US3732158A
Expired / Lapsed
US
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Method and apparatus for sputtering utilizing an apertured electrode and a pulsed substrate bias
Assignee: National Aeronautics and Space Administration
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Filing: 1971-01-14
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Granted: 1973-05-08
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Expires: 1991-01-14
Abstract
Abstract COMBINING THE ADVANTAGES OF ION PLATING WITH THE VERSATILITY OF A RADIO FREQUENCY SPUTTERED SOURRCE. A PULSED HIGH VOLTAGE DIRECT CURRENT IS PASSED TO THE ARTICLE BEING PLATED DURING RADIO FREQUENCY SPUTTERING.
Inventors
- 👤 J Przybyszewski
- 👤 R Shaltens
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 07:41
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35; H; H01; H01J; H01J37/00; H01J37/32; H01J37/34
Claims Analysis
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-05-07 | 1976-11-06 | 1977-05-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-05-07 | 1980-11-06 | 1981-05-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-05-07 | 1984-11-06 | 1985-05-08 | $7700.00 | Window Closed / Lapsed |