organic solvent for the polyamide.

Claim 38

A process as claimed in claim 33 in which the organic solvent is alkali soluble.

Claim 39

A process as claimed in claim 29 in which the polyamide substrate is formed of a filled polyamide.

Claim 40

A process as claimed in claim 29 in which the total alkali metal hydroxide content of the aqueous alkaline conditioning solution is from 10 to about 50 percent by weight of the solution.

Claim 41

A process as claimed in claim 29 in which the aqueous alkaline conditioning solution is maintained at a temperature from about 170° to about 200° F.

Claim 42

A process as claimed in claim 29 in which the total acetic acid compound concentration of the aqueous acid etch solution is from about 5 percent by weight of the solution to solution saturation.

Claim 43

A process as claimed in claim 29 in which the total acetic acid compound concentration of the aqueous acid etch solution is from about 5 to about 60 percent by weight of the solution.

Claim 44

A process as claimed in claim 29 in which the polyamide substrate is contacted with the aqueous acid etch solution for a period of time of from about 10 seconds to about 15 minutes.

Claim 45

A process for preparing the surface of filled polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate by contacting the filled polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the total alkali metal hydroxide concentration is from about 10 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a period of time of from about 10 seconds to about 20 minutes; (b) forming an etched polyamide substrate by contacting the conditioned polyamide substrate with an aqueous etch solution comprising trichloroacetic acid, present in a concentration from about 5 percent by weight of solution to solution saturation to render the conditioned filled polyamide substrate uniformly and directly receptive to a metal electroless plating catalyst.

Claim 46

A process for preparing the surface of filled polyamide substrates for electroless plating which comprises: (a) forming a conditioned polyamide substrate by contacting the filled polyamide substrate with an aqueous alkaline conditioning solution of at least one alkali metal hydroxide in which the total alkali metal hydroxide concentration is from about 10 percent by weight of the solution to solution saturation and maintained at a temperature of from about 150° F. to the lesser of the boiling point of the solution and the softening temperature of the polyamide surface for a period of time of from about 10 seconds to about 20 minutes; (b) forming an etched polyamide substrate by contacting the conditioned polyamide substrate with an aqueous etch solution comprising trichloroacetic acid, present in a concentration from about 5 percent by weight of solution to solution saturation to render the conditioned filled polyamide substrate uniformly and directly receptive to a metal electroless plating catalyst.

Claim 47

A process as claimed in claim 42 in which the polyamide substrate is cleansed prior to contact with the metal catalyst by contact with an aqueous acidic or basic cleansing solution.

Claim 48

A process as claimed in claim 42 in which the polyamide substrate is contacted, following contact with the aqueous alkaline conditioning solution, with a dilute aqueous solution of an organic solvent for the polyamide for a time sufficient to soften the surface of the polyamide substrate.

Claim 49

A process as claimed in claim 42 in which the total alkali metal hydroxide content of the aqueous alkaline conditioning solution is from 10 to about 50 percent by weight of the aqueous alkaline conditioning solution.

Claim 50

A process as claimed in claim 41 in which the aqueous alkaline conditioning solution is maintained at a temperature from about 170° to about 200° F.

Claim 51

A process as claimed in claim 41 in which the total trichloroacetic acid concentration of the aqueous acid etch solution is from about 5 to about 60 percent by weight of the aqueous acid etch solution.

Claim 52

A process as claimed in claim 41 in which the polyamide substrate is contacted with the aqueous acid etch solution for a period of time of from about 10 seconds to about 15 minutes.

Claim 53

A process as claimed in claim 41 in which the polyamide substrate is contacted with the aqueous acid etch solution for a period of time from about 0.25 to about 3 minutes.