Simplified and improved diffractive subtractive color filtering technique

Claim 2

A diffractive substractive color filter responsive to illumination thereof with white light for deriving colored zero order diffraction light, said filter comprising: a variable optical amplitude binary phase delay diffractive structure selectively comprising no more than three different optical amplitudes consisting of a given first optical amplitude corresponding to cyan zero order diffraction light, a given second optical amplitude corresponding to yellow zero order diffraction light, and a third optical amplitude substantially equal to the sum of said first and second amplitudes and corresponding to green zero order diffraction light, and wherein said structure comprises a plurality of separate regions including a first region, having said third optical amplitude and a second region having solely one of said first and second optical amplitudes.

Claim 3

The diffractive subtractive color filter defined in claim 1, wherein said plurality of separate regions of said structure includes a third region having solely the other of said first and second optical amplitudes.

Claim 4

The diffractive subtractive color filter defined in claim 1, wherein said structure is a square wave diffraction grating having a given line spacing and a variable optical amplitude selectively comprising no more than said three different optical amplitudes, said square wave grating comprising said plurality of separate regions.

Claim 5

The diffractive subtractive color filter defined in claim 3, wherein said square wave grating is embossed as a relief pattern in a surface of a transparent medium exhibiting a certain difference in index of refraction with respect to its surroundings, wherein a first region of said square wave grating has a physical depth which when multiplied by said certain difference in index of refraction is equal to said third optical amplitude, and wherein a second region of said square wave grating has a physical depth which when multiplied by said certain difference in index of refraction is equal solely to said one of said first and second optical amplitudes.

Claim 6

The diffractive subtractive color filter defined in claim 4, wherein a third region of said square wave grating has a physical depth which when multiplied by said cerain difference in index of refraction is equal solely to said other of said first and second optical amplitudes.

Claim 7

The diffractive subtractive color filter defined in claim 1, further comprising: a fixed optical amplitude binary phase delay diffractive structure having a given fourth optical amplitude corresponding to magenta zero order diffraction light, said fixed optical amplitude binary phase delay diffractive structure being at least partly superimposed on said variable optical amplitude phase delay diffractive structure.

Claim 8

The diffractive subtractive color filter defined in claim 6, wherein said variable optical amplitude binary phase delay diffractive structure is a first square wave diffraction grating having a first line spacing, a first angular orientation, and a variable optical amplitude selectively comprising no more than said first mentioned three different optical amplitudes, said first square wave grating comprising said plurality of separate regions and wherein said fixed optical amplitude binary phase delay diffractive structure is a second square wave diffraction grating having a second line spacing and a second angular orientation at least one of which is different from that of said first square-wave grating, and said second square wave grating having said fourth optical amplitude.

Claim 9

The diffractive subtractive color filter defined in claim 7, wherein each of said first and second square wave gratings are respectively embossed as a relief pattern in a surface of a transparent medium exhibiting a certain difference in index of refraction with respect to its surroundings, wherein a first region of said first square wave grating has a physical depth which when multiplied by the certain difference in index of refraction of the medium in which said first square wave grating is embossed is equal to said third optical amplitude, wherein a second region of said first square wave grating has a physical depth which when multiplied by the certain difference in index of refraction of the medium in which said first square wave grating is embossed is equal solely to said one of said first and second optical amplitudes, and wherein said second square wave grating has a physical depth which when multiplied by the certain difference in index of refraction of the medium in which said second square wave grating is embossed is equal to said fourth optical amplitude.

Claim 10

The diffractive subtractive color filter, defined in claim 8, wherein a third region of said first square wave grating has a physical depth which when multiplied by the certain difference in index of refraction of the medium in which said first square wave grating is embossed is equal solely to the other of said first and second optical amplitudes.

Claim 11

In a method for fabricating a diffractive subtractive color filter which includes the recording of a diffraction grating structure in photoresist for use in embossing a surface relief pattern diffractive structure in a medium having a certain difference in index of refraction from its surroundings; the improvement comprising the steps of: providing a recording blank composed of a substrate sheet supporting a layer of positive photoresist where the substrate sheet has a square-wave diffraction grating of a given line spacing and a given physical depth embossed in a face thereof with said layer of photoresist having a thickness which fills the grooves of said grating and extends a given distance beyond the ridges of said grating, illuminating at least a first portion of said photoresist layer with cyan-manifesting light to provide a first given exposure of said photoresist layer, and then illuminating at least a second portion of said photoresist layer with yellow manifesting light to provide a second given exposure of said photoresist layer, said given distance being at least equal to the depth of unexposed areas of said photoresist layer dissolved during development, said first given exposure alone being that required to reveal after development of said photoresist layer a first part of said physical depth of said square wave grating equal to an optical amplitude for said diffractive subtractive color filter manifesting cyan zero order diffraction light divided by said certain difference in index of refraction, said second given exposure alone being that required to reveal after development of said photoresist layer a second part of said physical depth of said square wave grating equal to an optical amplitude for said diffractive subtractive color filter manifesting yellow zero order diffraction light divided by said certain difference in index of refraction, and said given physical depth being substantially equal to the sum of said first and second parts thereof.

Claim 12

In a method for fabricating a diffractive subtractive color filter which includes the recording of a diffraction grating structure in photoresist for use in embossing a surface relief pattern diffractive structure in a medium having a certain difference in index of refraction from its surroundings; the improvement comprising the steps of: providing a recording blank composed of a substrate sheet supporting a layer of positive photoresist where the substrate sheet has a square-wave diffraction grating of a given line spacing and a given physical depth embossed in a face thereof with said layer of photoresist having a thickness which fills the grooves of said grating and extends a given distance beyond the ridges of said grating, illuminating at least a first portion of said photoresist layer with cyan-manifesting light to provide a first given exposure of said photoresist layer, and then illuminating at least a second portion of said photoresist layer with yellow manifesting light to provide a second given exposure of said photoresist layer, said given distance being at least equal to the depth of unexposed areas of said photoresist layer dissolved during development, said first given exposure alone being that required to reveal after development of said photoresist layer a first part of said physical depth of said square wave grating equal to an optical amplitude for said diffractive subtractive color filter manifesting cyan zero order diffraction light divided by said certain difference in index of refraction, said second given exposure alone being that required to reveal after development of said photoresist layer a second part of said physical depth of said square wave grating equal to an optical amplitude for said diffractive subtractive color filter manifesting yellow zero order diffraction light divided by said certain difference in index of refraction, and said given physical depth being substantially equal to the sum of said first and second parts thereof.

Claim 13

The method defined in claim 10, further including the step of developing said photoresist after both said first and second exposures thereof.