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US3668523A Expired / Lapsed US ⏱️ 0.0 years remaining

Electrical testing of dielectric layers, exhibiting voltage dependent capacitance, with linear ramp voltages

Assignee: AT&T Inc
•
Filing: 1969-05-07
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Granted: 1972-06-06
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Expires: 1989-05-07
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Abstract

Abstract In order to test a dielectric layered structure exhibiting a voltage dependent capacitance, a metal-insulator-semiconductor (M-I-S) structure for example, a linear ramp (sawtooth) voltage is applied across the structure initially in thermal equilibrium, but at a temperature below which the insulator allows ionic impurities to become mobile. The profile of current vs. time, which thereby flows through the structure, constitutes a signal which can be rapidly electronically processed to yield information about the quality and properties of the structure.

Inventors

  • 👤 Matthew Kuhn

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 13:17
CPC Classifications
G; G01; G01R; G01R27/00; G01R27/02; G01R27/26; G01R27/2605; G01R27/2617; G01R27/2623; G01R31/00; G01R31/26; G01R31/2607; G01R31/2637

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 82 words
The method of electrically testing a two terminal structure having a voltage dependent capacitance in response to voltages applied across the structure, which comprises the steps of: a. maintaining said structure in a state which is essentially devoid of significantly mobile charges; b. applying a linear ramp voltage across said structure in said state; c. monitoring the instantaneous current through the structure in said state while said voltage is applied thereto in the absence of any other time varying voltage applied thereto.
Claim 2
Independent Claim 82 words
The method of electrically testing a two terminal structure having a voltage dependent capacitance in response to voltages applied across the structure, which comprises the steps of: a. maintaining said structure in a state which is essentially devoid of significantly mobile charges; b. applying a linear ramp voltage across said structure in said state; c. monitoring the instantaneous current through the structure in said state while said voltage is applied thereto in the absence of any other time varying voltage applied thereto.
Claim 3
Dependent Claim 15 words
The method recited in claim 1 in which the structure is a metal-insulator-semiconductor layered structure.
Claim 4
Dependent Claim 32 words
The method recited in claim 2 in which the insulator is characterized by a voltage independent capacitance, and the semiconductor is characterized by a voltage dependent capacitance in response to applied voltages.
Claim 5
Dependent Claim 50 words
The method of testing a structure in accordance with claim 2 in which the period of a single ramp of the linear ramp voltage is sufficient for the formation of an inversion layer in the semiconductor at some time while the linear ramp voltage is being applied to the structure.
Claim 6
Dependent Claim 54 words
The method of testing a structure in accordance with claim 2 which includes the added step of applying to the structure a flat voltage pulse, prior to the step of applying the linear ramp voltage, sufficient to create an inversion layer in the semiconductor when the linear ramp voltage is applied to the structure.
Claim 7
Dependent Claim 45 words
The method of testing a structure in accordance with claim 2 which comprises the further step of shining light upon the structure prior to the step of applying the linear ramp voltage, sufficient to create an inversion layer when the linear ramp voltage is applied.
Claim 8
Dependent Claim 31 words
The method recited in claim 2 in which the semiconductor is essentially silicon and the linear ramp voltage is characterized by a slope of less than approximately 1 volt per second.
Claim 9
Dependent Claim 37 words
The method of electrically testing a structure according to claim 1 in which the step of monitoring is performed by means which include an electronic current monitoring device whose output is fed to a cathode ray oscilloscope.
Claim 10
Independent Claim 122 words
The method of electrically testing a two-terminal, metal-insulator-semiconductor, layered structure in which the insulator is characterized by a voltage independent capacitance and the semiconductor is characterized by a voltage dependent capacitance in response to applied voltages, which comprises the steps of: a. maintaining said structure in a state which is essentially devoid of significantly mobile charges; b. applying a linear ramp voltage across said structure in said state; c. monitoring the instantaneous current through the structure in said state while said voltage is applied thereto; d. monitoring the difference between the instantaneous current and the initial value thereof, to produce a time-dependent electric signal which is proportional to said difference; and e. integrating electrically said signal over a predetermined period of time.
Claim 11
Independent Claim 122 words
The method of electrically testing a two-terminal, metal-insulator-semiconductor, layered structure in which the insulator is characterized by a voltage independent capacitance and the semiconductor is characterized by a voltage dependent capacitance in response to applied voltages, which comprises the steps of: a. maintaining said structure in a state which is essentially devoid of significantly mobile charges; b. applying a linear ramp voltage across said structure in said state; c. monitoring the instantaneous current through the structure in said state while said voltage is applied thereto; d. monitoring the difference between the instantaneous current and the initial value thereof, to produce a time-dependent electric signal which is proportional to said difference; and e. integrating electrically said signal over a predetermined period of time.

References Cited (Backward Citations)

US2297436A Cited
US2776407A Cited
US2790141A Cited
US3034044A Cited
US3206674A Cited
US3117899A Cited
US3403339A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-06-06 1975-12-06 1976-06-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-06-06 1979-12-06 1980-06-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-06-06 1983-12-06 1984-06-06 $7700.00 Window Closed / Lapsed

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