Monomeric compounds

Abstract

Abstract Photosensitive homopolymers and substantially non-crosslinked copolymers containing the recurring unit: ##EQU1## R 1 may be substituted or unsubstituted alkylene, aralkylene, alkoxyalkylene or aryloxyalkylene. R 2 is a substituted or unsubstituted aryl group or heterocyclic group having aromatic character. R 3 , R 4 , and R 5 are hydrogen, halogen or lower alkyl. R 6 and R 7 may be hydrogen, halogen, nitro, lower alkyl, phenyl, substituted phenyl, phenoxy and lower alkoxy. Lithographic plates bearing these photosensitive polymers can be stored without deterioration for extended periods prior to exposure, and produce highly abrasion resistant plates on being exposed. The photosensitive polymers of the invention are preferably produced by homopolymerization of novel monomers having the general formula ##EQU2## where R 1 ' is alkylene, haloalkylene, alkoxyalkylene, aminoalkylene, cycloalkylene, aralkylene, cycloalkylalkylene, cyanoalkylene, and aryloxyalkylene, and R 2 , R 3 , R 4 , R 5 , R 6 , and R 7 are as defined above; and by copolymerization of these monomers with one or more ethylenically unsaturated comonomers. Methods of preparing the photopolymers and the novel monomers are also disclosed, as are methods of preparing and exposing plates bearing the polymers.

Inventors

• 👤 William R. Dunnavant
• 👤 Edward M. Harris
• 👤 Philip F. Kurz
• 👤 Richard A. Markle
• 👤 Edward H. Parker

Bibliographic Details