← Back to Patent Explorer
US4140814A Expired / Lapsed US ⏱️ 0.0 years remaining

Plasma deposition of transparent conductive layers

Assignee: Texas Instruments Inc
•
Filing: 1977-12-01
•
Granted: 1979-02-20
•
Expires: 1997-12-01
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A transparent conductive layer of SnO 2 is deposited on a substrate by an RF-plasma assisted chemical vapor reaction of CO 2 with an organic tin compound, such as tetramethyl tin, for example. A CCD optical imager is fabricated, using the method of the invention to form a transparent conductive layer thereon.

Inventors

  • 👤 Jaroslav Hynecek

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 18:33
CPC Classifications
H; H10; H10F; H10F39/00; H10F39/10; H10F39/12; H10F39/15; C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/407; H10F71/00; H10F71/138; H10P; H10P14/00; H10P14/40; Y; Y02; Y02E; Y02E10/00; Y02E10/50

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 69 words
A method for the deposition of a transparent conductive layer of tin oxide on a substrate, comprising the step of exposing said substrate to a vaporous or gaseous mixture of carbon dioxide and an organic tin compound, while maintaining reduced pressure and an RF glow discharge in the vicinity of said substrate at an energy level sufficient to cause interaction of said mixture and consequent deposition of tin oxide.
Claim 2
Independent Claim 69 words
A method for the deposition of a transparent conductive layer of tin oxide on a substrate, comprising the step of exposing said substrate to a vaporous or gaseous mixture of carbon dioxide and an organic tin compound, while maintaining reduced pressure and an RF glow discharge in the vicinity of said substrate at an energy level sufficient to cause interaction of said mixture and consequent deposition of tin oxide.
Claim 3
Dependent Claim 17 words
A method as in claim 1 wherein said substrate is maintained at a temperature of 200°-500° C.
Claim 4
Dependent Claim 17 words
A method as in claim 1 wherein the RF power is 1-3 milliwatts per cm 3 .
Claim 5
Dependent Claim 14 words
A method as in claim 3 wherein the pressure is less than 1.0 Torr.
Claim 6
Dependent Claim 20 words
A method as in claim 1 wherein the ratio of CO 2 to organic tin is between 50:1 and 300:1.
Claim 7
Dependent Claim 13 words
A method as in claim 1 wherein said substrate is a CCD imager.

References Cited (Backward Citations)

US3243363A Cited
US3808035A Cited
US3991228A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1982-02-19 1982-08-21 1983-02-20 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1986-02-19 1986-08-21 1987-02-20 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1990-02-19 1990-08-21 1991-02-20 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag