Abstract Radiation (thermal and light)-sensitive polymers are provided characterized by the presence, in combination in the same molecule, of each of two recurring units, each unit corresponding to the formula: WHERE R1 lower-alkoxy or phenyl. In the case of one of the two units, one of X and Y represents hydrogen and the other represents dialkylaminohydrocarbyl; in the case of the second unit, one of X and Y represents hydrogen and the other represents: WHERE A alkylene from 2 to 10 carbon atoms having from 2 to 6 carbon atoms between valencies, R6 lower-alkyl or halogen, x 1 or 2, y 0 to 2 and x + y 1 to 3. Water soluble salts are also disclosed. The above polymers are useful for chemically bonding acid or basic dyestuffs to non-dye receptive substrates (e.g., polyethylene) by coating the substrate with the above polymer and exposing the coated substrate to irradiation. The treated substrate is then contacted with an acid, direct, or basic dyestuff. The irradiation can be carried out imagewise, and the image developed by removing the unexposed polymer prior to application of the dye. Bonding of the radiation-sensitive polymers of the invention to substrates in the above manner can also be employed as a means of rendering hydrophilic a variety of substrates which are normally hydrophobic.
A PROCESS OF CHEMICALLY BONDING A DYESTUFF SELECTED FROM THE GROUP CONSISTING OF ACID DYESTUFFS, BASIC DYESTUFFS, DIRECT DYESTUFFS AND MIXTURES THEREOF TO A SUBSTRATE CONTAINING A PLURALITY OF C-H BONDS WHICH SUBSTRATE IS NOT NORMALLY RECEPTIVE TO DYESTUFFS WHICH PROCESS COMPRISES: A. APPLYING TO SAID SUBSTRATE A RADIATION-SENSITIVE POLYMER CHARACTERIZED BY THE PRESENCE, IN COMBINATION IN THE SAME MOLECULE, OF EACH OF TWO RECURRING UNITS, ONE OF WHICH HAS THE FORMULA:
Claim 2
Dependent Claim
72 words
A PROCESS OF CHEMICALLY BONDING A DYESTUFF SELECTED FROM THE GROUP CONSISTING OF ACID DYESTUFFS, BASIC DYESTUFFS, DIRECT DYESTUFFS AND MIXTURES THEREOF TO A SUBSTRATE CONTAINING A PLURALITY OF C-H BONDS WHICH SUBSTRATE IS NOT NORMALLY RECEPTIVE TO DYESTUFFS WHICH PROCESS COMPRISES: A. APPLYING TO SAID SUBSTRATE A RADIATION-SENSITIVE POLYMER CHARACTERIZED BY THE PRESENCE, IN COMBINATION IN THE SAME MOLECULE, OF EACH OF TWO RECURRING UNITS, ONE OF WHICH HAS THE FORMULA:
Claim 3
Dependent Claim
40 words
A process according to claim 1 wherein in step (b) the combination of polymer and substrate is exposed to radiation in selected areas only and the unexposed radiation-sensitive polymer is removed from the combination prior to carrying out step (c).
Claim 4
Dependent Claim
25 words
A process according to claim 2 wherein the removal of the unexposed radiation-sensitive polymer is accomplished by dissolving said unexposed polymer in a solvent therefor.
Claim 5
Dependent Claim
17 words
A process according to claim 1 wherein the substrate not normally receptive to dyestuffs is a polyolefin.