Photoresist composition
Abstract
Abstract A PHOTORESIST-FORMING COMPOSITION COMPRISING A PHOTO ACTIVATOR HAVING A POLYCHLORINATED OR POLYBROMINATED METHYL GROUP CAPABLE OF FORMING A FREE RADICAL BY THE ACTION OF LIGHT: A HOMOPOLYMER OR A CO-POLYMER WITH OTHER VINYL MONOMER, OF A MONOMER REPRESENTED BY THE GENERAL FORMULA -CH(-A)-C(-R1)(-X-N(-R2)-(2-R3-1,3-PHENYLENE)-R4)-, OR -CH2-C(-R1)(-N(-R2)-(2-R3,1,3-PHENYLENE)-R4)- WHEREIN A IS A HYDROGEN ATOM, A CARBOXYLIC ACID OR CARBOXYLIC ACID AMIDE; X IS -COOCH2CH2-, -CONHCH2CH2- -CONH-, -CH2-, -$SO2NH-, -$SO2O$-, -CONH$-; R1 IS A HYDROGEN ATOM OR A LOWER ALKYL GROUP; R2 IS A HYDROGEN ATOM, A LOWR ALKYL GROUP OR A SUBSTITUTED OR SUNSUBSTITUTED PHEN GROUP; R3 AND R4 ARE INDIVIDUALLY A HYDROGEN ATOM OR A LOWER ALKYL GROU, PROVIDED THAT IN THE CASE OF THE FORMULA II, R2 AND R3 MAY FORM A HETEROCYCLIC RING TOGETHER WITH NITROGEN AND THE BENZENE RING, AND R3 AND R4 MAY FORM A NAPHTHALENE RING TOGETHER WITH THE BENZENE RING; AND A CELLULOSE ETHER.
Inventors
- 👤 Hiroyoshi Yamaguchi
- 👤 Akio Iwaki
- 👤 Hirosi Tokura
Bibliographic Details
Claims Analysis
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