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US4265991A Expired / Lapsed US ⏱️ 0.0 years remaining

Electrophotographic photosensitive member and process for production thereof

Assignee: Canon Inc
•
Filing: 1978-12-19
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Granted: 1981-05-05
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Expires: 1998-12-19
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Abstract

Abstract A layer of amorphous silicon containing H, preferably 10-40 atomic %H, is used as a photoconductive layer for electrophotographic photosensitive member.

Inventors

  • 👤 Yutaka Hirai
  • 👤 Toshiyuki Komatsu
  • 👤 Katsumi Nakagawa
  • 👤 Teruo Misumi
  • 👤 Tadaji Fukuda

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 05:06
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/14; C23C14/16; C23C14/0021; C23C14/0036; C23C14/0057; C23C16/00; C23C16/22; C23C16/24; C23C16/44; C23C16/455; C23C16/45523; C23C16/50; C23C16/505; C23C16/507; C23C16/509; G; G03; G03G; G03G5/00; G03G5/02; G03G5/04; G03G5/08; G03G5/082; G03G5/08214; G03G5/08221; G03G5/08228; G03G5/08235; G03G5/08242; G03G5/08278; H; H10; H10F; H10F30/00; H10F30/10; H10F30/15; H10F71/00; H10F71/10; H10F71/103; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02P; Y02P70/00; Y02P70/50

Claims Analysis

Total Claims: 23
Claim 1
Independent Claim 54 words
An electrophotographic photosensitive member comprising a substrate for electrophotography and a photoconductive layer, said photoconductive layer being formed of amorphous silicon by utilizing electric discharge, containing 10-40 atomic percent of hydrogen and being 5-80 microns in thickness, and said photoconductive layer having a high dark resistance and a high SN ratio for electrophotographic processing.
Claim 2
Dependent Claim 54 words
An electrophotographic photosensitive member comprising a substrate for electrophotography and a photoconductive layer, said photoconductive layer being formed of amorphous silicon by utilizing electric discharge, containing 10-40 atomic percent of hydrogen and being 5-80 microns in thickness, and said photoconductive layer having a high dark resistance and a high SN ratio for electrophotographic processing.
Claim 3
Dependent Claim 35 words
An electrophotographic photosensitive member according to claim 1, in which said photoconductive layer is doped with 10 -6 -10 -3 atomic percent of an element of Group IIIA of the Periodic Table as an impurity.
Claim 4
Dependent Claim 28 words
An electrophotographic photosensitive member according to claim 2, in which said element of Group IIIA of the Periodic Table is selected from B, Al, Ga, In and Tl.
Claim 5
Dependent Claim 35 words
An electrophotographic photosensitive member according to claim 1, in which said photoconductive layer is doped with 10 -8 -10 -5 atomic percent of an element of Group VA of the Periodic Table as an impurity.
Claim 6
Dependent Claim 28 words
An electrophotographic photosensitive member according to claim 4, in which said element of Group VA of the Periodic Table is selected from N, P, As, Sb and Bi.
Claim 7
Dependent Claim 29 words
An electrophotographic photosensitive member according to claim 1, further comprising an antireflection layer overlying the surface of said photoconductive layer, said antireflection layer being 50-100 milli microns in thickness.
Claim 8
Dependent Claim 18 words
An electrophotographic photosensitive member according to claim 1, in which said substrate is in a shape of cylinder.
Claim 9
Dependent Claim 82 words
An electrophotographic photosensitive member comprising a substrate for electrophotography, a barrier layer capable of preventing injection of electric carrier from said substrate side when the charging treatment is applied to said photosensitive member, and a photoconductive layer overlying said barrier layer, said photoconductive layer being formed of amorphous silicon by utilizing electric discharge, containing 10-40 atomic percent of hydrogen and being 5-80 microns in thickness, and said photoconductive layer having a high dark resistance and a high SN ratio for electrophotographic processing.
Claim 10
Dependent Claim 82 words
An electrophotographic photosensitive member comprising a substrate for electrophotography, a barrier layer capable of preventing injection of electric carrier from said substrate side when the charging treatment is applied to said photosensitive member, and a photoconductive layer overlying said barrier layer, said photoconductive layer being formed of amorphous silicon by utilizing electric discharge, containing 10-40 atomic percent of hydrogen and being 5-80 microns in thickness, and said photoconductive layer having a high dark resistance and a high SN ratio for electrophotographic processing.
Claim 11
Dependent Claim 35 words
An electrophotographic photosensitive member according to claim 8, in which said photoconductive layer is doped with 10 -6 -10 -3 atomic percent of an element of Group IIIA of the Periodic Table as an impurity.
Claim 12
Dependent Claim 28 words
An electrophotographic photosensitive member according to claim 9, in which said element of Group IIIA of the Periodic Table is selected from B, Al, Ga, In and Tl.
Claim 13
Dependent Claim 35 words
An electrophotographic photosensitive member according to claim 8, in which said photoconductive layer is doped with 10 -8 -10 -5 atomic percent of an element of Group VA of the Periodic Table as an impurity.
Claim 14
Dependent Claim 28 words
An electrophotographic photosensitive member according to claim 11, in which said element of Group VA of the Periodic Table is selected from N, P, As, Sb and Bi.
Claim 15
Dependent Claim 29 words
An electrophotographic photosensitive member according to claim 8, further comprising an antireflection layer overlying the surface of said photoconductive layer, said antireflection layer being 50-100 milli microns in thickness.
Claim 16
Dependent Claim 18 words
An electrophotographic photosensitive member according to claim 9, in which said substrate is in a shape of cylinder.
Claim 17
Dependent Claim 72 words
An electrophotographic photosensitive member comprising a substrate for electrophotography, a photoconductive layer, said photoconductive layer being formed of amorphous silicon by utilizing electric discharge, containing 10-40 atomic percent of hydrogen and being 5-80 microns in thickness, said photoconductive layer also having a high dark resistance and a high SN ratio for electrophotographic processing, and a covering layer overlying the surface of said photoconductive layer, said covering layer being 0.5-70 microns in thickness.
Claim 18
Dependent Claim 72 words
An electrophotographic photosensitive member comprising a substrate for electrophotography, a photoconductive layer, said photoconductive layer being formed of amorphous silicon by utilizing electric discharge, containing 10-40 atomic percent of hydrogen and being 5-80 microns in thickness, said photoconductive layer also having a high dark resistance and a high SN ratio for electrophotographic processing, and a covering layer overlying the surface of said photoconductive layer, said covering layer being 0.5-70 microns in thickness.
Claim 19
Dependent Claim 35 words
An electrophotographic photosensitve member according to claim 15, in which said photoconductive layer is doped with 10 -6 -10 -3 atomic percent of an element of Group IIIA of the Periodic Table as an impurity.
Claim 20
Dependent Claim 28 words
An electrophotograpic photosensitive member according to claim 16, in which said element of Group IIIA of the Periodic Table is selected from B, Al, Ga, In and Tl.
Claim 21
Dependent Claim 35 words
An electrophotographic photosensitive member according to claim 15, in which said photoconductive layer is doped with 10 -8 -10 -5 atomic percent of an element of Group VA of the Periodic Table as an impurity.
Claim 22
Dependent Claim 28 words
An electrophotographic photosensitive member according to claim 18, in which said element of Group VA of the Periodic Table is selected from N, P, As, Sb and Bi.
Claim 23
Dependent Claim 18 words
An electrophotographic photosensitive member according to claim 15, in which said substrate is in a shape of cylinder.

References Cited (Backward Citations)

GB796398A Cited
GB939095A Cited
GB1104935A Cited
GB1125444A Cited
US3691104A Cited
US3617354A Cited
GB1332702A Cited
GB1459839A Cited
US4059461A Cited
US4162505A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1984-05-04 1984-11-03 1985-05-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1988-05-04 1988-11-03 1989-05-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1992-05-04 1992-11-03 1993-05-05 $7700.00 Window Closed / Lapsed

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