US3296115A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Sputtering of metals wherein gas flow is confined to increase the purity of deposition
Assignee: GT Schjeldahl Co
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Filing: 1964-03-02
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Granted: 1967-01-03
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Expires: 1984-03-02
Abstract
No abstract record available.
Inventors
- 👤 Laegreid Nils
- 👤 Roger M Moseson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-22 23:39
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3471; C23C14/3478
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
148 words
IN A DEPOSITION APPARATUS FOR A SPUTTERING OPERATION ADAPTED FOR THE PREPARATION OF A FILM DEPOSIT ALONG THE SURFACE OF A SUBSTRATE MEMBER, AN ENCLOSURE, MEANS FOR EVACUATING SAID ENCLOSURE, CHAMBER MEANS DISPOSED WITHIN SAID ENCLOSURE AND TERMINATIANG IN AN END SURFACE DEFINING A PARTIALLY OPEN GRID STRUCTURE FOR CONFINING THE WORKING STATIONS OF THE SPUTTERING OPERATION, AND A PLURALITY OF OPERATING STATIONS DISPOSED ALONG SAID CHAMBER MEANS, SAID OPERATING STATIONS INCLUDING A PAIR OF OPERATING ELECTRODES INCLUDING A CATHODE FOR PROVIDING A SUPPLY OF FREE ELECTRONS TO SAID APPARATUS AND AN ANODE FOR ATTRACTING SAID ELECTRONS, THE ELECTRODES BEING DISPOSED IN SPACED APART RELATIONSHIP, ONE OF THE ELECTRODES BEING DISPOSED ADJACENT SAID END SURFACE, AND DEFINING A GAP ZONE THEREBETWEEN, AND A GENERALLY EXTERNALLY ACCESSIBLE TARGET RETAINING MEANS AND SUBSTRATE RETAINING MEANS ARRANGED IN GENERALLY OPPOSSITELY DISPOSED AND MUTUALLY OPERATIVE RELATIONSHIP ALONG THE WALLS OF SAID CHAMBER
Claim 2
Dependent Claim
148 words
IN A DEPOSITION APPARATUS FOR A SPUTTERING OPERATION ADAPTED FOR THE PREPARATION OF A FILM DEPOSIT ALONG THE SURFACE OF A SUBSTRATE MEMBER, AN ENCLOSURE, MEANS FOR EVACUATING SAID ENCLOSURE, CHAMBER MEANS DISPOSED WITHIN SAID ENCLOSURE AND TERMINATIANG IN AN END SURFACE DEFINING A PARTIALLY OPEN GRID STRUCTURE FOR CONFINING THE WORKING STATIONS OF THE SPUTTERING OPERATION, AND A PLURALITY OF OPERATING STATIONS DISPOSED ALONG SAID CHAMBER MEANS, SAID OPERATING STATIONS INCLUDING A PAIR OF OPERATING ELECTRODES INCLUDING A CATHODE FOR PROVIDING A SUPPLY OF FREE ELECTRONS TO SAID APPARATUS AND AN ANODE FOR ATTRACTING SAID ELECTRONS, THE ELECTRODES BEING DISPOSED IN SPACED APART RELATIONSHIP, ONE OF THE ELECTRODES BEING DISPOSED ADJACENT SAID END SURFACE, AND DEFINING A GAP ZONE THEREBETWEEN, AND A GENERALLY EXTERNALLY ACCESSIBLE TARGET RETAINING MEANS AND SUBSTRATE RETAINING MEANS ARRANGED IN GENERALLY OPPOSSITELY DISPOSED AND MUTUALLY OPERATIVE RELATIONSHIP ALONG THE WALLS OF SAID CHAMBER
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1970-01-02 | 1970-07-04 | 1971-01-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1974-01-02 | 1974-07-04 | 1975-01-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1978-01-02 | 1978-07-04 | 1979-01-03 | $7700.00 | Window Closed / Lapsed |