US4157935A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for producing nozzle arrays for ink jet printers
Assignee: International Business Machines Corp
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Filing: 1977-12-23
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Granted: 1979-06-12
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Expires: 1997-12-23
Abstract
Abstract Nozzle arrays for ink jet recording are produced by preferred chemical etching of a substrate material which frequently has a non-uniform thickness. The preferred substrate is a monocrystalline silicon wafer and the 100 plane surface of the wafer is coated with etchant masking material and the resist coated wafer is held in close physical contact with a base member. A suitable mask member which defines a nozzle array pattern is spaced a predetermined distance from the base member and is positioned parallel to the base member. The wafer is then exposed through the mask by a suitable light source arranged at a suitable angle while the wafer is simultaneously rotated about an axis perpendicular to the wafer. The wafer is then exposed to a chemical anisotropic etching agent to produce a uniform array of nozzles in the wafer wherein the lateral walls of the nozzles are substantially in the "111" plane of the wafer. The masking material is then stripped from the wafer.
Inventors
- 👤 Erik R. Solyst
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 09:22
CPC Classifications
B; B41; B41J; B41J2/00; B41J2/005; B41J2/01; B41J2/135; B41J2/16; B41J2/1621; B41J2/1631; B41J2/162; B41J2/1626; B41J2/1629; G; G03; G03F; G03F7/00; G03F7/20; G03F7/2002; G03F7/201
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
135 words
The method for producing nozzle arrays for ink jet printers comprising the steps of: mounting a radiation sensitive wafer in physical contact with a base member; said wafer comprising a crystalline material having greatly different anisotropic etch rates in different crystallographic directions; positioning a mask structure having a predetermined pattern of orifice masks thereon parallel to the base member; exposing the wafer through the mask by a columnar light source directed at a predetermined acute angle to said wafer and simultaneously producing relative rotational motion between said light source and said wafer around an axis perpendicular to the base member; treating the wafer to render it subject to anisotropic etching only in the non-exposed areas of the wafer; and anisotropically etching the wafer to produce uniform orifices corresponding to said predetermined pattern from said wafer.
Claim 2
Independent Claim
135 words
The method for producing nozzle arrays for ink jet printers comprising the steps of: mounting a radiation sensitive wafer in physical contact with a base member; said wafer comprising a crystalline material having greatly different anisotropic etch rates in different crystallographic directions; positioning a mask structure having a predetermined pattern of orifice masks thereon parallel to the base member; exposing the wafer through the mask by a columnar light source directed at a predetermined acute angle to said wafer and simultaneously producing relative rotational motion between said light source and said wafer around an axis perpendicular to the base member; treating the wafer to render it subject to anisotropic etching only in the non-exposed areas of the wafer; and anisotropically etching the wafer to produce uniform orifices corresponding to said predetermined pattern from said wafer.
Claim 3
Dependent Claim
32 words
The method of claim 1 wherein the step of producing relative motion between said light source and said wafer comprises rotating the light source around an axis perpendicular to the base member.
Claim 4
Dependent Claim
30 words
The method of claim 1 wherein the step of producing relative motion between said light source and said wafer comprises producing said motion in a plurality of equally spaced steps.
Claim 5
Dependent Claim
31 words
The method of claim 1 wherein the step of producing relative motion between said light source and said wafer comprises indexing said base member to a plurality of equally spaced positions.
Claim 6
Dependent Claim
21 words
The method of claim 1 wherein said wafer comprises a monocrystalline silicon wafer and said predetermined angle is about 54.7 degrees.
Claim 7
Independent Claim
115 words
The method for producing nozzle arrays for ink jet printers comprising the steps of: mounting a resist coated silicon wafer in physical contact with a base member; positioning a mask support structure having a predetermined pattern of orifice masks thereon parallel to the base member; exposing the wafer through the mask by a suitable columnar light source directed at an angle of about 54.7 degrees to the wafer and simultaneously producing relative rotational motion between the light source and the wafer around an axis perpendicular to the base member; treating the wafer to remove the resist in the non-exposed area of the wafer; and anisotropically etching the wafer to produce uniform orifices from said wafer.
Claim 8
Independent Claim
115 words
The method for producing nozzle arrays for ink jet printers comprising the steps of: mounting a resist coated silicon wafer in physical contact with a base member; positioning a mask support structure having a predetermined pattern of orifice masks thereon parallel to the base member; exposing the wafer through the mask by a suitable columnar light source directed at an angle of about 54.7 degrees to the wafer and simultaneously producing relative rotational motion between the light source and the wafer around an axis perpendicular to the base member; treating the wafer to remove the resist in the non-exposed area of the wafer; and anisotropically etching the wafer to produce uniform orifices from said wafer.
Claim 9
Dependent Claim
32 words
The method of claim 6 wherein the step of producing relative motion between said light source and said wafer comprises rotating the light source around an axis perpendicular to the base member.
Claim 10
Dependent Claim
30 words
The method of claim 6 wherein the step of producing relative motion between said light source and said wafer comprises producing said motion in a plurality of equally spaced steps.
Claim 11
Dependent Claim
31 words
The method of claim 6 wherein the step of producing relative motion between said light source and said wafer comprises indexing said base member to a plurality of equally spaced positions.
Claim 12
Independent Claim
126 words
The method for producing nozzle arrays for ink jet printers comprising the steps of: mounting a radiation sensitive wafer in physical contact with a base member; said wafer comprising a crystalline material having greatly different anisotropic etch rates in different crystallographic directions; positioning a mask structure having a predetermined pattern of orifice masks thereon parallel to the base member; exposing the wafer through the mask by a plurality of columnar light sources spaced around said wafer, each of said light sources being directed at a predetermined acute angle to the wafer; treating the wafer to render it subject to anisotropic etching only in the non-exposed areas of the wafer; and anisotropically etching the wafer to produce uniform orifices corresponding to said predetermined pattern from said wafer.
Claim 13
Independent Claim
126 words
The method for producing nozzle arrays for ink jet printers comprising the steps of: mounting a radiation sensitive wafer in physical contact with a base member; said wafer comprising a crystalline material having greatly different anisotropic etch rates in different crystallographic directions; positioning a mask structure having a predetermined pattern of orifice masks thereon parallel to the base member; exposing the wafer through the mask by a plurality of columnar light sources spaced around said wafer, each of said light sources being directed at a predetermined acute angle to the wafer; treating the wafer to render it subject to anisotropic etching only in the non-exposed areas of the wafer; and anisotropically etching the wafer to produce uniform orifices corresponding to said predetermined pattern from said wafer.
Claim 14
Dependent Claim
22 words
The method according to claim 10 wherein said wafer comprises a monocrystalline silicon wafer and said predetermined angle is about 54.7 degrees.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-06-11 | 1982-12-11 | 1983-06-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-06-11 | 1986-12-11 | 1987-06-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-06-11 | 1990-12-11 | 1991-06-12 | $7700.00 | Window Closed / Lapsed |