Metallization process

Claim 2

A deposition process, which comprises: (A) maintaining a vacuum in a chamber; (B) providing a substrate in the chamber; (C) providing depositable vapor comprising transition metal in the vacuum from a vapor source, the vapor normally depositing in tension; (D) permitting the vapor to contact the substrate to cause a deposit thereon; and (E) bombarding the deposit with accelerated particles comprising energetic, atomic particles from another source that are sufficient in number and energy so that the internal stress of the deposit is about zero or in compression.

Claim 3

The process in accordance with claim 1 wherein the vapor comprises chromium or any of its bright alloys.

Claim 4

The process in accordance with claim 1, wherein the bombarding continues as the deposit is built-up.

Claim 5

The process in accordance with claim 1, wherein the bombarding and the vapor contact are sequential.

Claim 6

The process in accordance with claims 3 or 4, wherein the substrate comprises plastic and the vapor comprises chromium or any of its alloys.

Claim 7

The process in accordance with claims 3 or 4, wherein the energetic particles comprise ions of inert gas.

Claim 8

The process in accordance with claim 6, wherein the ions have an energy between about 0.1-30 KeV.

Claim 9

The process in accordance with claim 7, wherein the ratio of ions to atoms of vapor is in the range between about 0.1:100-30:100.

Claim 10

The process in accordance with claim 1, wherein the energetic particles comprise ions of transition metal.

Claim 11

The process in accordance with claim 1, wherein the deposit is in compression after bombardment.

Claim 12

A deposition process, which comprises: (A) maintaining a vacuum in a chamber; (B) providing a substrate in the vacuum; (C) providing depositable first series transition metal vapor in the vacuum from a first source that normally provides deposits that are in tension; (D) permitting the vapor to contact the substrate to cause a deposit thereon; (E) bombarding the deposit with accelerated particles comprising energetic, atomic particles sufficient in number and energy so that the internal stress of the deposit is about zero or in compression.

Claim 13

A deposition process, which comprises: (A) maintaining a vacuum in a chamber; (B) providing a substrate in the vacuum; (C) providing depositable first series transition metal vapor in the vacuum from a first source that normally provides deposits that are in tension; (D) permitting the vapor to contact the substrate to cause a deposit thereon; (E) bombarding the deposit with accelerated particles comprising energetic, atomic particles sufficient in number and energy so that the internal stress of the deposit is about zero or in compression.

Claim 14

The process in accordance with claim 11, wherein the substrate comprises plastic.

Claim 15

The process in accordance with claim 12, wherein the metal comprises chromium or any of its alloys.

Claim 16

The process in accordance with claims 11 or 12 or 13 wherein the energetic particles comprise ions.

Claim 17

The process in accordance with claim 14, wherein the ions comprise chromium ions.

Claim 18

The process in accordance with claim 14, wherein the ions comprise ions of inert gas.

Claim 19

A deposition process, which comprises: (A) maintaining a vacuum in a chamber; (B) providing a plastic substrate in the chamber; (C) providing depositable vapor comprising chromium in the vacuum from a vapor source; (D) permitting the vapor to contact the substrate to cause a deposit thereon; (E) bombarding the deposit with accelerated ions from another source that are sufficient in number and energy so that the internal stress of the deposit is about zero or in compression and its optical reflectance is above about 60%.

Claim 20

A deposition process, which comprises: (A) maintaining a vacuum in a chamber; (B) providing a plastic substrate in the chamber; (C) providing depositable vapor comprising chromium in the vacuum from a vapor source; (D) permitting the vapor to contact the substrate to cause a deposit thereon; (E) bombarding the deposit with accelerated ions from another source that are sufficient in number and energy so that the internal stress of the deposit is about zero or in compression and its optical reflectance is above about 60%.

Claim 21

In a deposition process, which comprises: (A) maintaining a vacuum in a chamber; (B) providing a substrate in the chamber; (C) providing depositable vapor in the vacuum from a vapor source; (D) permitting the vapor to contact the substrate to cause a deposit thereon; and (E) bombarding the deposit with accelerated particles comprising energetic, atomic particles from another source that are sufficient in number and energy to alter the internal stress of said deposit, the improvement which comprises providing a first vapor location of high vapor density and a second energetic particle location of high energetic particle density and moving any of the substrate and the locations of high vapor and energetic particles densities relative to one another to cause a sequential exposure of the substrate to the high vapor density and the high energetic particle density so that the deposit has an internal stress about zero or in compression.

Claim 22

In a deposition process, which comprises: (A) maintaining a vacuum in a chamber; (B) providing a substrate in the chamber; (C) providing depositable vapor in the vacuum from a vapor source; (D) permitting the vapor to contact the substrate to cause a deposit thereon; and (E) bombarding the deposit with accelerated particles comprising energetic, atomic particles from another source that are sufficient in number and energy to alter the internal stress of said deposit, the improvement which comprises providing a first vapor location of high vapor density and a second energetic particle location of high energetic particle density and moving any of the substrate and the locations of high vapor and energetic particles densities relative to one another to cause a sequential exposure of the substrate to the high vapor density and the high energetic particle density so that the deposit has an internal stress about zero or in compression.