Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
155 words
AN UNSATURATED EPOXY-ESTER RESINOUS COMPOSITION CURABLE UNDER ELECTRON BEAM RADIATION TO FORM A COATING FILM WITH EXCELLENT DRYNESS AND ADHESION TO METALS, WHICH COMPOSITION COMPRISES: A REACTION PRODUCT OF A. ONE EQUIVALENT WEIGHT OF AN EPOXY COMPOUND HAVING AT LEAST TWO EPOXY RADDICALS IN THE MOLECULE, B. 0.5 EQUIVALENT WEIGHT OF AN UNSATURATED MONOCARBOXYLIC ACID, AND C. 0.5 EQUIVALENT WEIGHT OF A SATURATED ALKYLD WHICH HAS A TERMINAL CARBOXYL RADICAL IN THE MOLECULE AND IS PRODUCED BY HEATING ONE MOLE OF A GLYCOL WITH 1.33 TO 2.0 MOLES OF A SATURATED DICARBOXYLIC ACID, SAID REACTION PRODUCT BEING PRODUCED UNDER HEATING AND IN THE PRESENCE OF AN ESTERIFICATION CATALYST AND WITH OR WITHOUT A POLYMERIZATION INHIBITOR, SOLVENT POLYMERIZABLE MONOMER SELECTED FROM THE GROUP CONSISTING OF ETHYLACRYLATE, BUTYLACRYLATE, METHYLMETHACRYLATE, ETHYLMETHACRYLATE, BUTYLMETHACRYLATE, ISOBUTYLMETHACRYLATE, HYDROXY-ETHYLMETHACRRYLATE, HYDROXY-ETHYLACRYLATE, HYDROXY-PROPYLMETHACRYLATE, ACRYLONTRI E, VINYL AETATE, STYRENE, VINYL TOULENE, ETHYLENE GLYCOL-DICARYLATE, ETHYL ENE GLYCOL-DIMETHACRYLATE, TRIMETHYLOL-PROPANETRIMETHACRYLATE, DIETHYLENE GLYCOL-DIMETHACRYLATE, DIETHYLENE GLYCOL-DIACRYLATE AND BUTANEDIOL-DIMETHACRYLATE, OR ADDITIONAL SOLVENT.
Claim 2
Dependent Claim
155 words
AN UNSATURATED EPOXY-ESTER RESINOUS COMPOSITION CURABLE UNDER ELECTRON BEAM RADIATION TO FORM A COATING FILM WITH EXCELLENT DRYNESS AND ADHESION TO METALS, WHICH COMPOSITION COMPRISES: A REACTION PRODUCT OF A. ONE EQUIVALENT WEIGHT OF AN EPOXY COMPOUND HAVING AT LEAST TWO EPOXY RADDICALS IN THE MOLECULE, B. 0.5 EQUIVALENT WEIGHT OF AN UNSATURATED MONOCARBOXYLIC ACID, AND C. 0.5 EQUIVALENT WEIGHT OF A SATURATED ALKYLD WHICH HAS A TERMINAL CARBOXYL RADICAL IN THE MOLECULE AND IS PRODUCED BY HEATING ONE MOLE OF A GLYCOL WITH 1.33 TO 2.0 MOLES OF A SATURATED DICARBOXYLIC ACID, SAID REACTION PRODUCT BEING PRODUCED UNDER HEATING AND IN THE PRESENCE OF AN ESTERIFICATION CATALYST AND WITH OR WITHOUT A POLYMERIZATION INHIBITOR, SOLVENT POLYMERIZABLE MONOMER SELECTED FROM THE GROUP CONSISTING OF ETHYLACRYLATE, BUTYLACRYLATE, METHYLMETHACRYLATE, ETHYLMETHACRYLATE, BUTYLMETHACRYLATE, ISOBUTYLMETHACRYLATE, HYDROXY-ETHYLMETHACRRYLATE, HYDROXY-ETHYLACRYLATE, HYDROXY-PROPYLMETHACRYLATE, ACRYLONTRI E, VINYL AETATE, STYRENE, VINYL TOULENE, ETHYLENE GLYCOL-DICARYLATE, ETHYL ENE GLYCOL-DIMETHACRYLATE, TRIMETHYLOL-PROPANETRIMETHACRYLATE, DIETHYLENE GLYCOL-DIMETHACRYLATE, DIETHYLENE GLYCOL-DIACRYLATE AND BUTANEDIOL-DIMETHACRYLATE, OR ADDITIONAL SOLVENT.
Claim 3
Dependent Claim
78 words
An unsaturated epoxy-ester resinous composition according to claim 1, wherein the epoxy compound is produced by at least one method selected from the group consisting of: (a) reacting bisphenol-A with epichlorohydrin or methylepichlorohydrin; (b) oxidizing a double bond of the unsaturated compound; (c) reacting a glycol with epichlorohydrin; (d) reacting an adduct of bisphenol-A and ethylene oxide or propylene oxide with epichlorohydrin; (e) reacting a carboxylic acid with epichlorohydrin or methylepichlorohydrin; and (f) reacting halogenated bisphenol-A with epichlorohydrin.
Claim 4
Dependent Claim
35 words
An unsaturated epoxy-ester resinous composition according to claim 1, wherein the unsaturated monocarboxylic acid is selected from the group consisting of acrylic acid, methacrylic acid, sorbic acid, crotonic acid and the mono-ethylester of maleic acid.
Claim 5
Dependent Claim
38 words
An unsaturated epoxy-ester resinous composition according to claim 1, wherein the glycol is selected from the group consisting of propylene glycol, ethylene glycol, butane-diol-1,3, butane-diol-2,3, butane-diol-1,4, neopentyl glycol, hexane-diol-1,6, diethylene glycol, triethylene glycol, dipropylene glycol and hydrogenated bisphenol-A.
Claim 6
Dependent Claim
47 words
An unsaturAted epoxy-ester resinous composition according to claim 1, wherein the saturated dicarboxylic acid is selected from the group consisting of succinic acid, adipic acid, sebacic acid, tetrahydrophthalic acid, tetrahydrophthalic anhydride, methyl-tetrahydrophthalic acid, methyl-tetrahydrophthalic anhydride, hexahydrophthalic acid, hexahydrophthalic anhydride, endomethylene tetrahydrophthalic anhydride, phthalic acid and phthalic anhydride.