High depth-to-width ratio etching process for monocrystalline germanium semiconductor materials

Claim 2

The process for making a high depth-to-width ratio etched groove in the surface of a germanium-comprising semiconductor body which comprises the steps of: forming an etching mask on a (110) surface of a slice of monocrystalline germanium-comprising semiconductor material having an opening therein, the length of which is parallel to a (111) plane of the monocrystalline material which is normal to said surface; and subjecting the exposed area of the semiconductor surface to a preferential etching fluid which attacks a (110) plane of germanium crystal fastest and a (111) plane slowest.

Claim 3

The process defined in claim 1 wherein the preferential etching fluid is comprised of: nitric acid; hydrofluoric acid; water; and silver nitrate.

Claim 4

The process defined in claim 1 wherein the etching mask is formed by: vacuum depositing a layer of metal on the surface of the semiconductor body; and selectively removing portions of the metal layer to form openings which expose the surface of the semiconductor body.

Claim 5

The process defined in claim 3 wherein the metal layer is comprised of gold and portions of the mask, after the etching steps have been completed, are retained as electrical contacts on the surface of the individual elements which have been formed as a result of the etched grooves.

Claim 6

The process for making a high depth-to-width ratio etch in the surface of a germanium-comprising semiconductor body which comprises: forming a slice of monocrystalline germanium-comprising semiconductor material having a surface parallel to a (110) plane of the crystal from which it is formed; forming an etching mask on said surface having an opening therein, the length of which is parallel to a (111) plane of the crystal and the width parallel to a (211) plane; and subjecting the exposed area of the semiconductor surface to an etching fluid, which attacks a (110) plane of a germanium crystal fastest and a (111) plane slowest.

Claim 7

The process for making a high depth-to-width ratio etch in the surface of a germanium-comprising semiconductor body which comprises: forming a slice of monocrystalline germanium-comprising semiconductor material having a surface parallel to a (110) plane of the crystal from which it is formed; forming an etching mask on said surface having an opening therein, the length of which is parallel to a (111) plane of the crystal and the width parallel to a (211) plane; and subjecting the exposed area of the semiconductor surface to an etching fluid, which attacks a (110) plane of a germanium crystal fastest and a (111) plane slowest.

Claim 8

The process defined in claim 5 wherein the slice of monocrystalline germanium-comprising semiconductor material is formed by: growing a monocrystalline ingot of germanium by positioning a seed with a (111) plane in the growth direction and a (211) plane in the direction of the major axis of the cross-section of the ingot; mounting the ingot for sawing an elliptically-shaped slice cut parallel to an identified (110) plane with the minor axis of the eillipse parallel to a [211 ] direction and with its major axis parallel to a [111 ] direction by rotating the ingot 35 ° about either of the [110 ] directions nearest the major axis of its cross-section; and slicing the ingot along the identified (110) plane to form the slice.

Claim 9

The process defined in claim 5 wherein the etching fluid is comprised of: nitric acid; hydrofluoric acid; water; and silver nitrate.

Claim 10

The process for making a high depth-to-width ratio etched groove in the surface of a germanium-comprising semiconductor body which comprises the steps of: forming a malleable metal etching mask on a (110) surface of a slice of monocrystal germanium-comprising semiconductor body, said mask having an opening therein whose length is parallel to a (111) plane and whose width is parallel to a (211) plane; subjecting the exposed area of the surface to a preferential etching fluid which attacks a (110) plane of a germanium crystal fastest and a (111) plane slowest, thereby forming a groove in the body; and concurrently with the formation of said groove periodically bending the edges of the mask left overhanging the groove along the sides of the undercut area partially protecting the side walls from contact by the etching fluid, producing side walls which are substantially perpendicular.

Claim 11

The process for making a high depth-to-width ratio etched groove in the surface of a germanium-comprising semiconductor body which comprises the steps of: forming a malleable metal etching mask on a (110) surface of a slice of monocrystal germanium-comprising semiconductor body, said mask having an opening therein whose length is parallel to a (111) plane and whose width is parallel to a (211) plane; subjecting the exposed area of the surface to a preferential etching fluid which attacks a (110) plane of a germanium crystal fastest and a (111) plane slowest, thereby forming a groove in the body; and concurrently with the formation of said groove periodically bending the edges of the mask left overhanging the groove along the sides of the undercut area partially protecting the side walls from contact by the etching fluid, producing side walls which are substantially perpendicular.

Claim 12

The process defined in claim 8 wherein the selected etching fluid is comprised of: nitric acid; hydrofluoric acid; water; and silver nitrate.

Claim 13

The process defined in claim 8 wherein the portions of the metal etching mask which are left overhanging the groove are removed by ultrasonic vibrations.

Claim 14

The process defined in claim 8 wherein the malleable metal etching mask is electrically conductive and only that portion of the mask left overhanging the groove is removed after the groove has been fully etched, the remaining portions of the mask being retained as electrical contacts on the surface of the individual elements formed as a result of the etched grooves.

Claim 15

The process defined in claim 11 wherein the electrically conductive malleable metal etching mask is comprised of gold.

Claim 16

The process of fabricating an array of very small, closely spaced germanium-comprising elements which comprises the steps of: bonding a (110) surface of a thin slice of a monocrystalline germanium-comprising semiconductor material to a semiconductor substrate; forming a malleable, electrically conductive metal etching mask having narrow slots therein on the opposite exposed (110) surface of the monocrystalline germanium-comprising material, such that the length of each of the slots is parallel to a (111) plane and the width of each of the slots is parallel to a (211) plane; subjecting the exposed area of the semiconductor surface to an etching fluid which attacks a (110) plane of a germanium crystal fastest and a (111) plane slowest, thereby forming cavities in the body which separate the slice into a plurality of individual elements; concurrently with the formation of said grooves, periodically bending the edges of the mask left overhanging the grooves along the sides of the undercut area partially protecting the side walls from contact by the etching fluid; placing the slice and bonded substrate in an ultrasonic vibrator, thereby removing the overhanging portion of the mask; and utilizing the remaining portion of the etching mask as an electrical contact on the surface of each element to electrically connect the individual elements, thereby forming an electrically operational array.

Claim 17

The process of fabricating an array of very small, closely spaced germanium-comprising elements which comprises the steps of: bonding a (110) surface of a thin slice of a monocrystalline germanium-comprising semiconductor material to a semiconductor substrate; forming a malleable, electrically conductive metal etching mask having narrow slots therein on the opposite exposed (110) surface of the monocrystalline germanium-comprising material, such that the length of each of the slots is parallel to a (111) plane and the width of each of the slots is parallel to a (211) plane; subjecting the exposed area of the semiconductor surface to an etching fluid which attacks a (110) plane of a germanium crystal fastest and a (111) plane slowest, thereby forming cavities in the body which separate the slice into a plurality of individual elements; concurrently with the formation of said grooves, periodically bending the edges of the mask left overhanging the grooves along the sides of the undercut area partially protecting the side walls from contact by the etching fluid; placing the slice and bonded substrate in an ultrasonic vibrator, thereby removing the overhanging portion of the mask; and utilizing the remaining portion of the etching mask as an electrical contact on the surface of each element to electrically connect the individual elements, thereby forming an electrically operational array.

Claim 18

The process defined in claim 13 wherein the selected etching fluid is comprised of: nitric acid; hydrofluoric acid; water; and silver nitrate.

Claim 19

The process of fabricating an infrared detector array with many closely spaced rectangular detector elements which comprises the steps of: alloying a (110) surface of a thin slice of monocrystalline germanium-comprising, photo-sensitive semiconductor material to a degenerate germanium-comprising semiconductor substrate; vacuum depositing a layer comprised of gold on the opposite exposed (110) surface of the photo-sensitive slice; sintering the gold into said surface by heating the slice and bonded substrate to 340°C; photomasking the gold where slots are to be formed such that the length of the slots is parallel to a (111) plane of the slice and the width of the slots is parallel to a (211) plane of the slice; exposing the gold to a selective etchant for gold, thereby forming slots in the gold which expose portions of said opposite (110) surface of the photo-sensitive semiconductor slice; subjecting said portions of the semiconductor surface to an etching fluid, which attacks a (110) plane of a germanium crystal fastest and a (111) plane slowest, thereby forming grooves in the body which separate the slice into a plurality of individual elements; concurrently with the formation of said grooves, periodically bending the edges of the mask left overhanging the grooves along the sides of the undercut area partially protecting the side walls from contact by the etching fluid; placing the slice and bonded substrate in an ultrasonic vibrator, and thereby removing the overhanging portion of the gold mask; and utilizing the remaining portion of the vacuum deposited gold as an electrical contact on the surface of each element to electrically connect the individual elements, thereby forming an electrically operational array.

Claim 20

The process of fabricating an infrared detector array with many closely spaced rectangular detector elements which comprises the steps of: alloying a (110) surface of a thin slice of monocrystalline germanium-comprising, photo-sensitive semiconductor material to a degenerate germanium-comprising semiconductor substrate; vacuum depositing a layer comprised of gold on the opposite exposed (110) surface of the photo-sensitive slice; sintering the gold into said surface by heating the slice and bonded substrate to 340°C; photomasking the gold where slots are to be formed such that the length of the slots is parallel to a (111) plane of the slice and the width of the slots is parallel to a (211) plane of the slice; exposing the gold to a selective etchant for gold, thereby forming slots in the gold which expose portions of said opposite (110) surface of the photo-sensitive semiconductor slice; subjecting said portions of the semiconductor surface to an etching fluid, which attacks a (110) plane of a germanium crystal fastest and a (111) plane slowest, thereby forming grooves in the body which separate the slice into a plurality of individual elements; concurrently with the formation of said grooves, periodically bending the edges of the mask left overhanging the grooves along the sides of the undercut area partially protecting the side walls from contact by the etching fluid; placing the slice and bonded substrate in an ultrasonic vibrator, and thereby removing the overhanging portion of the gold mask; and utilizing the remaining portion of the vacuum deposited gold as an electrical contact on the surface of each element to electrically connect the individual elements, thereby forming an electrically operational array.

Claim 21

The process defined in claim 15 wherein the selected etching fluid is comprised of: nitric acid; hydrofluoric acid; water; and silver nitrate.

Claim 22

The process defined in claim 15 wherein the germanium-comprising photosensitive semiconductor material is comprised of mercury-doped germanium and the substrate is comprised of degenerate gallium-doped germanium.

Claim 23

The process of making a high depth-to-width ratio etched groove in the surface of a semiconductor body comprised of monocrystalline germanium which comprises the steps of: forming an etching mask on a crystallographic planar surface of a slice of said semiconductor body having an opening therein, the length of which is parallel to a plane of the monocrystalline body which is normal to said planar surface; and subjecting the exposed area of the semiconductor surface to a preferential etching fluid which attacks said surface plane of the germanium crystal faster than said normal plane.

Claim 24

The process of making a high depth-to-width ratio etched groove in the surface of a semiconductor body comprised of monocrystalline germanium which comprises the steps of: forming an etching mask on a crystallographic planar surface of a slice of said semiconductor body having an opening therein, the length of which is parallel to a plane of the monocrystalline body which is normal to said planar surface; and subjecting the exposed area of the semiconductor surface to a preferential etching fluid which attacks said surface plane of the germanium crystal faster than said normal plane.